Professional Documents
Culture Documents
3-1-1988
Recommended Citation
Meisenzahl, Eric J., "A Test chip approach to routine process control" (1988). Thesis. Rochester Institute of Technology. Accessed from
This Thesis is brought to you for free and open access by the Thesis/Dissertation Collections at RIT Scholar Works. It has been accepted for inclusion
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A..IEST CHIP APPROACH
TO ROUTINE PROCESS CONTROL
by
Eric J. Meisenzahl
A Thesis Submitted
in
Partial Fulfillment
of the
Requirements for the Degree of
MASlER OF SCIENCE
In
Electrical Engineering
Prof. R. Turkman
Dr. Ri. turkman (Committee)
Prof. S. Ramanan
Dr. S. Ramanan (Committee)
DEPARTMENTOFELECIRICALENGINEERING
COLlEGE OF ENGINEERING
ROCHESlER INSTl1UIE OF lECHNOLOGY
ROCHESlER, NEW YORK
MARCH, 1988
I
PREFACE
chip using the smallest (and densest) geometries with the lowest
power. New and novel circuits are born every day to perform a
is that the device becomes the reference standard for all future
generations.
But what if you cannot fabricate this device with the yields
11
that as much attention needs to be focused on the manufacturing
'process
control'
report.
PROCESS -
The series of fabrication steps required to define
integrated circuits.
PROCESS AREAS -
The areas responsible for the fabrication of a
RUN -
A group of device wafers processed at the same time with the
PROCESS CONTROL -
The techniques used by the process areas during
fabrication to evaluate and quantify processing steps. An
'control'
example might be to insert a virgin wafer called a into
'control'
a furnace during an oxidation and then analyzing the
PROCESS YIELD -
The fraction of wafers meeting the designed
in
A study was subsequently launched to (1) evaluate present
'test'
It was deduced that an electrically testable chip was
necessary that would require very short processing times and was
factors that went into designing the test chip. Included are the
design tools used, the reticle and mask making (and formats used),
IV
this concept of process control. Lastly, a brief word on future work
technologies.
ABSTRACT
specially designed test chip. The test chip is designed for use in
Institute of Technology.
vi
TABLE OF CONTENTS
Page
List of Figures ix
I Introduction 1
II Literature Search 3
IV Mask Making 1 2
V Test Structures 1 5
VI Chip/Wafer Layout 39
IX Test Programs 54
XIII Conclusion 9 1
XV References 96
vn
TABLE OF CONTENTS (cont.)
Page
vm
LIST OF TABLES
Page
tl Mask Dimensions 1 4
14 Serpentine Dimensions 29
t5 Comb Dimensions 3 1
IX
LIST OF FIGURES
Page
f1 Probe Pads 1 6
f2 Alignment Marks 1 7
f3 Resolution Charts 1 8
f4 Verniers 20
f 15 Wafer Layout 42
f1 7 CV Test System 49
Page
f 24 Serpentine/Comb Yield (Process 1) 77
f27 CVPlot 1 1 3
f2 8 CVBT Plot 1 14
f29 CTPlot 1 1 5
f3 0 Zerbst Plot 1 1 6
XI
I -
INTRODUCTION
'controls'
associated with.
The problem with this technique is that many times the control
does not accurately reflect the actual device parameter. In the case
'controls'
process control stands. Many of these are measured using
monitors, etc) which can be accurate for some aspects of the device
performance.
time before being discovered and corrected. This means that runs
process control test chip, considering all the variables and processes
'invisible'
to optical or visual type tests. Other tests such as four
materials.
It was identified that several degrees of measurement
the more data points the better. The type of sampling discussed here
series of contact hole size test structures above and below the
testing and failure analysis would all have to work together in order
for this concept to be effective. The sequence of (1) fabricate the test
chip, (2) test the device and (3) analyze/record data must be
conclusive results.
A literature search of suitable test structures and algorithms
amount of
processing steps and thus limits the time required
and kind of equipment necessary for test and also means that
one test structure requiring a very large area was desired. The
test pads (or probe pads) should be large and their layout
been around since the conception of the field effect devices. The
solid state device he called the MOS diode) using the capacitance-
extracted from MOS capacitors reveals just how powerful a test tool
There were still difficulties in using these tests, however, because the
der Pauw test structure. In the late 1950's, van der Pauw introduced
shaped disc17. This theory has allowed for the determination of film
development of the electrical line width test structure which has now
been widely used for many years. By knowing the sheet resistance
line intra-
Shorting mechanisms and width continuity, whether
limitations20*21'22*23
evaluate design rule (among many) and usually
mechanisms -
the serpentine looks to see if line width can be
be determine inter-
could the substrate), in assorted configurations,
(5) threshold voltage. Items (3), (4) and (5) can be determined on
PN junction.
8
due it's RIT and that of
to inconsistency with the process capability
in which a circuit is drawn out on. The test chip uses the maximum
generated for the test chip can be found in the RIT Microelectronic
EJM3561.
include Process 1 -
conductors on insulators on silicon (one masking
step), Process 2 -
conductors on etched back insulators on silicon
the substrate and contacts (three masking steps). The five mask
METAL, 2 -
OXIDE, 3 -
CC (contact), 4 -
DIFF (diffusion), and 5 -
EXTRA (a second metal mask). Since the RIT IC lab was to be the
10
fabrication facility of choice for the project, a lOuM design rule limit
was agreed upon. This did not mean that all line widths and spaces
yield would be evaluated above and below the design rule limit.
1 1
IV -
MASK MAKING
'MANN'
files (the format used by the MANN mask making equipment) which
The ticker tape can then be read by the MANN 3000 Pattern
Generator. The pattern generator creates master reticles that are ten
MANN 3000.
The master reticles used for the test chip were IMTEC POL-
3x3x.06" 'normal'
in dimension. A positive or developing process is
marks'
photorepeating.
first is that the lOx reticle is reduced to lx size or actual drawn ICE
marks'
reticle using the 'fudicial and focusing the reticle images onto
12
another photosensitive glass plate which eventually becomes the
(which holds the mask) and exposure trigger which are all user
for details.
to fabricate the test chip because that was the lithographic process
most widely used in the RIT lab. Since the developing of masks is
which will be explained later. Notice that the three masks developed
'reverse'
with the processing (OXIDE, METAL, EXTRA) all have line
widths that are lower than designed whereas the two masks
'normal'
developed (CC, DIFF) had line widths that were larger than
13
designed. Even though the masks are not exactly as desired, this
6uM 4.5uM
lOuM 8.3uM
METAL 2uM
6uM 4.2uM
lOuM 7.4uM
6uM 6.8uM
lOuM 11.2uM
CC 2uM 3.3uM
6uM 6.2uM
lOuM 10.4uM
6uM 5.0uM
lOuM 8.7uM
Table tl -
Mask Dimensions
14
V -
TEST STRUCTURES
included on the test chip and an explanation of what their purpose is.
The design considerations that went into the finalized design are
test structure and the parameters generated by the test (as found in
the test programs) are listed. The methods of test and testing limits
(1) -
PROBE PADS
Purpose -
Determine the fixed size and spacing of probing pads
Process: 1,2,3
The size of the probe pads are large (lOOuM x lOOuM) which
reduces the risk of probing failures28. Spacing between the pads are
also large to allow room for test structure layout. The number of
pads (four) was chosen to allow for testing of a large group of square
15
allow for easier manual
probing capability. This layout is maintained
100uM 100uM
100uM
iOCuM 300uM
300uM
Figure fl -
Probe Pads
(2) -
ALIGNMENT MARKS
Purpose -
To align masks during photolithographic exposure
Process: 2,3
those found in the RIT MICRO.LIB macros3. Their size and shape are
such that masking levels are easily aligned even if line widths or
16
etching are out of control. Small marks are made nearby to assist the
user in aligning the correct mask to the correct process. There are no
one set in process 2 between the OXIDE and METAL masks, and two
"* 108 jM ?
12uM
,
t
2
I o
U 12uM
I
12uM
Figure f2 -
Alignment Keys
(3) -
RESOLUTION CHARTS
Purpose -
To provide assistance to the process engineer during
photolithographic and etching steps to optically determine line width
extrares.cif, metalres.cif
17
Test type: Optical
Process: 1,2,3
series consists of four legs of which two of the legs are extended
effect.
io
CO
2 4 8 10
Figure f3 -
Resolution Charts
(4) -
VERNIERS
Purpose -
To assist the process engineer during photoresist
18
ICE file(s): verccxO.cif, verccxl.cif, verccyO.cif
of two parts which I will call the right hand side (RHS) and the left
hand side (LHS) as seen in f4. The RHS or clear section reside on the
masking level after the mask level of the LHS or shaded section. The
LHS consists of lOOuM x lOuM lines that are equally spaced lOuM
apart. A tab is placed at the center line (CL) for user registration
purposes. The RHS consists of identical lOOuM x lOuM lines but are
be perfectly aligned. The way the test structure works is that, with
19
dimensional vectors to describe wafer or die-die variability provided
you have the time and desire to map this out manually. There are no
verniers for Process 1 (only one masking step), one set for process 2
between the OXIDE and METAL masks, and three sets for Process 3
between CC and DIFF masks, between EXTRA and DIFF masks and
100uM 100uM
-*~4-
3 +3uM
1 +2uM _ _
o
c
o
c 1 +1umE |
Hi 3 0 uM-g =
m
2 3 -1uMS
(0
3 -2uM
J -3uM
_ + + +
OJ INJ -*
-*
M OJ
c c c c c c c
2 S 2 S 2 2 2
Figure f4 -
Verniers
(4) CAPACITORS
Purpose -
Capacitors are used to determine a large number of
20
Process: 1,2,3
Delta_tox, Defect_density
(Other parameters determined during
CV testing are found in Appendix C)
400uM, 600 x 600uM and 800 x 800uM. Their layout is such that
the same probe card or probe spacing can be used as all the other
test structures. The sizes of the capacitors were chosen for two
on oxide thickness). On the other hand, too large a capacitor area can
'track'
due to oxide pinholes or the inability of the capacitor to the
frequency. Process 1 uses two sets of these capacitors but only one
sets also, of which one set is used to monitor an etched oxide and the
21
theory and algorithms used to deduce the various parameters of this
study.
'minimum'
It is termed density because more than one defect could
control and are widely used in the industry. These plots can
threshold voltages, fixed oxide charge, mobile ion and heavy metal
(see Appendix C). These plots allow the process engineer to evaluate
22
require apparatus in addition to a capacitance meter (such as light
200 x 200uM
Figure f5 -
Capacitor Test Structure
Purpose -
To measure the sheet resistance of a conducting
23
Test type: Electrical
Process: 1,2,3
effects and bulk, surface and oxide leakage currents18. The test
(I) is passed through one adjacent pair of legs while the voltage
The dimensions of the two van der Pauw test structures follow ASTM
the masks and as seen in f6a and f6b. Bm is the distance between
the current carrying pads and the voltage sensing pads while Cm is
24
.Am Em Cm. Dm
Table t2 -
van der Pauw Test Structure Dimensions
Purpose -
To determine the line width of conductors by
Process: 1,2,3
25
knowing the actual drawn mask dimensions, one can then deduce
(I) is passed through the two current carrying legs (labeled II and
12) while the voltage difference (V) is measured between the two
voltage legs (labeled VI and V2). The line width can then be
W delta =
Wmask -
Wiinewidth [uM] [3]
The lwl5_1000 line width test structure, as seen in f7b, has a much
26
AID Bm Cm Dm Wm Lm # squares between VI. V2
Table t3 -
Am
Wm
Linewidth 1 Linewidth 2
Figure 7a -
LW30_100 Figure 7b -
LW15.1000
(8) -
SERPENTINES
Purpose -
Process: 1,2,3
27
negligible. If the impedance is high, then it can be assumed that the
will depend on sheet resistance, line length and line width) then it
the line width itself to insure that it is line integrity that is evaluated
'bridge'
cause a shorting between two adjacent conductors which
resistance, line width and line length were known, one could
A series of three serpentines are used for the test chip with
the substrate.
