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  • Chemical Vapor Deposition

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    Kulwant Nagi
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    CVD system for the Deposition of Silicon. Simple prototype thermal CVD reactor. Simple model of the surface of the wafer during silane CVD includes adsorbed siH4 and silane.

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    CVD system for the Deposition of Silicon. Simple prototype thermal CVD reactor. Simple model of the surface of the wafer during silane CVD includes adsorbed siH4 and silane.

    Copyright:

    Attribution Non-Commercial (BY-NC)
    Download as PPT, PDF, TXT or read online from Scribd
    Flag for inappropriate content
    74 views2 pages

    Chemical Vapor Deposition

    Uploaded by

    Kulwant Nagi
    CVD system for the Deposition of Silicon. Simple prototype thermal CVD reactor. Simple model of the surface of the wafer during silane CVD includes adsorbed siH4 and silane.

    Copyright:

    Attribution Non-Commercial (BY-NC)
    Download as PPT, PDF, TXT or read online from Scribd
    Flag for inappropriate content
    of 2

    A Simple CVD System for the Deposition of Silicon

    A simple prototype thermal CVD reactor.

    SiH 4 ( g ) → Si( s ) + 2 H 2 ( g )
    Chemical Equilibrium and the Law of Mass Actiono

    A simple model of the surface of the wafer during silane CVD includes
    adsorbed SiH4 and SiH2.

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