Professional Documents
Culture Documents
Source
Vein
Artery Valve
Gate
Drain
Emitter
Collector
Base
P W +
N W +
Vappl > 0
Vappl < 0
Holes from P region (Emitter) of 1st PN junction driven by FB of 1st PN junction into central N region (Base) Driven by RB of 2nd PN junction from Base into P region of 2nd junction (Collector)
The metal-oxide semiconductor field-effect transistor (MOSFET) : the gate is insulated from the channel by a silicon dioxide (SiO2) layer
D-MOSFET
Channel may be enhanced or restricted by gate voltage
E-MOSFET
Channel is created by gate voltage
If the MOSFET is an nchannel or nMOSFET, then the source and drain are 'n+' regions and the body is a 'p' region.
If the MOSFET is a pchannel or pMOSFET, then the source and drain are 'p+' regions and the body is a 'n' region.
A cross section through an nMOSFET when the gate voltage VGS is below the threshold for making a conductive channel; there is little or no conduction between the terminals drain and source; the switch is off. When the gate is more positive, it attracts electrons, inducing an n-type conductive channel in the substrate below the oxide, which allows electrons to flow between the n-doped terminals; the switch is on
VSG > 0 n type operation VSG Gate Insulator More electrons Source Channel Substrate Drain VSD
Positive gate bias attracts electrons into channel Channel now becomes more conductive
D VGS1>Vt
ID
increasing VGS
n+
n+
D VGS2>VGS1 G n+
n+
cut-off
D VGS3>VGS2
VDS
0.1 v
n+
n+
Increasing VGS puts more charge in the channel, allowing more drain current to flow
As the drain voltage increases, the difference in voltage between the drain and the gate becomes smaller. At some point, the difference is too small to maintain the channel near the drain pinch-off
body B
source S
gate G
- +
drain D
VDS large
metal
oxide
n+ p
n+
V G 0 0
V G 0 0
VG 0
VG VD
Cut-off: VGS<
VT
Triode: VGS>VT
and VDS < VGSVT
Saturation:
VGS>VT and VDS > VGS-VT
Whats an IGBT ?
IGBT(Insulated Gate Bipolar Transistor) is a voltage-controlled power transistor,
THE DRAIN OF THE MOSFET CHANGES THIS UNIPOLAR DEVICE INTO BIPOLAR JUNCTION TRANSISTOR.
NN+ P+
GATE
EMITTER COLLECTOR
Structure Of IGBT
Equivalent Circuit
TURN-ON
The presence of the substrate creates a junction J1 between the P+ and the N zone of the body. When the positive gate bias allows the inversion of the P base region under the gate, an N channel is created, with a flow of electrons, generating a current in the exact same way as a Power MOSFET.
TURN-OFF
When a negative bias is applied to the gate or the gate voltage falls below the threshold value, the channel is inhibited and no holes are injected in the N- region.
REVERSE BLOCKING
When a negative voltage is applied to the collector then J1 is reverse biased and the depletion layer expands to the N- region.
FORWARD BLOCKING.
When gate and emitter are shorted and a positive voltage is applied to the collector terminal the P/N- theJ3 junction is reverse biased. Again it is the depletion layer in the Ndrift region that withstands the voltage applied
Transportation
-Ignition control, Battery charger
IH-Cooker
4|00
MWO
21 /4 5
10
POWER 1
GTO
HIGH FREQUENCY
IGBT BJT
0.1 1 70 FREQUENCY
MOSFET
1000KHZ
22 /4 5
THANK YOU