28
Test Structure Linewidth Pitch Line length # Squares
Table t4 -
Serpentine Dimensions
4000uM
[
I
[
[
[
Linewidth =
5, 10, 15uM
Figure f8 -
Serpentine Test Structure
(9) -
COMBS
Purpose -
Comb test structures are used to evaluate the ability
29
Test structure(s): COMB5,COMB10,COMB15
Process: 1,2,3
it can be assumed that the space between the combs was maintained.
'bridge'
the comb lines which may result and skew the results.
A series of three combs are used for the test chip with spaces
30
the substrate. The COMB 10 structure on the DIFF mask has a
masking defect that cuts out part of the 'comb'. This defect does not
render the structure useless but rather, it reduces the area in which
Table t5 -
Comb Test Structure Dimensions
4000uM
10, 15uM
40uM
Figure f9 -
Comb test structure
(10) -
CONTACT HOLES
Purpose -
To determine the ability of a process to make various
31
ICE file(s): contactl.cif, contact2.cif
Process: 3
There are two contact hole test structures that are active only
The two nodes are joined by the contact hole. If the contact hole is
and thus capability is exceeded. Both test structure layouts are such
three contact hole size tests per structure using the remaining three
each other to avoid the depletion regions from meeting each other.
32
3 x 3uM -CONT1
DFF
CC
Figure flO -
Contact Hole Test Structures
(11) -
CONTACT RESISTANCE/DIODE
Purpose -
To measure the contact resistance between a
Figure fli.
Process: 3
33
The test structure consists of four highly symmetric legs. Two
of the legs are made from diffusions or ion implants in the substrate
and are joined at the center. The other two legs are made from an
isolated conductor and are also joined at the center. Contact between
the diffusion legs and the overlying conductor legs is made through a
requires that the four arm lengths be larger than the arm line width
difference (V) between the other pair. The contact resistance is then
The diode tests are made using the two attached diffusion legs
of the test structure. The tests that are performed on the diode, such
different forward current (12 where I2>I1) is applied and the voltage
34
(V2) at which this new condition is satisfied is measured. The
FDR =
(V2-V1)/(I2-I1) [ohms] [5]
EXTRA
H DIFF
? oc
30uM
Figure fli -
Contact Resistance/Diode Test Structure
(12) -
ETCHBACK TEST REGIONS
Purpose -
To measure the etch rate and uniformity of a
measure and quantify the ability to produce lines and spaces in the
presence of topography
-
a step coverage test.
35
ICE file(s): topo.cif
Process: 2
See fl2.
36
CAP2
Conductor
Unetched
D!i sulator
Etched
insulator
Figure fl2 -
Etchback Test Structure
regions of the insulator in the path of the serpentine and comb test
that cut the path where the serpentine and comb conductors run.
etchback, the ability to make lines and spaces over this topography
should vary and subsequently quantified by the comb and
37
| | Unetched
insulator
|s^sj Etched
insulator
Serp/Comb over
C\N\
^Mfe :538E8B3B3E&::'
unetched region
'^V\>
ii^ji^^Uii X^t> Serp/Comb over
etched region
^mIj^B^B ::::&&&$&;
"::-;^M*>>:*:BM
WX-1
^^*V\ s.
Figure fl3 -
38
VI -
CHIP/WAFER LAYOUT
The size of the wafers used in this study were three inches in
fl4a is a plot of the actual test chip and figure fl4b is a reference
chip. Figure fl5 shows die placement within the wafer. Since many
of the edge die are only partially fabricated, only those die (total of
36) that are shaded are tested for the analysis. An arbitrary X and Y
39
RIT
Figure fl4a -
Chip Layout
40
RIT
a ? 8
D000 ?
00 r?7i 13 14 15 16
17 23
18
24
19
9;
20
26
21
22 27
Figure fl4b -
Chip Layout
41
Major
Flat
Figure fl5 -
Wafer layout
42
VII -
PROCESS DESCRIPTIONS
were started for the three processes with each run consisting of six
thickness material.
except for source and drain diffusions. The capacitor test structures
density levels. The serpentine and comb test structures will evaluate
the ability to pattern and etch aluminum lines and spaces over a
large region. Finally, the van der Pauw and line width test structures
will quantify the sheet resistance and line width of the aluminum
43
respectively. Total estimated fabrication time, assuming equipment
angstrom field region and the other to monitor the MOS behavior in
conditions. The van der Pauw and line width test structures monitor
contact holes. The process starts off with a 5000 Ang wet field
completely removed and a new 5000Ang wet field oxide was grown.
Next, the oxide is patterned with a contact hole (CC) mask and the
oxide is again etched until the backside of the wafers are clear. This
44
indicates the point at which contact holes from the front of the wafer
evaluate MOS behavior of the thick oxide. Serpentines and comb test
the van der Pauw and line width test structures evaluate the sheet
which are used to evaluate the ability of the process to pattern and
the aluminum and the doped areas. This structure is also used to
approximately 11 hours.
45
Process 1 Process 2 Process 3
[ Full Clean ) ( Full Clean ) C Full Ctean )
?
^ Grow 600A Dry Oxide ) ( Grow 5000A Wet Oxide ) c Grow 5000A Wet Oxide )
?
^
Deposit 5000A Aluminum
) ( Mask level OXIDE ) c Mask level DIFF )
? 4
[ Mask level METAL ) ( Oxide Etch 2000A
) c Oxide Etch 5000A )
? 4
[ Etch Aluminum ) ( Strip Photoresist ) c Strip Photoresist )
t 4
C Strip Photoresist )(c eposit 5000A Aluminum ) c Quick Clean )
t
l Sinter )( Mask level METAL ) c P-Type Spin on Dopant )
? *
C Test )( Etch Aluminum ) c Dopant Drive In )
c Strip Photoresist )
*
f Deposit 5000A Aluminum )
*
c Mask level EXTRA
)
i
C Etch Aluminum )
c Strip Photoresist
)
*
c Sinter )
?
c Test )
Figure fl6 -
Process Flow Charts
46
VIII -
TEST SYTEMS
For this study, two test systems were designed to collect and
analyze data from the three processes described in Section VII. The
first test system, or the CV test system, is used for characterizing the
MOS behavior of the device using the capacitor test structures. This
tests for this project were performed at 1MHz. Other options consist
47
program itself consumes another 209kbytes. The computer has a
HP9122 dual disk drive which are both interfaced through the same
addition, a status byte can be read to verify that the desired switches
48
C HP9816 Computer)
K THINKJET Printer )
IEEE-488
Bus
( HP4277A LCZ Metei)
8.
SL ' '
u^ .
*J1. . \ Light control
\ Custom Circuitry J 1
Probe 3 P3
^ IT
a
o
a.
3
I -?Water out
O
Q. o
o
O E -Water
3
.C o Nitrogen
o x:
Figure fl7 -
CV Test System
'low'
49
metering is limited to +/-100V with maximum current sourcing or
sinking of 100mA (but not at +/-100V ==> see equipment manual for
are two voltage sources (no current metering capability and only
does not take long to realize the versatility and capability this
fl8.
50
controller is interfaced to all other equipment that supports the IEEE-
488 bus and acts as master controller during all tests and
supplied by the VS2 voltage source of the HP4145. The Y REC OUT of
51
The CYTEC switching matrix consists of a series of IEEE-488
SMU's (SMU1, SMU2, SMU3, SMU4), one voltage source (VS1) and one
voltage meter (VM1) from the HP4145, and the DRIVE and INPUT
signals from the PAR M410. The outputs connect to the four probe
pin 2, line 3 to pin 3 and line 4 to pin 4) and one to the substrate
(line 0). A total of five outputs are used with the remaining outputs
'step'
that aligns the probes to the probing pads of the device. The
computer also can lower or raise the probes onto the test structure
and read back the current position. Once a wafer is aligned to the
'home'
probes and a or reference location is stored, two kinds of
52
(^ HP981 7 Computer)
THINKJET Printer )
HP4145 Semiconductor
Z3
CM
J
5 >
CO co
XRECOUT YRECOUT
PAR M410 CV Plotter
DRIVE INPUT J
2 3 4 A
0 Substrate
Row
1 Pin 1
I RK681 Prober
Cytec 8x16 Matrix 2 Pin 2
iO 3 Pin 3
Pin 4
)
Figure fl8 -
DC Automatic Probing System
53
IX -
TEST PROGRAMS
correction of any situation such as run time and user input errors.
time because of
programming deficiencies. A second important
consists of easy to use and read, menu driven screens for driving and
'Softkeys'
techniques29
sampled, the use of statistical process control is
relevance of the data to the needs of the design. There are four
54
major techniques which are very well suited to IC processing -
(1)
histogramming, (2) wafer mapping, (3) trend charting and (4)
correlation and For the DC Automatic
variance analysis. Probing
test program, histogramming and wafer mapping are incorporated.
with the main menu screen. From the main menu, one can choose
55
the CV, CVBT, CT, Zerbst and Doping Profile programs, accessing
wafers.
sure all instruments on the IEEE-488 bus are responding and are in
proper working order. The hot chuck status is checked through the
custom circuitry module's status byte. The LCZ meter has internal
calibration and system self checks that can be read from the bus.
56
The zero meter option is used to zero the capacitance meter
with Probe #1 turned on thus zeroing out to the tip of the probes.
purpose of
running the test. These options include identification
the test can start. The test begins by biasing the capacitor with an
parameters at which time the light inside the the dark box is pulsed.
The specified voltage ramp now begins with a delay time between
ramp finishes, the capacitor is again biased into accumulation and the
57
wrong. The remaining CV parameters are derived and calculated
menu contains the same user options as the CV sub-menu. The test,
the custom circuitry to all probes while the chuck is triggered for a
heat cycle. The heat cycle consists of (1) heat to 250C, (2) soak for 5
parameters are derived from first CV plot with the exception of the
the only options are wafer identification, wafer type and the number
accumulation voltage to drive away any electron hole pairs from the
surface. Next, the depletion voltage is applied and the light is pulsed
58
Capacitance measurements versus time begin using the computer's
Appendix C.
inputs during the course of the test which makes this test
menu as far as user entries go. The Doping Profile test consists of a
59
any part of the test. This deep depleted CV curve can now be used to
f Main Menu )
CV Test
) (l)ser Entries") ?( Start
Test) ?( Output Data )
i
) fr(User Entries )
CT Test
?( Start
Test)
?( Output Data )
CVBT Test
J {user Entries ) ?( Start Test) ?( Output Data
)
-?^Zerbst Test
J fr(user Entries ) ?( Start
Test)
-^ Output Data )
^Sequence
TestsJ
^Select Tests
) ?( User Entries)-^ Start Test #1
)
d^
-?^ Zero Meter
) Q Output Data )
Self Test
)
-?f System Parameters Menu #1 )
c Start Test #N
)
T
[ System Parameters Menu #2 ) -^Output Data
)
Figure fl9 -
CV Test Program Flow Chart
60
section. The program flow is shown in Figure f20. The program
resides on the 20Mbyte hard drive while data, collected from tests, is
5-1/4"
always stored and retrieved from the floppy drive. For most
'sneak'
the substrate. This is to avoid current paths (surface, bulk
etc.) when
performing tests with diffusions. Since back bias does not
the polarity depending on the wafer type selected at the start of the
test.
selectable from the softkeys, are date, run, and wafer identifications,
default parameters sub-menu, process number (1, 2 or 3), files sub
61
Specifically, these options include initializing a new data disk, listing
of files on the data disk, loading a previously stored data set, storing
the wafer and run identification. This allows for accurate tracking of
during a test as well as setup and default values are stored for
review purposes.
for each process is shown in Figure f21. Wafers are aligned on the
prober chuck with the flat aligned 45 degrees to the right from the
patterning and places the RIT logo to the top right hand side of the
die as viewed on the wafer. All tests begin with the probes aligned
to the CAP1 test structure at the 20:20 reference location (see fl4,
fl5). The procedure for testing is to step to all test structures within
62
a location before moving on to the next location. At the very
beginning of each wafer test, before the probes are lowered onto the
first test structure, matrix connections are made between the M410
and the probes for measurement of the leakage capacitance. For the
first eight test structures, all three processes step in the same
For the capacitor test structures (CAP1 and CAP2) the oxide
as reading less than 0.1V or greater than 9.9V. If the oxide thickness
63
capacitor with the highest defect density is reported as the minimum
The two van der Pauw test structures are measured next. Two
bias between the four pads of the test structure and the substrate
If the sheet resistance from the van der Pauw's can not be
determined than the electrical line width tests, which are performed
next, are omitted. If a value was found then the test structures are
(>20Mohms) in the same manner as the van der Pauw. The line
64
width is then calculated by forcing the pre-defined current through
'delta'
The electrical line width and line width (the difference
between the mask dimensions and the electrical line width) is now
on the mask or line width losses greater than the width of the
defective for values smaller than the mask dimensions and line
widths greater than half the distance between the voltage pads and
der Pauw and line width test structures. If the pre-test passes, then
the voltage on one of the pads of the test structure drops to IV.
