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phys. stat. sol. (a) 205, No. 8, 2075 – 2079 (2008) / DOI 10.1002/pssa.200778939

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applications and materials science
ZnO/SiO2 nanocomposite thin films
by sol–gel method
V. Musat*, 1, E. Fortunato**, 2, S. Petrescu1, and A. M. Botelho do Rego3
1
Department of Metals and Materials Science, “Dunarea de Jos” University of Galati, 47 Domneasca, 800008 Galati, Romania
2
Department of Materials Science, CENIMAT, Faculty of Sciences and Technology, New University of Lisbon, Campus da Caparica,
2829-516 Caparica, Portugal
3
Department of Chemical and Biological Engineering, CQFM, Technical University of Lisbon, 1049-001 Lisbon, Portugal

Received 6 August 2007, revised 19 June 2008, accepted 20 June 2008


Published online 21 July 2008

PACS 73.63.Bd, 78.66.Sq, 81.05.Dz, 81.20.Fw


*
Corresponding author: e-mail viorica.musat@ugal.ro, Fax: +40 2 36 460754
**
e-mail elvira.fortunato@fct.unl.pt, Fax: +351 212 948 558

In recent years ZnO/SiO2 nanocomposite thin films have at- the results on mesoprous ZnO/SiO2 nanocomposite thin films
tracted much attention for a wide range of device applications obtained by sol – gel method using three different ways of the
based on their specific optical and electrical properties. sol preparation. The effect of the sol preparation on the zinc-
Mesoporous silica nanocomposite with controllable variation doping states of the thin films is discussed based on X-ray
of size and shape of pores is the most challenging system for photoelectron spectroscopy. The crystalline structure, mor-
the generation of stable oxide semiconductive nanoparticles phology, optical transmittance, optical band gap, electrical
with controlled size and shape and subsequently with con- properties and room temperature photoreduction-ozone re-
trolled optical and electrical properties. This paper presents oxidation properties of these films are presented.

© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

1 Introduction Nanostructured ZnO-based semicon- In recent years, the silica-based nanocomposites are
ductive thin films have a very wade range of applications considered the most challenging systems for the quantum
based on very interesting properties depending on crystal- confinement of semiconductive nanocrystallites, for a bet-
lite size. In recent years, these low-cost and no-toxic thin ter control of shape, size and properties [5]. Preparation of
films are intensively investigated to replace very expensive ZnO nanoparticles confined in silica matrix is investigated
materials in different application [1–7], such as indium for high UV luminescence at room temperature [8]. Zinc
thin oxide (ITO) in solar cells and flat DCL devices [1, 2, oxide known as a luminescent material is today used for
6] and GaN in broadband UV photodetectors with high various applications such as vaccum fluorescent displays
tunable wavelength [3]. Important applications of UV de- [8, 9]. Mesoporous silica-based nanocomposite films are
tector are research-missile warning systems, high tempera- very important materials also for gas-sensing applications.
ture flame detection, air quality monitoring, gas sensing [4], The well controlled mesoporosity of silica matrix provides
accurate measurement of radiation for the treatment of UV a path for the gas molecules to reach the functional oxide
irradiated skin. High excitonic binding energy (approx. nanoparticles and the films show reversible change in re-
60 meV) of ZnO provides efficient excitonic emission at sistance and/or optical transmittance in the VIS-NIR range
room temperature used for laser with low thresholds even when exposed to gases. Various porous metal oxide-silica
at low temperature. In addition, the efficient blue-green nanocomposite films with enhanced gas-sensitive proper-
emission at room temperature, makes ZnO very important ties have been proposed for gas sensors [5, 6, 8, 9].
for the fabrication of practical devices like light emission Different chemical methods are investigated for the
diodes, laser diodes, and solar cells [5]. ZnO transparent generation of different nanoparticles inside a SiO2 matrix,
thin films transistors (TTFTs) are a very recent develop- which can act as a capping agent for the semiconductive
ment also [7]. nanoparticles [10–14]. The sol–gel method is one of the

© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim


pss a

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physica

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2076 V. Musat et al.: ZnO/SiO2 nanocomposite thin films by sol – gel method

most efficient chemical method for the preparation of ox- spectrophotometer (Shimadzu, UV-3100 PC) in the wave-
ide and silica based nanocomposite thin films and repre- length range 200 nm to 2500 nm. From the optical meas-
sents a simple and low-cost processing alternative to the urements, the optical energy gap, Eg, was calculated as-
vacuum deposition techniques [1–3, 5–8]. This paper pre- suming a direct transition between the edges of the
sents some results on ZnO/SiO2 nanocomposite thin films valence and the conduction bands, for which the varia-
obtained by sol–gel method using three different ways of tion in the absorption coefficient, α, with photon energy,
the sol preparation. The optical, electrical and UV/gas hν, is given by the equation:
sensing properties of ZnO/SiO2 nanocomposite films are
(αhν)2 = B(hν – Eg) . (1)
discussed in relation with their crystalline structure, mor-
2
phology and zinc-doping states. By plotting (αhν) versus hν, and extrapolating the linear
region of the resulting curves, Eg was obtained.
2 Experimental
2.1 Films preparation The sols used for films depo- 2.3 Sensing test The photoreduction – gas (ozone)
sition were prepared starting from a pre-hydrolyzed tetra- reoxidation sensing behavior of thin films was investigated
ethoxysilicate (TEOS) ethanolic solution, to which cetyl by electrical measurements at room temperature, which were
trimethylammonium bromide (CTAB) as surfactant was carried out in a special chamber presented elsewhere [17].
added. The molar ratio of TEOS:C2H5OH:H2O:HCl: The conductivity of the films increases by photoreduction,
CTAB was 1:25:7:0.14:0.05. Starting from this solutions, when the films were directly irradiated in vacuum by the UV
the following sols were prepared by: light of a mercury pencil lamp with an average intensity of
– direct dissolution of zinc acetate solid salt (Sol I); 4 mW/cm2 at 254 nm for 20 min and then decreases when
– adding of zinc acetate sol (preparation in [15] (Sol II); the films are exposed in an ozone atmosphere. First the film
– adding of ZnO nanoparticles prepared according to was exposed at UV light irradiation and after that, the cham-
– [16] (Sol III). ber was backfilled with oxygen at a pressure of 600 Torr and
The thin films (two layers) were deposed on Corning an UV lamp was used to produce ozone (the films are
1737 glass substrate by dip-coating technique with differ- shielded from the lamp). The films were maintained for
ent withdrawal speed (Table 1). 40 min in this ozone atmosphere, when the re-oxidation of
After each layer deposition, the gel films were dried zinc oxide crystallites results in a decrease of the film con-
for 30 min at 70 °C and then pre-heated in air for 10 min at ductivity. An electric field of 50 V/cm was applied to the
350 °C. The stabilized films were then post-heat treated film sample and the electrical current was measured.
1 hour in air at 500 °C for crystallization. Zn concentration
on the surface of the films prepared using sol I, II and III 3 Results and discussion Thicknesses of about 190
were measured by X-ray photoelectron spectroscopy and 290 nm have been measured from the ellipsometric
(XPS) technique (Table 1). data (not presented in this paper) for the crystallized films
(two layers) deposed with withdrawal speed of 20 cm/min
2.2 Films characterization The X-ray diffraction and 30 cm/min, respectively. The XPS photoelectron spec-
(XRD) patterns of the samples were recorded at room tem- tra of Zn 2p3/2 region (Fig. 1) show Zn–O–Si
perature using a Rigaku diffractometer (model RAD IIA),
with Cu Kα radiation. The morphology on the surface of
S1
the films was analyzed using the atomic force microscopy 10000 S2
(AFM). Tapping mode AFM experiments were performed
S3
in a Nanoscope IIIa Multimode AFM microscope (Digital
Instruments, Veeco). Commercial etched silicon tips with S4
8000 S5
Intensity, a.u.

typical resonance frequency of ca. 300 Hz (RTESP,


Veeco) have been used as AFM probes. The optical trans- S6
mittance was measured using a UV–VIS-NIR double beam
6000
Table 1 Experimental conditions and zinc concentration.

sample sol number film deposition chemical composition*


4000
cod (cm/min)
S1 I 20 16.4
S2 I 30
2000
S3 II 20 31.0
S4 II 30 1032.0 1027.0 1022.0 1017.0 1012.0
S5 III 20 4.6 Binding Energy, eV
S6 III 30
Figure 1 (online colour at: www.pss-a.com) Zn 2p XPS photo-
*
Zn concentration (wt%) calculated from XPS data. electron peaks.

© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim www.pss-a.com


Original
Paper

phys. stat. sol. (a) 205, No. 8 (2008) 2077

8 00 0

S1
S2
6 00 0 S3
S4
Intensity, a.u.

