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VLSI Design
Semester II 2006-2007
Reliability, robustness
Noise margins
Noise immunity
Performance
Speed (delay)
Power consumption; energy
Time-to-market
fixed cost
cost per IC = variable cost per IC + -----------------
volume
ECE 4121 Design Metrics.5
NRE Cost is Increasing
Single die
Wafer
From http://www.amd.com
Example
wafer size of 12 inches, die size of 2.5 cm2, 1 defects/cm2, =3
(measure of manufacturing process complexity)
252 dies/wafer (remember, wafers round & dies square)
die yield of 16%
252 x 16% = only 40 dies/wafer die yield !
Difference between VOH and VOL is the logic or signal swing Vsw
f
VOH = f (VIL)
V(y)=V(x)
VOL = f (VIH)
V(y)
"1" VOH Slope = -1
VOH
VIH
v0 v1 v2 v3 v4 v5 v6
v2
5
v0
V (volts)
1 v1
-1
0 2 4 6 8 10
t (nsec)
ECE 4121 Design Metrics.16
Conditions for Regeneration
v0 v1 v2 v3 v4 v5 v6
v1 = f(v0) v1 = finv(v2)
v3 f(v) finv(v)
v1 v1
v3
finv(v) f(v)
v2 v0 v0 v2
For good noise immunity, the signal swing (i.e., the difference
between VOH and VOL) and the noise margin have to be large
enough to overpower the impact of fixed sources of noise
Ri =
Ro = 0
g=-
Fanout =
Vin
ECE 4121 Design Metrics.22
Delay Definitions
Vin Vout
Vin
Propagation delay
input 50% tp = (tpHL + tpLH)/2
waveform
t
tpHL tpLH
Vout
90%
output
50% signal slopes
waveform
10%
t
tf tr
C
vin
Time to reach 50% point is
t = ln(2) = 0.69
SYSTEM
MODULE
+
GATE
CIRCUIT
Vin Vout
DEVICE
G
S D
n+ n+
Gate oxide
Polysilicon
Gate
Source Drain Field-Oxide
n+ n+ (SiO2)
p substrate
p+ stopper
Bulk contact
VDD
Vin Vout
CL