The serpentine tests are tested exacts the same as the comb
tests except that opens between the two pads mean that line width
65
was not maintained and resistive shorts mean that the line width
was maintained.
the same manner as was the first one. The oxide thickness of CAP1
The two contact hole test structures for Process 3 are first
way as the van der Pauw, line width, serpentine and comb test
considered open (contact and/or contact hole was not made) and
for all three contact hole sizes on both CONT1 and CONT2 test
structures.
pre-test between the two diffused legs and also between the two
diffusion legs while the voltage difference between the other pair is
66
measured. Voltage differences of less than lmV are considered
settings and test times are also reported. Everything that is printed
67
MAIN MENU
-
Date
-
Run
-
Wafer
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J
Figure f20 -
DC Automatic System Program Flow
68
(Measure leakage
j
capacitance J
?( CAP1 Test )
C VDPW1 Test)
zxz
C VI .72
Test)
( CONT2 Test )
~ZEZ1
-( CONTRESTest)
Figure f21 -
Process 1, 2, 3 Program Flow
69
X -
PROCESS 1 DATA ANALYSIS
'dry'
Automatic Probing system. Along the left column of the printout are
the die locations (as outlined in Section VI) and the data measured
that is calculated from the raw data in t7. Also in t8 is the default
From the CV plot in f27, one can see the threshold and flatband
quality and MOS behavior appears quite good. The fixed oxide
010 Q/cm2
charge is small (less than 20*1 but varied
considerably
within and across wafers) and the curve shape is as one would
70
expect for a device with few surface/interface states. The substrate
doping correlates well with values obtained from the doping profile
mobile ion charge content in the oxide layer. The red or middle
curve is the initial CV curve. The solid blue or left most curve
stress (250C for 5 minutes) and the dot-dashed blue or right most
CV 010
third curve to be 277mV or 9.26*1 mobile ions/cm2.
'dirty'
Contamination is most likely due to furnace oxidation tubes.
Variations across a wafer and between wafers were large. There was
71
The ZERBST plot in f30 was generated from the CT plot of f29.
From the plot, one can determine the carrier lifetime and
minority
the surface generation velocity from the linear least squares data fit
The doping profile plot in f32, which was generated from the
data to track on a routine basis but useful none the less. The
'pushed'
surface of the graph, however, is too much to account for this and
72
The oxide thickness (TOX1) from the capacitor test structures,
since this variability will cause shifts in the threshold voltages. The
This breakdown failure level is rather high and one can conclude that
the oxide film quality is good yet contains random defects causing
From the plots, one can evaluate wafer variations as well as the
73
200x200 400x400 600x600 800x800
Capacitor Size (uM)
Figure f22 -
Capacitor Size vs Field Breakdown (Process 1)
% <2MV/cm
Figure f23 -
Capacitor Breakdown Yield (Process 1)
would mean that for the two aluminum van der Pauw tests, (VDPW1,
74
explains the inconsistent and probably incorrect results shown. To
Since the van der Pauw measurements were invalid, the line
calculate the line width. The lOOOuM line width test structure
discrepancies.
most striking observation one can see is that nearly all the combs
have failed the short to substrate pre-test. This result confirms what
was seen in the capacitor breakdown tests and that is the conclusion
that the oxide has a high occurrence of random defects that cause
oxide leakage. Since the comb test structures cover a large region of
the chip (much larger than the area of CAP1 test structures), it
From the few die that passed the pre-test, the 5uM structure showed
75
the 10 and 15uM structures look very similar statistically, one might
defining spaces.
smaller than the comb (5, 10, 15uM versus 40uM) and thus reduce
will notice that as the line width increases, the percentage of short to
the die had an open in the conductor somewhere between the pads.
The 10 and 15uM serpentines, however, had opens only of the order
and lOuM design rule should be imposed for all lines for this process.
Figure f24 shows a graph depicting the ability to make lines and
76
Yield
Figure f24 -
The total test time takes 30 seconds per die or 18 minutes per
understand the amount of gate oxide defects that are causing short to
to be occurring in this case. The only cause for such high failures
impure gases which may contaminate the film during oxidation. The
77
investigated. A second conclusion that can be drawn from Process 1
is that the line and space design rule limit appears to lie between 5
'bridges'
exceeded chip to chip variations within a single wafer. This was also
78
XI -
PROCESS 2 DATA ANALYSTS
'wet'
silicon dioxide on N-type, 7.5 to 12.5ohm-cm, silicon substrates.
of six wafers made up the run called TEST-2 of which one wafer was
measured from one of the fabricated wafers while table tlO is the
during the cycle. The non -uniformity of the film was 5.1% which,
like the dry oxidation, is high but is not so critical since moderate
threshold shifts will not disturb the active regions of the device.
40V exists in most of the devices (the lowest measured was about -
13V). The reason for such a high threshold must be due to a very
79
high amount of fixed oxide charge. This to be
would require Qss
about 2x1 012 Q/cm2
in this case. The breakdown fields of this thick
good.
As was the case in Process 1, the van der Pauw and line width
loss of the METAL layer was found to range from 3.7 to 4.1uM with
to 3.5uM loss (1.7 to 2.0uM due to masks) but some wafers had as
etched backed regions of the oxide) show that for every spacing (5,
10, 15uM), there is a resistive short. The fact that there were no
substrate. The fact that every comb has a resistive short indicates
that either (1) the air pockets formed from the aluminum etch are
80
causing the metal not to clear, (2) aluminum
'stringers'
are forming
which are conductive paths
along the the step of the oxide etch
which the aluminum etchant cannot get to very well or (3) that the
under
cutting and line width loss). From visual inspection, it appears
with a planar film (recall that Process 1 combs and serpentines were
accurately evaluated.
pre-test failures as was seen in the comb test structures. For the
structure. For the lOuM structure this value drops to 38.9% and
finally the 5uM structure measured 2.8%. This would indicate that a
5uM line would not be reliable in any design with this type of
the lack of a baseline. Since the comb test structures indicate such a
81
high level of shorts, the mechanisms mentioned earlier be
may
This is considerably lower than the etch back target of 2000 Ang.
'dirty'
The difference is attributed to a weak or buffered HF bath that
the start. From the results, we can see that the actual etch rate of
case of CAP1 results, CAP2 (or the etched back regions) breakdowns
while the etched back film had a non -uniformity of 6.2%. The non-
thickness'
(TOX1-TOX2) was 11.1%. This indicates that the oxide growth step
was more uniform than the etch back step. Figures f35, f36, f37 of
TOX2 shows a similar type shade as seen in f36 and (3) there
the the
spot'
delta oxide thickness difference as seen in f37. The wafer was not
82
oriented with respect to the oxidation orientation during oxide etch
back.
The conclusions we can draw from the Process 2 data is that (1)
the thick (wet) oxidations have very good characteristics
IC's (2) van der Pauw and line width determination is unavailable
presence of a 600 A step, are not resolvable (4) lOuM lines with this
same topography are probably the lower limit for defining lines and
(5) the uniformity of the etching technology is worse than that of the
furnace oxidations.
wafer. This value would be slightly higher if the line width test
83
XII -
PROCESS 3 DATA ANALYSIS
P-
Process 3 type test structures. As you recall, Process 3 consists of
'wet'
dioxide field regions. Contact holes are made to the diffusions (mask
=
CC) and contacted by 5000Ang of aluminum (mask = EXTRA).
total of six wafers made up the run called TEST-3 of which one wafer
84
Process 2, which uses the same field oxidation, did not exhibit this
5000Ang field for defining the areas where the P-type dopant is
introduced. The dopant is thermally driven into the silicon and the
There was no clean step after the oxide etch and before the second
The van der Pauw test structures say that the diffused regions
have a 12.8 and 13.4 ohms/square sheet resistance for the VDPW1
the two structures is close and verifies that the design criteria for the
IO20
resistance would correlate to a diffusion doping of the order of
Assuming a luM lateral diffusion and noting that the mask line
that the two cancel each other out and that the electrical line width
85
measurements should be close to true values. Electrical line width
wafer, from visual inspection, does not appear well controlled. The
field spaces do not appear to be straight and clear but rather jagged
mask. The Nanoline was not able to measure the line width from the
the two line width structures can be found in figures f38 and f39 of
Appendix G
which should be acceptable for most designs except for the higher
'flyers'
86
The diode characteristics look very good. The threshold voltage
+/-
.03kohms and the reverse breakdown voltage (VBR) was 77.0
+/-
6.5V with no failures for any of the die. All parameters appear
very uniform and acceptable for most applications except maybe the
The contact hole size test structures (CONT1 and CONT2) show
the 5uM contact was opened while this percentage increases to 100%
for the 15 x 15uM contact. This indicates that, for this process, a 5 x
5uM contact is the lower limit for contact hole cuts. See figure f25.
87
3x3uM 5x5uM 7x7uM 1 0x10uM12x12uM15x15uM
Contact Hole Size
Figure f25 -
IO20
surprising because if we assume (1) a diffusion doping (2) a
IO14
substrate doping and (3) a 5V reverse bias on the diode, we
'short'
would obtain an 8.5uM depletion width which would all 5uM
comb test structures together when tested. The lOuM spacing was
made 36.1% of the time and the 15uM spacing 69.4% indicating that
were fabricated as designed with 66.7% of the 5uM line intact, 88.9%
for the lOuM lines and 97.2% for the 15uM lines. This indicates that
88
C0MB5 COMB10 C0MB15 SERP5 SERP10 SERP15
Test Structure
Figure f26 -
Serpentine/Comb Yield (Process 3)
smaller size areas, perhaps due to the weakening of the oxide, (2)
sheet resistances were very low and moderately consistent,
variable and the tested values were somewhat suspicious for at least
one kind of the electrical line width test structures, (4) the contact
resistance to the diffused regions was very good but had a tendency
to shade on the edge die, (5) diode thresholds and breakdowns look
excellent, (6) forward dynamic resistance of the diodes are high, (7)
process limitations on contact hole sizes is 5uM and lastly (8) 5uM
than lOuM.
89
defect density is 262 defects/cm2 as measured from CAP1
breakdown data.
90
XIII -
CONCLUSION
'test'
accomplished using an electrically testable, chip. The system
fabricating the test chip, (5) performing the tests and (6) analyzing
aids. The electrical test structures were selected and designed such
parameter values.