S5
S6
4 00 0

2 00 0

0
9 75 98 0 98 5 99 0 9 95 1 00 0
B in d in g En ergy , e V

Figure 2 (online colour at: www.pss-a.com) Zn LMM Auger


peaks for samples S1 – S6.

bonds in all the films. Zn peaks are narrower for the sam-
ples S3 and S4 than for the other samples, indicating a
smaller dispersion of neighborhoods for ZnO. The most
charged samples S1–S2 and S5–S6 are more insulating
and the ones where the hole trapping is more efficient.
The XPS quantitative results show that samples S3 and
S4 are also the samples where the zinc oxide embedding
was more efficient. The Zn LMM Auger peaks (Fig. 2)
confirm and highlight the difference in binding energy
value for zinc atoms in the samples S3–S4 comparative
with the others films.
The XRD patterns of the thin films deposed using the
sol II at 20 cm/min and 30 cm/min (samples S3 and S4) are
presented in Fig. 3 and show wurtzite tipe ZnO nanocrys-
talline phase with preferential (100) crystalline orientation,
embedded in an amorphous silica matrix. The thin films Figure 4 (online colour at: www.pss-a.com) AFM images on the
deposed at lower withdrawal speed or using the sols I and films surface of samples S3 and S4 (scale in nm).
III didn’t show well defined peaks of ZnO phase.
The AFM images (Fig. 4) show cracks free mesopor- The optical transmittance spectra (Fig. 5) show a good
ous films morphology with quasi-regularly shaped grains transmittance (between 85% and 95%) in the UV–VIS and
and regular roundish pores size; higher withdrawal speed a NIR regions and a significant blue shift of the absorption
little higher grain size and pore size. bands.
Figure 6 presents the optical energy gap (Egap) calcula-
700 tions for the thin films prepared using the three mentioned
ZnO (100)

600 S2
100
500
200
S4 S6
80 S4
Transmitance(%)
Intensity (a.u.)

Intensity (a.u.)

400 20
S3 60
Transmitance (%)

15
300
ZnO (200)

100
40 10

200 S6
5 S2
20 S4
30 31 32 33 34 35
0
100 2Theta (deg.)
2 00 22 0 24 0 26 0 28 0 3 00 3 20
0 W a ve le ng th (n m )
0
20 25 30 35 40 45 50 55 60 65 70 0 500 1000 1500 2000 2500
2Theta (deg.) Wavelenght(A)

Figure 3 XRD patterns of the samples S3 and S4. Figure 5 Optical transmittance spectra of samples S2, S4, S6.

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pss a

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2078 V. Musat et al.: ZnO/SiO2 nanocomposite thin films by sol – gel method

1.00¥1016 1 0 −5

S2 S2
8.00¥1015

Conductivity (Ω cm )
-1
1 0 −6
2

6.00¥1015
(ahn) (eV/cm)

-1
1 0 −7
4.00¥1015
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Eg=4.859 eV 1 0 −9
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0 1 2 3 4 5 6 T im e (min )
hn (eV)
8.00¥1015 1 0 −5
2
(ahn) (eV/cm)

S4 S4

Conductivity (Ω cm )
-1
6.00¥10 15
1 0 −6
2

-1
4.00¥1015
1 0 −7

2.00¥1015
1 0 −8
0
Eg=4.264 eV
1 0 −9
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0 1 2 3 4 5
T im e (min )
hn (eV)
8.00 ¥1015 1 0 −5
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(eV/cm)

S6 S6
Conductivity (Ω cm )

6.00 ¥1015
-1

−6
10
-1
2
( ah n )

4.00 ¥1015
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Figure 6 Band gap calculation for samples S2, S4 and S6. Figure 7 Photoreduction – ozone reoxidation cycles for samples
S2, S4 and S6.
sols and deposed at 30 cm/min. Very small differences (de-
crease) have been observed for the Eg values of the films de- deposed at withdrawal values of 30 cm/min. All the films
posed at 20 cm/min. The band gap values are very high at have a reversible room temperature behavior during UV ir-
room temperature. The blue shift of the band gap from that of radiation followed by re-oxidation in ozone atmosphere.
bulk ZnO (3.3 eV) towards 4.26 eV for sample S4, confirm From Fig. 7, it can be noticed a slight increase in
that an effective capping of the ZnO nanoparticles in the changing rezistivity response to over three orders of mag-
SiO2 matrix of the nanocomposite films have been obtained. nitude, once with the growth of zinc oxide concentration
This significant blue shift of the ZnO band gap energy (sample S4).
demonstrating the quantum confinement effect of ZnO
nanoparticles in the silica or alumina host matrix has been 4 Conclusion Zinc oxide silica-based nanocomposite
also reported by other authors [8]. Much smaller zinc oxide mesoporous thin films were prepared by sol–gel method
nanocrystallites (clusters) and/or higher cross links Zn– using three different ways of sol preparation: direct disso-
O–Si binder energy [10, 12] for the samples S1–S2 and lution of zinc acetate salt (I), adding of zinc acetate sol (II)
S5–S6 (Fig. 1) led to a higher carrier confinement for and adding of ZnO nanoparticles (III) to a pre-hydrolyzed
these silica-based nanocomposite films and a much higher tetraethoxysilane (TEOS) ethanolic solution, to which cetyl
blue shift of the band gap energy (S2 and S6 in Fig. 6). trimethylammonium bromide (CTAB) as surfactant was
Figure 7 presents the UV photoreduction-ozone reoxi- added. For each method, the stability of the resulted sol led
dation cycles of the film prepared using the sols I, II and III, to different zinc concentration. Values of 16.4, 31.1 and