91
lithographic design rule limits, 5000Ang metalizations and an all wet
etching technology.
capable of
performing full automatic testing of DC parameters plus
knowing which areas are causing the highest yield limiting factors.
Designers or product engineers now have the ability to predict the
yield for a given design criteria and thus project device unit costs.
The task of correlating process control data with final device yield is
92
testing equipment/facilities and for allowing me the time to pursue
this degree.
93
XIV -
FUTURE DTRFPTTOMg
a listing of ideas that have been collected during the course of this
project that might make this concept a stronger and more useful tool
to IC processing.
(1) The process and conditions that were chosen for the test chip are
life'
probably not consistent with 'real conditions in manufacturing.
performance correlation.
(2) As the lab progresses (film thickness get thinner, dimensions get
(3) By no means are the test structures included with this design an
exhaustive set. As needs change with time, new designs may become
the wafer. This would require a smaller and more closely spaced
chip size.
94
(5) Extension of the number of pads per test structure would reduce
'doubling-up'
cumulative test time) and would allow of test
tight fixture around the prober and utilize the unused capacity of the
testing system.
this system are really the tip of the iceberg. Areas for further work
include (a) trend charting and control charting from run to run data,
data, (c) extended statistics such as linear, radial and wafer to wafer
user input scales on graphic plots and data searching and (f)
95
XV -
REFERENCES
Measurement,"
(2) J. Dey, "In-Process Wafer Test and
Technology, EEEE676 -
IC Processing Lab course, 4-Level PMOS
Diodes,"
Silicon/Silicon Oxide interface Employing Metal-Oxide-Silicon
Tool,"
49-
Analytical Solid State Technology, Vol. 13, pp. v
May
1970 and Vol. 13, pp. 46-55, June 1970.
96
(9) P. S. Burggraaf, "C-V Plotting, C-T measuring and Dopant
Equipment,"
Profiling: Applications and Semiconductor International,
Vol. 3, pp. 29-42, October 1980.
189-198, 1975.
Capacitor,"
Solid State Electronics, Vol. 18, pp.
97
(17) L. J. van der Pauw, "A method of
Measuring the Specific
Structures,"
Various Cross Sheet Resistor Test Journal the
of
654.
98
(23) L. W. Linholm, "The Design, Analysis
Testing and of a
1981.
Control,"
99
XVI -
BIBLIOGRAPHY
654.
Structures,"
Equipment,"
Measurement,"
100
B. J. Gordon, "A Microprocessor-Based Semiconductor
System,"
Measurement Solid State Technology, July 1978.
Control,"
K. Ishikawa, "Guide to Quality White Plains, New York,
1981.
101
W. Lukaszek, W. Yarbrough, T. Walker, J. Meindle, "CMOS Test
Technology, EEEE676 -
IC Processing Lab course, 4-Level PMOS
Set,"
E. T. Nelson, "Z7 Process Development Mask Kodak
1969.
102
S. M. Sze, Physics of Semiconductor Devices. Wiley-Interscience,
1969.
Diodes,"
Silicon/Silicon Oxide interface Employing Metal-Oxide-Silicon
Tool,"
103
APPENDIX A -
FABRICATION SURVEY
facility. The list does not contain all the data that was collected.
Deposition rates
Crystal defects
Mobile ion contamination
contamination
Heavy metal
Exposure quality
Exposure uniformity
Bake temperatures
Bake uniformity
Topography
PR adhesion
Bake temperatures
Bake
104
Plasma Etch Dry material Etch rate Shorts probing
etches Etch uniformity Inspection
End point detection Plasma power meters
Gas purity/quality Particle counters
Gas flow rates Stylus profilometry
Etch profiles
Cleanliness
Plasma power
Loading effects
'Stringers'
Topography
Adhesion
Hillocks
Clean -
Organic clean Cleanliness Inspection
Wet etches Inorganic clean Contamination CV tests
Brush cleans Chemical quality Chemical analysis
Various wet -
Bath temperature Temperature monitors
Etch profiles
Cleanliness
Contamination
Table t6 (cont.) -
Fabrication Survey
105
APPENDIX B -
MASK MAKING PROCEDURES
procedures used to generate both the master lOx reticle and the lx
mask reticle.
AUTO Mode
Flash Intensity -
B
CONTROL UNIT
Exposure spacing -
300mils
Exposures/row -
12
Flash Mode
Shutter - AUTO
Shutter Exposure -
xlO (2.3)
Trigger A
Lamp
-
Row Disabled
Skip
RUN Mode
FLASH UNIT
Disabled
Feed/Step -
AUTO Mode
106
MASK MAKING
Dl 2 4) Dl rinse 30 seconds
4) rinse minutes
7) blow dry
8) Green light 30 seconds
9) Developer 5 minutes
107
Dl water -
distilled water
Stop -
62 parts Dl iter
Fixer -
Premixed sc don
Bleach -
1 liter Dl water
108
APPENDIX C -
CAPACITOR ALGORITMS
into the CV test system. In particular these include (1) CV tests, (2)
CVBT tests, (3) CT tests, (4) ZERBST tests and (5) DOPING PROFILE
T -
Temperature (K)
k -
Boltzman's constant
q
-
Electronic charge (Q)
Eox -
Dielectric constant of silicon dioxide
Esi -
Dielectric constant of silicon
E0 -
Cox -
Silicon dioxide capacitance (F)
Cmin -
Inversion capacitance
A -
Capacitor area (cm2)
CV Test
accumulation condition:
inversion condition to an
10"7)T2
Band 1.1785-(9.025 * 10-5)T-(3.05 *
[6]
Gap (V) -
Eg =
(cm'3)
2.51 * IO19
(P3/4) *
((T/300)3'2)
* EXP(-Es/2kT>
[7]
Ni =
P1/2=0.81577+(3.4353*103)*T*[l-T/437.6+(T/814.2)2+(T/1356)3]
109
Work Function (V) Wf = 1/2 (-Eg) N-poly gate [8]
= 1/2 (+Eg) P-poly gate
=
l/2(-0.22-Eg) Aluminum gate
Tox =
E0XE0A/C0X [9]
Depletion depth Wmax EsiE0A/Cmin [ 1 0]
-
= -
EsiTox/Eox
at inversion (cm)
Substrate -
Ns =
[4EsiE0kTln(Ns/Ni)]/(Wmax2q) [11]
Concentration (cm-3)
Xb =
kTln(Ns/Ni) [12]
Flat band -
Cn, =
(EoxE0A)/(Tox + P) [13]
Capacitance (Cfb)
P =
(Eox/Esi) *
SQRT[(kTEsiE0)/(qNs)]
The flat band voltage (Vfb in Volts) is the voltage at which Cfb
was found on the C vs V curve.
Metal-semiconductor Wms =
Wf + Xb N-type substrate [14]
Work function (V) =
Wf -
Xb P-type substrate
Fixed oxide -
Qss =
[Cox(Wms-Vfb)]/(qA) [15]
charge (Q/cm2)
P =
2Xb + (A/Cox)SQRT[4E0EsiqNsXb)
110
CVBT Test
The second test is performed after the capacitor has been subjected
minutes at 250C.
Mobile ions -
Nl =
Cox (Vfb2 -
Vfbi)/qA [17]
in Oxide (Ions/cm2)
Where: Vfbi -
Flat-band voltage from initial CV curve
Vfb2 -
CT Test
Zerbst Test
d/dt(Cox/C)2
Using the data from a CT test, plot -
vs (Cmin/C -
1)
and from this curve:
Surface Generation -
111
Donant Profiling Test
Define: Ns -
Electron concentration at surface
* [(CCox)/Cox-C)]2 *
Gl = + (kT/q) d/dV(l/C2) P-type wafer [20]
[(CCox)/C0x-C)]2 *
= -
(kT/q) *
d/dV(l/C2) N-type wafer
(1-G)/(W/L)2
=
-2G/(1-G) + [21]
Where G =
Ns/Nfb [22]
and W/L =
SQRT(G-ln(G)-l) [23]
G2 = (1/(1-G))[1-2(W/L)2G/(1-G)2] [24]
Bulk -
N(W) =
2/(EsiqA2) * [d/dV(l/C2)]-l *
G2 [25]
Concentration (cm"3)
[(2kTEsi)/(q2N(W))]1/2
112
in
r-
o
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Q_
>
(J Ld
(J
s p CE
\ h-
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r-
a: O
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cr
(E
u
JD s:
<+ +> V)
> > z
in
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s
3DNUlI3UdUD
Figure f27 -
CV Plot
113
CO
h-
o
_l
Q.
>
u u
fX
r-
a: _l
o O
r- >
t-i
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CE
Q_
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AIQ/Jd
C3 01
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BDNbllDUdbD
Figure f28 -
CVBT Plot
114
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Figure f29 -
CT Plot
115
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116
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Figure f31 -
117
rffH s
-HfH fff CD
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Figure f32 -
118
APPENDIX D -
PROCESS DETAIL
SUBSTRATES: Silicon
<100> orientation
20mils thickness
Monsanto vendor
APM 15 minutes
Dl soak 1 minutes
HF 2 minutes
Dl soak 2 minutes
HPM 15 minutes
Dl soak 4 minutes
Dl soak -
Distilled H20
Scrub -
2000rpm brush scrub 9.0sec
Brush 2.0sec
delay
Dl dispense 5.0sec
119
APM -
5 parts H20
Spin dry -
Digital Equipment Corporation spinner
1500rpm
5 minutes
H2SO4/H2O2 10 minutes
Dl soak 4 minutes
Spin dry
H2SO4/H2O2-3 parts H202 Hydrogen peroxide (30%)
1 part H2S04 Sulfuric acid (35%)
120
600Ang DRY OXIDE: MARK IV M300 diffusion furnace
Middle tube
Temperature: 1100C
Dry O2 environment
Time: 15 minutes
Middle tube
Temperature: 1100C
Wet O2 environment
Time: 30 minutes
Evaporator.
IO"5
Vacuum = 3 " Torr
Time: visual
121
PHOTORESIST MASKING:
Time: 300sec
Time: 120sec
Energy = 55mJ =
Lamp Intensity *
Time
Time: 120sec
No HMDS application
122
Photoresist coat: Dispense: 1.5sec, Orpm
123
DOPANT DRIVE-IN: MARK IV M300 diffusion furnace
Top tube
Temperature: 1100C
N2 environment
Time: 30 minutes
Temperature: 450C
Time: 30 minutes
10% H2
124
APPENDIX E - PROCESS 1 DATA
of selected detailed
The following section contains examples
125
DATE : 1 1 / 1 0/87
RUN : TEST 1
WAFER : 0 4-
PROCESS 1
PAGE 1 OF 2
Table t7 -
Process 1 Data Output
126
DATE 11/1 0/87
RUN TEST 1
WAFER 04
PROCESS 1
PAGE 2 OF
CflPl (HU/cn) 7.85 .37 35.00 97.2 2.8 0.0 0.0 0.0 0.0
rCRPI.100 -
CflPl fllU/cn) 7.76 .21 33.00 91.7 8.3 0.0 0.0 0.0 0.0
IWUOO -
CflPl OHI/cn) 6.99 1.06 21.00 66.7 33.3 0.0 0.0 0.0 0.0
ftflPI.800 -
CflPl (HU/cn) 6.77 1.13 21.00 58.3 11.7 0.0 0.0 0.0 0.0
SHEETRH01 -
U0PU1 (Ohns/sq) 1.01 1.88 22.00 61.1 6.3 0.0 30.6 0.0 0.0
SHEETRH02 -
U0PU2 (Ohns/sq) .68 1.15 26.00 72.2 5.6 2.6 19.1 0.0 0.0
LU15.1000 -
LU15.1000 (utl) -3.28 1.21 5.00 13.9 19.1 5.6 5.6 0.0 55.6
LU30JOD -
LU3OJ00 (il) -5.67 1.01 3.00 8.3 22.2 2.8 2.8 25.0 38.9
C0HB5 -
CH1B5/C0HB10 (S.O.R) 0.00 0.00 0.00 0.0 72.2 2.8 25.0 0.0 0.0
CO1B10 -
conss/coriBio <S,0,R) 0.00 0.00 0.00 0.0 66.7 11.1 22.2 0.0 0.0
C0HB15 -
C0H815/SERP5 (S.0.R) 0.00 0.00 0.00 0.0 63.9 11.1 25.0 0.0 0.0
SERP5 -
C0H81S/SERPS (S,0,R> 0.00 0.00 0.00 0.0 11.1 88.9 0.0 0.0 0.0
SERP10 -
SERP10/SERP15 (S.0.R) 0.00 0.00 0.0 22.2 2.6 75.0 0.0 0.0
SERP15 -
SERP10/SERP15 (S.0.R) 0.00 0.00 0.0 33.3 2.8 63.9 0.0 0.0
liafer type N
Capacitance Range =
200 pF
Table t8 -
Process 1 Statistics Output
127
cn
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rs. .