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Original
Paper

phys. stat. sol. (a) 205, No. 8 (2008) 2079

4.6 wt% were obtained for the thin films prepared by meth- [2] S. Fujihara, C. Sasaki, and T. Kimura, Appl. Surf. Sci. 180,
ods I, II and III, respectively. In the films with larger con- 341 (2001).
centration of zinc (31.1 wt%), (100) oriented wurtzite type [3] C. R. Ding, S. W. Li, and H. Z. Wang, Appl. Phys. Lett. 90,
ZnO nanocrystallites were detected. These are the samples 241918 (2007).
where the zinc oxide embedding was more efficient. [4] W. Shen, Y. Zhao, and C. Zhang, Thin Solid Films 483, 382
All the films are high transparent. Optical transmit- (2005).
[5] S. Chakrabarti, D. Das, D. Ganduli, and S. Chaudhuri, Thin
tance between 85% and 95% within the visible and near IR
Solid Films 441, 228 (2003).
wavelength region has been obtained. The blue shift of the
[6] L. Armelao, D. Barreca, S. Gross, A. Martucci, M. Tieto,
band gap towards 4.2 eV for samples prepared using sol II, and E. Tondello, J. Non-Cryst. Solids 293 – 295, 477 (2001).
confirm that an effective capping of the ZnO nanoparticles [7] B. J. So, Noris, J. Anderson, J. F. Wager, and D. A. Keszler,
in the SiO2 matrix of the nanocomposite films have been J. Phys. D, Appl. Phys. 36, L105 (2003).
obtained. Much smaller zinc oxide nanocrystallites (clus- [8] S. Chakrabarti, D. Ganguli, and S. Chaudhuri, phys. stat. sol.
ters) and/or higher cross links Zn–O–Si binder energy for (a) 201, 2134 (2004).
the samples prepared using sols I and III led to a higher [9] W. C. Chen, Mater. Lett. 59, 1239 (2005).
carrier confinement for these nanocomposite films and a [10] L. I. Burova, D. I. Petukhov, A. A. Eliseev, A. V. Lukashin,
much higher blue shift of the band gap (4.85 and 5.03 eV, and Yu. D. Tretyakov, Superlattices Microstruct. 39, I257
respectively). (2006).
All the investigated films revealed a consistent reversi- [11] D. Haranath, N. Bhalla, H. Chander, R. Meenakshi Kar, and
ble room temperature change in electrical resistance during R. Kishore, J. Appl. Phys. 96, 6700 (2004).
UV irradiation followed by re-oxidation in ozone atmos- [12] D. M. Abdullah, S. Shibamoto, and K. Okuyama, Opt. Ma-
phere. The magnitude of the sensing response (resistivity ter. 26, 95 (2004).
[13] B. Yao, H. Shi, H. Bi, and L. Zang, J. Phys.: Condens. Mat-
variation during the photoreduction – reoxidation cycles) is
ter 12, 6265 (2000).
slightly depending on zinc concentration. Higher zinc con-
[14] Y. Y. Peng, T. E. Hsieh, and C. H. Hsu, Nanotechnology
centration higher photoreduction – oxidation response 17, 174 (2006).
(three order of magnitude in resistivity variation). [15] V. Musat, B. Teixeira, E. Fortunato, R. C. C. Monteiro, and
P. Vilarinho, Surf. Coat. Technol. 180/181, 659 (2004).
Acknowledgement This work was supported by NATO
[16] P. Elumalai, H. N. Vasan, and N. Munichandraiah, Mater.
Expert Visit Grant PDD(CP)-CBP.EAP.CLG 982806 /2007.
Res. Bull. 39, 1895 (2004).
[17] A. Pimentel, E. Fortunato, A. Gonçalves, A. Marques,
References H. Águas, L. Pereira, I. Ferreira, and R. Martins, Thin Solid
[1] S. Bandyopadhyay, G. K. Paul, and S. K. Sen, Sol. Energy Films 487, 212 (2005).
Mater. Sol. Cells 71, 103 (2002).

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