V CO CD
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TOX1 Histogram
128
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TOX1 Wafer Map
129
APPENDIX F -
PROCESS 2 DATA
130
DATE 11/1 0/87
RUN TEST2
WAFER 04
PROCESS 2
PAGE 1 OF
Table t9 -
Process 2 Data Output
131
DATE 11/1 0/87
RUN = TEST2
WAFER : 04
PROCESS 2
PAGE 2 OF 3
Table t9 (cont.) -
Process 2 Data Output
132
DATE : 1 1 / 1 0/87
RUN : TEST2
WAFER : 04
PROCESS : 2
PAGE 3 OF 3
CP2 (HU/cn) 0.00 o.ot 0.00 0.0 0.0 100.0 0.0 0.0 0.0
FCAP2.100 -
CAP2 (HU/cn) 0.00 0.01 0.00 0.0 0.0 100.0 0.0 0.0 0.0
rCHP2.600 -
CAP2 (HU/cn) 0.00 0.01 O.OC 0.0 0.0 100.0 0.0 0.0 0.0
FCRP2.B00 -
CRP2 (HU/cn) 0.00 o.ot) O.OO 0.0 0.0 100.0 0.0 0.0 0.0
C0HB5 -
CB1B5/C0HB10 (S.O.R) 0.00 0.01 0.00 0.0 0.0 0.0 100.0 0.0 0.0
C0HB10 -
COHfiS/COHBIO (S.O.R) 0.00 D.0I) 0.00 0.0 0.0 0.0 100.0 0.0 0.0
C0HB15 -
C0HB15/SERP5 (S.O.R) 0.00 0.H 0.00 0.0 0.0 0.0 100.0 0.0 0.0
SERP5 -
C0HB15/SERP5 (S.O.R) 0.00 0.0 1 0.00 0.0 0.0 97.2 2.8 0.0 0.0
SERP10 -
SERP10/SERP15 (S.O.R) 0.00 0.011 0.00 0.0 0.0 61.1 38.9 0.0 0.0
SERP15
~
SERP10/SERP15 (S.O.R) 0.00 0.0 ) 0.00 0.0 0.0 13.9 86.1 0.0 0.0
Uafer type N
Capacitance Range 50 pF
Table tlO -
Process 2 Statistics Output
133
CD CO ro 01 OJ ro
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T0X1 Wafer Map
134
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TOX2 Wafer Map
135
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Figure f37 -
TOX1-TOX2 Wafer Map
136
APPENDIX G -
PROCESS 3 DATA
The detailed
following section contains examples of selected
137
DATE * 1 1 /08/87
RUN : PROC3
WAFER ; 0 1
PROCESS 2 3
PAGE 1 OF 3
-->
CHIP Toxl 200 100 600 600 Rhosl Rhos2 Delta linewidth 5 10 15 5 10 15
JCXiVY (ANG) ( --
<hVcn2) ~ -
Table til -
Process 3 Data Output
138
DATE : 1 1 Z08/87
RUN : PROC3
WAFER : 0 1
PROCESS : 3
PAGE 2 OF 3
C0HT1- <C0HT2-
< --> ) COHIRES/DIODE UMblOiit)
CHIP 3utl 5(11 Tufl 10ifl 12ufl I5ufl Re Fdr Oth Obr
XK:YY (Ooen. Short or Resistive) Ohns kOhns (U) (0)
20:20 1 0 0 R R R r ; 93.26 1.09 .37 86.06 !
21:20 1 0 0 0 R R r : 92.76 1.07 .36 77.00
22:20 1 0 0 R R R R 1 B7.19 1.07 .36 71.55
23:20 ! 0 0 R 1 R R R 1 87.16 1.07 .36 78.11
21:20 i 0 0 R i R R R 1 91.02 1.09 .36 70.32
25:20 i 0 R R 1 R R R i 103.72 1.13 .36 12.98 I
22:22 ! 0 R R 1 R R R
'
181.20 1.11 .36 75.97 !
R i 1.06 75.19 I
20:25 ! 0 R 0 1 0 0 -2.00 .28
R 1 96.00 1. 05 80.63 I
22:25 1 0 R R : r R .36
139
DATE 1 1 /0S/8V
RUN PROC3
WAFER 0 1
PROCESS 3
PAGE 3 OF
rCAP1.200 -
CRP1 (HU/cn) 0.00 0.00 0.00 0.0 0.0 100.0 0.0 0.0 0.0
fCRPMOO -
CflPl (HU/cn) 0.00 0.00 0.00 0.0 2.8 97.2 0.0 0.0 0.0
CRP1 (HU/cn) 0.00 0.00 0.00 0.0 91.1 5.6 0.0 0.0 0.0
fCRpf 600 -
CRP1 (HU/cn) 0.00 0.00 0.00 0.0 19.1 80.6 0.0 0.0 0.0
rCBP1~800
-
U0PU1 (Ohns/sq) 12.80 2.37 35.00 97.2 0.0 2.8 0.0 0.0 0.0
SHEE1RH01 -
UDPU2 (Ohns/sq) 13.10 2.B3 35.00 97.2 0.0 2.8 0.0 0.0 0.0
SHEEIRH02 -
LUIS 1000 <ufl> 3.25 1.52 33.00 91.7 2.8 0.0 0.0 0.0 5.6
LU15 1000
-
Uafer type H
Capacitance Range =
50 pf
Table tl2 -
Process 3 Statistics Output
140
r 1
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Figure f38 -
LW15_1000 Wafer Map
141
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Figure f39 -
LW30_100 Wafer Map
142
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Figure f40 -
Contact Resistance Wafer Map
143
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Figure f41 -
Diode IV Curve
144
CO
CD
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CD
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Figure f42 -
Diode Reverse Breakdown Histogram
145
APPENDTX H -
F.RRQR CODE REFERENCE SHEET
that the failure codes are either -1, -2, etc. except for the line width
failure codes which use -10, -20, etc. This is because these
error codes which would lead to much confusion. When reading data
interpret -1 failure codes as -10 etc. for only the line width data.
146
Er-i-gr-
ccsle r-cfci-once chart
T0X1 -
CftPI (ftnr.)
Code3! -> Meter out of range, leaky cap or no contact
FCftPt 208 -
CftPI (Ml'/cm)
[CftPI 4BB -
CAP1 (MvVcV)
CftPI EBB -
CAPl (Hl'Tc^H
-CftPI BOB -
CftPI (Hy/cw)
4MUZ
ode -I ; riele breakdown
Held is <2Mv7cn
Code -2 > Exceeds measurement capability (100V)
Code -3 -> Bad data Field breakdown) IBMvVcm
-
SHEETRH01 -
VOPU) (Ohms/so)
sheetrhq; -
Oopij;Short
<0hms/is5)
Code -1 -> to substrate (R'.20Mohms)
Code -2 -> Open contact <R:20Mohms)
Code -3 -> Exceeds meas capability Umv), R> IBBKOhms/sq or compliance met
IBB
Code -10 = > =
Sheet resistance not known
Code -20 --> Short to substrate <R<2BMohms>
Code -30 --> Open contact ( R>201ohms )
Code -40 > Exceeds meas capability 1 Inv) or compliance met
Code -50 Invalid measurement (Ualue not possible)
FCftP2 20B -
CAF2 (MvVcm)
FCftP2 4B0 -
CAP2 (Ml'/TiP
rcftr: ebb -
Cftr2 <Mi'/cm)
FCftF2 8BB -
CftP2 (My/cm)
Code I -
") Field breakdown is <2MV/cm
Code -2 > Exceeds measurement capability (100V)
Bad data Field breakdown) 10MV/cm
-'.'
Code '> -
?0N7RES (I1)
"
CONTRES (V)
Code -1 --y Short to substrate (R<20Mohms)
Code -2 => Open contact (R>20Mohms)
Code -3 > Vbr 100V
C0MEE/COMB1B (S. SI
COTi
OME 1 b C0MB15/SERP5 (L O.R)
sT^FT C0MB15/SERP5 ('.'.
grjpia SERP1B/SERPI5 ' : .O.R)
-
SERP10/SERP15 PTr7
C0NT1 R)
COrJT 1 (1
C0NT1 <sdo.R)
TiT CONT? (SlotST
CONT 12 CONTI (i .O.R)
CONT IS cont; Tl
Code S -
Short to substrate <R(20Mchms )
Code 0 Open contact <R)20Mohms )
Code R Resistive contact <R<20Mohms >
Figure 43 -
Error Code Reference Chart
147
APPENDTX T -
TV CUSTOM CIRCIITTRY DETAIL
temperature stress tests, (3) turn a light, located inside the light tight
Software Codes:
Select_code;"Character_string"
(either B0,B1,B2,B3)
PI Connect probe 1 to capacitance meter
BO Float probes
Bl Positive DC bias
B2 Negative DC bias
B3 Ground probes
148
L2 Must follow with LO code after 500ms
Format is as follows.
Bitl 0 -
Probe 1 disconnected from capacitance meter
1 -
Probe 1 connected to capacitance meter
Bit2 0 -
Probe 2 disconnected from capacitance meter
1 -
Probe 2 connected to capacitance meter
Bit3 0 -
Probe 3 disconnected from capacitance meter
1 -
Bit4,5 0,0 -
Probes are floating
1,0 -
Positive DC bias
0,1 -
Negative DC bias
1,1 -
Probes are grounded
Bit 6 0 -
Lamp off
1 -
Lamp on
Bit 7 0 -
Heat cycle
completed/'
die
1 -
Heat cycle active
Bit 8 Always 0
149
tn
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to x
u ?Q r\j 5 r.
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3 a
- ^j E O z
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CD N. ID
s
it CC
Ol-J
s* w o-1
D
O o
Q in rr < R *3 a.
LD CT o d* _1
LU
Dm cu
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mp4 a. _i
cc h- *
tr
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if- to IS ff- 3
f&s
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t I-33DDD333DD
Figure f44 -
CV Custom Circuitry Power/Layout/Parts
150
2
B
e a
e e
- CM
^ I
gjuatel
iAIiAIiAi
.. ru ~ ro .
AfSAfcA!
Lu|fa 1
IL
t3<E i
tf :n
Li.
1
tto tr * -* r.' -i o
.
li. Ll U. IL It U. li. M.
M % ? " "IJ T.
dooo :o a o ?
m .* .* :-y ru cu ru
y Y t n yW ri i v
o b x o rj vl
CU rr, nrjin pi -ru jh.
it -I -J
t
g s
aBciuH
M I M
LLu
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BE tn z
B-S 3*-> u> -*
j 1 Z^Xr-b
o
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0 Z
X
0
1 Is
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ffi
mTTTTT tn
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3
1 iiiiftii t
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to
CJ
I
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I t-T 1111(111
r
*- CM ruojcvruojc-urucM -0
=5 "3 -3-3-3-3-3-3-3-0
j-E ?
Figure f45 -
CV Custom Circuitry -
Outputs
151
1-
?
z
tn 0.
J
c\j ru ru ru ru ru ru
& r
lilt i i i
oj t\j oj ru ru ru ru i t
tn
g C
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i-n*->
rl
uj to cr in
1 * 7 *-
Z ru
5w pry
Q- "3
-J "3
O "3
Figure f46 -
CV Custom Circuitry -
Inputs
152
,u
tn fe
cn tn
fr
UJ Lu UJ CD CD *~
3
M
pooooocntD in in > X w
-i
ss
ttttttt ---<jMIHp--<p^^ tn
V
<
-
''
^
a:
g 3
f
,_
LU X
UJ
IUC/J 5
>O
%
U. LU D C
A A
o X
cu o
Figure f47 -
CV Custom Circuitry -
Relays/Switches
153
BIPOLAR MEMORY PRODUCTS
POLAWTY
AND i
T--r-
-r -, ,
| -
T OR
E
1 R
M
i
s
1
4
1
3
1
2
1
1
1
0 9 e 7 e 5 4 3 2 1 0 7 e
OLITPlJT(
8 4 3 2 i 0
0
Jt L H t rt
i S 1
2
t
H-
ff (.
ft
w ft i, <. L. rt
3 3 fc. f*
a 4
L t ft
ff H1
{. fl.
5
fl_
6
UJ ff
7
r*
s:
H A.
H-
J 5 5 ii *
B_
C 9 J. A
10
N 11
L A
L rt
12
V A * 8
13 rt
14
t A r>
H ft A A
IS H A f A
16
17
rt R Pi A
16
19 1
i i H 20
21
e!
ZI
*
tm
I 22
23
24
Oi
25
26
: i 27
1 Z '** 26
29j
30
j
31
i I! s:
33
34
n * 35
IS 36
37
< mi
36
1 E 39
?-
i
u
1 40
is
41
42
43
"t" 44
45
n, I 1 46
47
i *
u X - i PIN 2 2 2 2 2 2 2 3 9 6 7 e i 1 i
2 2 4 i 1 1 i 1
Ul oj NO. 0 1 2 3 4 5 e 7 0 1 2 3 i e 7
ml z
<<
l
m Ml
t
Ul
s <
J s
2
s
K 1 i!
ft
>
t
4
>
1
Vo
e s
>
11
\3
cn
>0
3-
TS
cs
11 !
L
w Signetics
Table tl3 -
U03 FPLA Table
154
BIPOLAR MEMORY PRODUCTS
POLARITY
AND -1 -T-r -T
~rm
-7
T OR
E
8 R 1 1 1 1 1 1 OUTPUT (F,)
M s 4 3 2 1 0 9 6 7 e 6 4 3 2 1 0 7 e rs 4 Ts 2 1 0
0 L L L * a_ ...j
1 L L
! JL ^
m.
*
o 2 L L 1
3 L L L
ft 21 **.'
4 L L L
5 E
L
H f~,
3L"
0 } L. m.
t*
6 L i. L
ft \
7 L H L
-1 ff
6
ja_ E ii'
= m o u. . i- L ft (i
...
0 9
n
H A
10
N H A
11 L r- " fi
12
13
14
15
16
17
ii
is
ji
i i
r-r-
n 20
21
1
i is
1 22
23
ZI 24
Oi
25
1 1 p jp c
26
27
26
29
30
31
i
1 %.
u
1-
32
33
r^
34
8*
-i 35
36
<C|
37
36
i
.'
li
s ;
39
40 ;
i .
Mi
4;
X-mS
43
-
+ 44
45
M 46
i
1
1
'
47
Ul x PIN 2 2 2 2 2 2 2 3 4 5 6 7 e 9 1 1 1 1 1 1
.
2 2 1 1
Ul o! NO 0 1 2 3 4 5 6 7 0 1 2 3 5 e 7 (
mi z
a
>
Ul
u
<
V n >
^44 I f
cc
<*>
8
E iii V <3 5 a a *
a.
S4 Signetics
Table tl4 -
U12 FPLA Table
155
APPENDIX J -
CV TEST PROGRAM
156
te CV Test System Program
20 Eric J. Meisenzehl
30 Revised 07/12/85
40
50
E0
70
80
90
100 Init
1 10 DIM A<9,100! ).B(9 J001 ) >I25D ,Test*<25
TEST"
520 PRINT TABXY<30,6>i"k2 CT -
PROFILE"
ZERBST"
TESTS"
PARAMETERS-
TEST"
METER"
690 I "CVBT"
157
600 GOTO 800
810 I
820 I
Ii*ie*:":**,#
IfS SEQUENCE PROGRAM
THE SEQUENCE OF THE TESTS YOU WISH TO PERFORM (DO NOT USE COMM
SI?.
?> ,CHR '29 >&Sequence$&CHR< 128>i
870 INPUT Sequence!
680 L-LEN( Sequence!)
890 Y-2
900 Flag4-0
Z*-*"
910
920 FOR Z-1 TO L
Sequence$tZ,Zj"0"
132
940
IE
IF Sequence*CZ,Zj-"1"
THEN TestK Y
>-"CVBT"
>-"CU"
THEN TestK Y
950 IF Sequence*! Z,Zl-"2"
THEN Test*( Y
>-"CT"
Sequence$tZ.Z]-"3" PROFILE"
?,2
970
JE
IF SequenceStZ
THEN TestK Y )-"DOPING
>-"ZERBST"
THEN Test$( Y
980 X-NUMi Sequenced Z,Z3>
990 IF X>53 OR X<48 THEN 1030
1000 IF X-48 OR X-49 OR X-51 OR X-52 OR X-53 THEN Flag4-1
1010 Y-Y+1
Z*-Z*&*k"&Sequence*[Z,Z]&"
1020
1030 NEXT Z
1040 Sequencee-Z*
1050 OUTPUT 2iCleart|
10S0 IF Y-2 THEN Main_menu
1070 End_sequence-Y-1
1080 I
1090 FOR Z-2 TO End sequence
*"
1100 PRINT USING "OO.K.K'i'TEST |Z-1 lTest*( Z )
1"-"
1110 NEXT Z
1120 I
1130 BEEP
1140 INPUT "ENTER OK TO CONTINUE" ,Z*
ZS-'OK"
1150 IF THEN Idpage
1 160 60T0 Main menu
1170 I
1180 I SYSTEM f^.sETERS
1190 I
1200 I
1210 Systen_param: ! Alter system global parameters
1220 OUTPUT 2 i Clear* t
PARAMETERS"
1230 Menu*-"SYSTEM
1240 OFF KEY
1250 PRINT TABXY(2S,0)|CHRS( 129 )&" SYTSTEM PARAMETERS "&CHRK 128 >
1260 PRINT TABXY(?C F'i"k0 AMBIENT TEMPERATURE <C>
-
-
"iT-273
"
:
1270 PRINT TABXY'iJ t
.-.k1 ACCUMULATION UOLTAGE <U>
- -
"lAcc voltage
"
1280 PRINT TAB> ><tii,'i) I "k2 DEPLETION UOLTAGE (V)
-
iDep~voltage -
"
1310 PRINT TABXY(20.10)i"k5 TEST SIGNAL LEUEL
- -
iTest_level*
1320 PRINT TABXY(20J1 )|"k6 CT CUT-OFF TIME
-
(SEC) "iCt max -
1350 I "TEMPERATURE"
1360 ON KEY 0 LABEL 60SUB Temperature
UOLTAGE"
1370 ON KEY 1 LABEL "ACC 60SUB Acc_voltage
UOLTAGE"
1380 ON KEY 2 LABEL "DEP GOSUB Dap voltage
"FREQUENCY"
"
1570 I DATA"
1580 ON KEY 5 LABEL "DOPING 60SUB Doping_data
158
1590 ON KEY 6 LABEL "MEAS SPEED"
GOSUB Meas speed
MENU"
1600 ON KEY B LABEL "MAIN GOTO Main menu
1610 ON KEY 9 LABEL "MORE >"
GOTO System _param
1620 I
1630 60T0 1630
1640 I
1650 I
1660 I
1670 Test_cvbt: I
1680 TestK 1 )-"CVBT"
Title*-"
1690 CU/BT PR06RAM ..."
1980 OUTPUT Cv
interfacei"L0"
1990 OUTPUT Cv
2000 Title_length-40-LEN(Tltle*)/2
2010 PRINT TABditle length >|CHRK 129 >&Tltle*&CHRK 128 >
2020 PRINT TABXYdl ,4)|"k5
-
DATE "iDate*
2030 PRINT TABXY< 11 ,6)|"k6
-
RUN "iRun*
2040 PRINT TABXYdl ,8>t "k7 -
WAFER ID "iWafer*
1>-"CT"
2050 IF TestK THEN 2180
)-"SEQUENCE"
2060 IF TestK 1 AND Flag4-0 THEN 2180
(-"BREAKDOWN"
2070 IF TestK 1 THEN 2110 ,
2080 IF Flagl-0 THEN PRINT TABXY( 1 1 10 )i"kB . "&CHRK 129 )&"AREA"1CHRK 128fa"/0X
-
)&"
ANG "(Toxd )*1.E+8
>-"ZERBST"
159
2370 OUTPUT Hp4277|"C2U1T1F1P0"
2380 IF Frequency-1000 THEN OUTPUT Hp4277TA4"
iFrequency t
"EN"
2420 END IF
2430 IF Test_level*[1 THEN OUTPUT
Hp4277i"V2"
Meas_speed*-"FAST"
2450 IF THEN OUTPUT
Hp4277i"M3"
THEN OUTPUT
Hp4277i"MI"
2570 OFF
2580 PRINT TABXY(Title_length,3)iCHR*( 131 >&Title*&CHRK 128 >
2590 GOSUB Probe_check
2600 Inltial_time-TIMEDATE
2610 I
2620 I
)-"SEQUENCE"
2630 IF TestK 1 THEN I Test sequence loop
2640 FOR Sequence-2 TO End sequence
2650 PRINT TABXY(26,3>|CHRS< 131 )&Tltle*&CHRK 128)
2660 FOR Z-2 TO End sequence
2670 Tit le_length-4B-LEN< "^estK Z ) )/2
26B0 PRINT TABXYUitle length )|Testi Z >
,5+Z
2690 IF Z-Sequence THEFJ FRINT TABXY(Title_length ,5+Z (iCHRK 131 (STestK Z (tVCHR
K128
2700 NEXT Z
)-"CUBT"
2710 IF TestK Sequence THEN GOSUB Cvbt
>-"CU"
2720 IF TestK Sequence THEN 60SUB Cv
)-"CT"
2730 IF TestK Sequence THEN GOSUB Ct
PROFILE"
2740 IF TestK Sequence )-"DOPINS THEN 60SUB Doplng_prof i le
(-"ZERBST"
2750 IF TestK Sequence THEN GOSUB Zerbst
2760 NEXT Sequence
2770 END IF
2780 I
2790 I
2800 Sequence-1
"CUBT"
2810 IF TestK 1 THEN GOSUB Cvbt
"CT"
2820 IF TestK 1 THEN GOSUB Ct
"CU"
2630 IF TestK 1 THEN GOSUB Cv
PROFILE"
2840 IF TestK 1 "DOPING THEN GOSUB Doping_prof ile
"ZERBST"
2850 IF TestK 1 THEN GOSUB Zerbst
2860 GOTO Idpage
2870 BEEP
2880 STOP
2890 !
2900 I
2910 1
2920 Cvbt: I CUBT test algorithm
2930 FOR K1-1 TO 3
2940 IF K1>1 THEN 60SUB Probe_check
2950 FOR L-1 TO Number
2960 I-K1+3*(L-1 )
2970 IF K1-1 THEN Error (L)-0 RUN"
2980 Bias run-"INITIAL RUN"
3070 OUTPUT
3080 NEXT L "
3140 OUTPUT
3150 GOSUB Title
160
3160 GOSUG Cv graph
3170 I
3180 PRINTER IS 701
3190 PRINT CHRK27(fc"&k3S"
" "
?8
3210 ?R.1SJ,,XAf CIf
Z-LEN(Date*&" "&Run*&"
""BILE ION CONTAMINATION SUMMARY
"Wafer*)
Z-Date*6." 'IRunti'
illi "&Wafer*
3230 PRINT TAB(40-Z/2)|Z*
3240 PRINT CHRK27>&"&k0S"
3250 PRINT USING "//"
3280 !
3250 Z-0
3300 Avg-0
3310 Avg2-0
3320 FOR 1-1 TO Number
3330 PRINT
3340 IF Error(3*I-2)-1 THEN
3350 PRINT TAB(3)iItTAB(20)i" BAD DATA
"
|TAB(50 )|Error( I )
3360 GOTO 3470
3370 END IF
3380 Shlft1-Ufb(3*I-1 )-Ufb(3*I-2) I Positive-Initial
3390 Shift2-Ufb(3*I-1 )-Ufb(3*I ) 1 Positive-Negative
3400 Avg-Avg+A6S( Shift 1 )+ABS( Shif t2 )
3410 Avg2-Avg2+AB5( Shift 1 >*2+ABS< Shi f t2 >*2
3420 Z-Z+2
3430 Mi 1-Cox( 3*1-2 )*Shif 1 1 /( Q*Area( 3*1-2 )>/1.E+9
3440 Ml2-Cox(3*I-2)*Shlft2/(Q*Aree(3*I-2)>/1.E+9
"POSITIUE-INITIAL"
3450 PRINT USIN6 3540, 1, 1 1 /
,Mi .Shift .001
3470 NEXT I
3480 IF Z-0 THEN 3560
3490 Std-SQR(ABS(Avg2/(Z-1 )-Avg*Avg/( Z*( Z-1 )>))
3500 Avg-Avg/Z
TAB(57)i" "
3510 PRINT
3520 PRINT USING '57X
i"AU6-"
,K ,3X .DDDD.D
DDDD.D"
i INT( l0*Avg/.001 +
"STD-"
)/10 .5
3720 OUTPUT Cv
3730 NEXT I
Hp4277|"BI0EN"
3740 OUTPUT
3750 GOSUB Title
3760 GOSUB Cv_graph
3770 RETURN
3780 I
3790 Ct: I CT test algorithm
3800 FOR 1-1 TO Number *" TIME"
3810 DISF "CAPACITOR ill "STORAGE
3820 OUTPUT Cv lnterfacei"P"liCHRK I )
3830 J-0
3840 GOSUB Inv cap
3850 GOSUB Oxide cap
Hp42"7i"BI"lDep_voltages"EN"
3860 OUTPUT
3870 60SUB Ct_data i*P0"
3910 OUTPUT
3920 60SUB Title
3930 GOSUB Ct_graph
161
3940 RETURN
3950 I
3960 I
Dopin0-ppofile: '
llsl Doping Profile test algorithm
3990 60SUB Cv
4000 I
4010 FOR 1-1 TO Number
4020 Counter-0
4030 Correction* I >-0
4040 Cutoff(I)-0
4050 FOR J-2 TO Points
4060 DISP "PROFILE CONVERTING"!
I. J
JF A<I J-Cox(I) THEN 4420
*g' ,#Cox( * >/<cox( i )-a< k j ) )
4212 9rniv
IFAtl.J ><-A(I
i?I2
4100 6g1-KTC*C
) THEN 442^0
.J-1
4110 Gg1-Gg1/(B(I.J)-B(I.J-1 ))
41a0 6g1-A6S(6gl )
4140 I
4150 IF A(I.J><-A(I.J-1 ) THEN 4420
4160 Counter-Counter+1
4170 IF 6g1>2/3 THEN 4430
4180 62-1
4190 IF 6oK.05 THEN 4310
4200 6-. 0005
4210 X1-G
4220 X2-1-6
4230 X3 (2*G/X2
(+X2/(G-L0G(S )-1 >-6g1
4240 X4
(2/X2-2)+<X2+L0G(G(-X2*(1-T/G))/(6-L06(S)-1 ("2
4250 6-G-X3/X4
4260 IF G<0 THEN G-1.E-150
4270 IF ABS((X1-G)/6)>.0001 THEN 4210
4280 X1-1-G
4290 X2-6-L0G(G>-1
4300 62-1 /X1( 1-2*X2*6/X1"2)
4310 X1-2*(S(I,J >-B(I.J-1 ))*G2/(Esi*Q*Area(I>*2)
4320 A( 1+3.Counter )-ABS( XI /( I /Ai I J CZ-1 /A( I
, )"2 >)
.J-1
4420 NEXT J
4430 Dope_polnts( I )-Counter-1
4440 IF JT-Points THEN Dope_points( I )-Cutof f ( I >
4450 NEXT I
4460 OUTPUT 2iCleari
4470 OISP
4460 (
4450 1
4500 Doping_graph: I Doping Profile graphics
4510 FOR T-1 TO Number
4520 GOSUB Doping scales
4530 CLIP 0,Xmax,T4,l9
4540 MOVE BU+3.1 >*1 .E+4A( 1+3.1 ))
,L6T<
4710 PRINT
4720 Z-0
4730 FOR 1-1 TO Number
162
N|)(D-op(e-polnts(IZ THEN Z-Dope_polntsd >
4750
4760 FOR J-1 TO Z
4770 WI-INTd00*1.E+4*B(4.J)+.5)/100
47B0 Z1-INT(LGT(A(4,J>))
4790 N1-INT(100*A(4lJ>/10"Z1 + .5)/100
4800 IF Number- 1 THEN
6OTOT49l0N6 "* 'DDD,6X D-DD '3X 'DD-DD -A ,J Wl 'N1 -Z1
4820
4830 END IF
4840 W2-INT(100.1.E+4*B(5.J)+.5>/100
4850 Z2-INT<LGTCA<5.J>>>
48G0 N2-INT( 100*A(5.J )/10'Z2+.5 )/100
4870 IF Number-2 THEN
78?5 ,.
USING "X.DDD.6X.D.DD,3X,DD.DD,A.DD,5X,D.DD,3X.DD.DD.A.DD"iJ,U1
,,P,RINd
,N
5070 Xmin-0
5080 Xmax-INT(B<I+3.1 )*1.E+4+1 )
5090 Xstep-Xmax/10
5100 Ymin-14
5110 Ymax-19
5120 WINDOW -2*Xstep,Xmax+Xstep,13.19.5
5130 CLIP 0,Xmax,14,19
5140 AXES Xstep.1 ,0.14
(cm"3>"
163
5520 MOUE Xstep.19.0
5530 LABEL "CAPACITOR t"ili "DOPING PROFILE"
5540 MOUE 5*Xstep,18.5
5550 LABEL "Wmln-''iINTd I+3,Dope_points( I > >+.5 >r
.E+8*B<
Ang"
5820 NEXT~J
5830 Norm_fac( I >-4*Norm_fac( I )/Ct_points( I >
5640 NEXT I
5850 DISP
5660 I
5870 I
5680 Zerbst graph: ! Zerbst graphics
5890 Zerbst smooth-0
5900 FOR I-T TO Number
5910 60SUB Zerbst scales
5920 CLIP 0,Xmax.0"..92
5930 MOUE A(I + 3,2i.Bt(I+3,2)/Norm_fac(I>
5940 FOR J-3 TO Ct_points(I)
5950 IF Zerbst smooth-0 THEN 5980
5960 Ad+3,J >-TA< 1+3, J-1 )+A( I+3.J )+A( 1+3, J+1 > 1/3
5970 Bd+3,J)-(B(I+3,J-1 )+B(I+3,J )+B(I+3 ) )/3
,J+1
Z*-"X" Z*-"C"
6110 IF
Z*-"S"
OR OR THEN 5910
Z*-"I"
B120 IF THEN 6740
6130 MOUE .2*Xstep,.97
(X1.X2)"
164
6310 S(Z)-0
6320 NEXT Z
6330 FOR J-3 TO Ct joints! I >
jj40 IF A(I+3.JX2_range THEN 6410
52? IF ft<I+3,JXX1_range THEN 6420
6a60 Sd)-S(1)+1
6370 S(2)-S(2)+A(I+3.J)
6380 S(3)-S(3)+Ad+3.J>"2
6390 S(4)-S(4)+A(I+3.J)*B(I+3.J)
6400 S(5)-S(5)+B(I+3,J)
6410 NEXT J
6420 M1-(S(2)*S(5)-Sd >*S(4 ) )/( S(2 )*S(2 )-Sd >*S(3)>
6430 B1-(S(5(-M1*S(2))/Sd )
5440 IF B1>0 THEN MOUE 0.B1/Norm feed)
64s0 IF BK-0 THEN MOVE -< Bl /Ml XXstep ,0
6500 PEN -1
(X1.X2)"
6510 LABEL "INPUT RANGE
6520 PEN 1
6530 MOUE .2*Xstep,.97
(Y/N)"
6540 LABEL "OK7
6550 INPUT Z*
Z*-"N"
6560 IF THEN 5910
6570 MOUE .2*Xstep,.97
6580 PEN -1
(Y/N)"
6530 LABEL "OK7
6600 PEN 1
6610 Llfetlme(I)-2*Cox(I)*Ni(I >/(M1*Cmln( I )Ns(I ) )
6620 Surface veld )-B1*Esi*Nsd )/(2*Cox( I )Nld ) )
5630 T0d >-2Lifetime(I )*Ns(I)/Nid)
6B40 MOUE .2*Xstep..97
" "
165
7110 MOUE -1*Xstep,Z/l0-.02
7120 LA6EL 2/10
7130 NEXT Z
7140 MOUE 2'XstepJ .03
7160 RETURN
7170 I
7180 MIIII!IIMI!)III!IIMI!MIIIIIII!III!!!I!|||||!||||||||!|||MIIIII
71 90 I
7200 Date: I Enter date
Z*-""
7210
7220 DISP "ENTER DATE "&CHRK 129 >&Date*&CHRK 128 )i
7200 INPUT Z*
Z*-""
7240 IF THEN RETURN
7250 Date**ZS
7260 PRINT TABXY(40,4)iDate*i"
7270 RETURN
7280 I
7290 Run: ! Enter run number
Z*-""
7300
7310 DISP "ENTER RUN NUMBER "fcVCHPK 129 >&RunS&CHRK 128 >i
7320 INPUT Z*
Z*-""
7330 IF THEN RETURN
7340 Run*-Z*
7350 PRINT TABXY(40,6)|Run*|"
7360 RETURN
7370 I
7380 Wafer: I Enter wafer number
Z*-""
7350
7400 DISP "ENTER WAFER IDENTIFICATION "&CHRKI29 >&Wafer*&CHRK128 >i
7410 INPUT Z*
Z*-""
7420 IF THEN RETURN
7430 Wafer*-Z
TABXY(40,8)iWafer*i"
7440 PRINT
7450 RETURN
7460 !
7470 Ramp: ! Enter voltage ramp
7480 DISP "ENTER UOLTAGE RnMP START <U>. STOP (U), STEP (V) "&CHRK129 )iRamp_s
"," "
tart i i Ramp stopi |Ramp_stepiCHRS( 1 28 > i
7490 INPUT Ramp start , Ramp stop step
" .Ramp
1.18)1"
7500 PRINT TABXV(
7510 Ramp_start-INT( 100*Ramp_start + )/100 .S
N Ramp step-. 1
7560 TF ABS(Ramp start X10.0 AND ABS( Ramp_stop X10.0 AND ABStRamp step X. 01 THE
N Ramp step-. 01
7570 IF ABS(Ramp_start )>40 THEN
7580 IF Ramp start<0 THEN Ramp start 40
7590 IF Ramp~start>0 THEN Ramp start-40
7600 END IF
7610 IF ABS(Ramp_stop>>40 THEN
7620 IF Ramp_stop<0 THEN Ramp_stop 40
7630 IF Ramp stop>0 THEN Ramp_stop-40
7640 END IF
7650 Points-AB5( A65(Ramp_start-Ramp_stop )/Ramp_step >
branch:
7660 Ramp Type*-"N" I
7670 IF THEN Remp_step-ABS( Ramp_step )
Type*-"P"
7680 IF THEN Ramp_step ABSiRamp_step )
Type*-"N"
IF
77I0 PRINT'TABXYdoTjS)!"!!! MAXIMUM NUMBER OF DATA POINTS EXCEEDED (MAX-10
HI"
00 )
7800 BEEP
7810 SOTO Ramp
7820 END IF
10,18)|"
7840 RETURN
7850 !
166
TT-T-273Ure: ' E"ter tenPer8ture
7H0
INPUT"fNTER
TEMPERAnmE in CELSIUS "&CHRK129>.T,CHRKI28>.
7ll0
7900 IF T<20 THEN 7880
7910 T-ABS(T+273)
aW55'5)lH73''
77ii00
7940 I
8040 RETURN
8050 I
DS-voltaDe:
f22 ?*IP "EN"ER
Enter depletion voltage
DEPLETION
fg'g
8080
?.,xr..
"ltn utruciiuw UOLTAGE
INPUT Dep voltage
vuLinot &I.HKH T29
"&CHRK 1 ^3 )iDep_voltageiCHR$<128
> lUepvol tege |UHHS< 1 Zb )i
- v"
B090 Dep_voTtaged0
8100
IE THEN Dep
IF Dep voltege>-10 THEN Dep_vol
voltage-INT( 100Dep voltage*. 5 >/!00
tage-INT(l0*Dep voltage+.S )/l0
6110 IF ABSiDep voltage >>4 THEN 8070
f!2 IF Type*-"R" THEN bep.voltage
Type*-'P" ABS(Dep voltage)
!8140
S IE, THEN Dep_voltage-ABS( Dep Voltage)
T
PRINT TABXY(55,7)iDep voltaSei"
8150 RETURN
6160 I
8170 Frequency: I Enter measurement frequency
8180 DISP "ENTER MEASUREMENT FREQUENCY IN KHz "&CHRK129 )|Frequency |CHPK126 ) 1
6190 INPUT Z
8200 Z-ABS(Z)
8210 Res-1
8220 IF Z<10 THEN Z-10
6230 IF Z>-I0 AND Z<-20 THEN Res-.l
8240 IF Z>20 AND Z<-50 THEN Res-. 2
8250 IF Z>50 AND Z<-100 THEN Res-. 5
8260 IF Z>100 AND Z<-200 THEN Res-1
8270 IF Z>200 AND Z<-500 THEN Res-Z
6280 IF Z>500 AND Z<-1000 THEN Res-5
8290 IF Z>I000 THEN Z-1000
8300 Frequency-INT( Z/Res+.5 )*Res
TA6XY(55.8)|Frequencyi"
8310 PRINT
8320 RETURN
8330 I
8340 Test_level: I Enter test signal level
]-"L0" RMS)"
63E? IF Test level*! 1 THEN Z*-"HI ( IU
.2
RMS)"
B3S0 IF Test_level*t1 THEN Z-"LO (20mU
6370 Test levelC-Z*
TABXY(56,10)|Test_level*i" "
8380 PRINT
8390 RETURN
8400 I
8410 Wait time: I Enter wait time berween voltage ramp steps
8420 DI5~P "ENTER SETTLING TIME (IN SECONDS) FOR READINSS'&CHRK 129>iWait tlmei
CHR*(128)|
8430 INPUT Walt time
8440 Walt time-TNT( ABS (Wait time X1000+.S )/1000
8450 PRINT TABXY(55,9)iWait_timer
6450 RETURN
8470 I
8480 Ct max: I Ente CT cuttoff time
128)1"
8490 BlSP "ENTER STORAGE TIME CUT-OFF"SCHRK 129 )iCt_max|CHRK (MAX-500)
8530 PRINT~TABXYi55,11
B540 RETURN
8550 I
6560 !
Print/don'
8570 Doping data: I print doping dtat pints
Z*-"NO"
date*-"YES"
167
8640 I
Mea|-8.Peed!
Irkct Select HP4277 measurement
2ea_speedS-"FAST" speed
IPS II THEN Z*-"SLOU"
Meas_Bpeed*-"SLOW"
IcoS II *s_speed$
THEN Z*-"MEDIUM"
"MEDIUM"
Ilia
BfaaB Meas speedS-Z*
THEN Z-"FAST"
8720 I
PI ^Flegl-O ?HEN^-Ar^,t)hlCkne"/"PaClt'-
"&CHRK129)&"AREA"&CHRK128)&"/0XIDE cm2
8880 ELSE
8890 FOR Z1-1 TO 9
8900 Tox(Z1 )-Z*l .E-8
8910 NEXT ZI
8920 Flagl-1
8930 IF Flaa3-I THEN RETURN
894? lTox( PRINT
T
1 )1
TABXYdl k8 -
AREA/"&CHRK 129 >&"OXIDE"&CHRK12B >&"
ANG
.E+8i
8950 END IF
89E0 RETURN
8970 I
8980 Caps: I Select number of capacitors to test
BS30 IF Number*--!" THEN Z*-"2"
Number*-"2"
903e IF THEN Z*-"3"
9010 IF Number*-"3" THEN Z*-"1"
9020 Number*-Z*
9030 Number-UAL( Number*)
9040 RETURN
9050 I
9060 Type: I Select wafer type
Type*-"N" Z*-"P"
9070 IF THEN
Type*-"P" Z*-"N"
9030 IF THEN
9050 Type$-Z*
TypeS-"N"
9100 IF THEN
9110 Ace voltage-ABS(Acc_voltage )
9120 Dep_voltage
A6S(Dep voltage)
9130 Break_stop-ABS(Break~stop >
9140 END IF
Type*-"P"
9150 IF THEN
9160 Acc_voltage ABS( Acc_voltage )
5170 Dep_voltage-ABS(Dep_voltage >
9180 Break_stop ABSiBrea' stop)
9190 END IF
TestKSequence)-"CT-
9200 IF
-"ZERBST"
OR TestK Sequence >-"BREAKDOWNS" OR TestK Sequence
' >
THEN RETURN
MenuS-'IDPAGE"
9210 IF THEN Ramp branch
9220 PRINT TABXY(55,6)iAcc
voltagei"
168
PAGE"
i
9400 BEEP
9410 INPUT Z*
Z*-"T"
9420 IF THEN 9350
Z*-"R"
9430 IF THEN Idpage
9440 IF Cox(IX5.00E-10 THEN 9510
9450 OUTPUT 2iClear*i
9460 BEEP
fill"
9470 DISP "OUERFLOW ON ENTER T-TRY AGAIN C-CONTINUE R-RETURN TO ID_F
"
AGE i
9480 INPUT Z*
Z*-"T"
9490 IF THEN 9350
Z*-"RM
HpZ277rBI0EN"
9530 OUTPUT
9540 RETURN
9550 I
95E0 I
9570 Cv_data: I Collect C vs V data
9580 Z-I
>-"CVBT"
9590 IF TestK Sequence THEN Z-L
9600 DISP "CAPACITOR *"|Z|
)-"CUBT"
9610 IF TestK Sequence THEN DISF " CV DATA "iBias run*
DATA"
PROFILE" "
9620 IF TestK Sequence (-"DOPING THEN DISF PULSED CU
>-"CU" " DATA"
9B30 IF TestK Sequence THEN DISP CU
9640 J-0 voltaaei"EN"
"L0"
9690 OUTPUT Cv interfacei
9700 WAIT 2
9710 stop STEP Ramp step
FOR Volt-Ramp_start TO Ramp PROFILE" " "EN"
9740 OUTPUT
9750 IF Volt-Ramp_start THEN WAIT .5
9770 OUTPUT
9780 J-J+l
9790 ENTER Hp4277|Ad I
,J)
CAPACITANCE ARRAY
9800 Bd,J)-Volt I VOLTAGE ARRAY
SS10 NEXT Volt
9620 Cmax(I)-0
9830 Cmln(I)-0
9840 IF J<10 THEN
9850 Cmax( I )-Ad .Points)
9870 RETURN
9880 END IF
9890 FOR Z-1 TO 5
9500 Cmax( I )-Cmax( I )+A( I > )
,Points-(5-Z
10040 OUTPUT
10050 WAIT .5
"L0"
10140 DISP "RAISE PROBE tl . CLOSE HOT CHUCK BOX AND PRESS
10150 BEEP
10160 PAUSE , ,
169
101B0 WAIT .5
10200 WAIT 7
!2?i2 DISP "ZEROING METER
INPUT "ZEROING OK 7
MUt
10230 IF Z-"N" THEN 10190
ENTER
c"itn Y-YES
i " N-N0"7i
n no ,Z
"LWER PRBE #1
10250 BeIp D0UN' CL0SE H0T CHUCK B0x AND -CONT'"
10260 PAUSE
10270 RETURN
10260 !
10290 I
Collect c
?SI?i Ct!^!mIdate vs T data
10320 J-0
10330 J-J+1
10340 IF J-1000 THEN 10410
iSlfg OUTPUT
HpI^X"20 ' ftPPROXI^ELY 1.8SPTS/SEC
I?I\ER
]|IIi &Wti.Ui\ tim^Eatyan
Mt *****
ARRAY
10540 WAIT 1
10550 IF ABS(Ramp_start >>ABS(Dep voltage) THEN
SP4Z77'"BIV'Ra"P-st"rt??EN"
lIPS
Hp4277'"BI"'DeP-voltagei"EN"
I0H0
10B00 OUTPUT Cv interfacei "Ll"
10610 WAIT .1
iRamp stop
TEN"
10770 WAIT I
Hp4277|"EX"
10780 OUTPUT
10790 ENTER Hp4277(Cox( I >
10S00 RETURN
10810 I
10820 I
10830 Datajomp: I Calculate MOS parameters
COMPUTATIONS"
10840 DISP "DATA
10850 IF Cox(IXCmaxd) THEN Error
10860 Eg( I >-1 l785-( 9.025E-5*T )-(3.05E-7*T"2 )
.
10670 Nc-.81577+(3.453E-3*T*( 1-(T/437.B )+< T/81 4.2 >"2+( T/13SE )"3 ) >
10880 Nid >-2.51E+19*i(Nc*T/300)-1.5)*EXP(-Egd )/(2*K*T>)
6ate*-"AL"
10590 IF THEN Wf ( I ) 1 1-Eg( I )/2
.
Gate*-"NPOLY"
10900 IF THEN Wf (I ) EgTl )/2
10910 IF Flag1-0 THEN Tox( I )-Area( I >*Eox/Cox( I )
10920 IF Flagl-1 THEN Area( I )-Tox( I )*Cox( I )/Eox
10930 Wmaxl lT-Esl*Area( I )/Cmln( I )-Esi*Tox( I )/Eox
10940 Ns(l)-1.E+I5
10950 Z-Nsd )
10960 Nsi I >-4*Esi*K*T*L06(Ns( I )/Ni< I > >/(Wmax( I )*Wmax( I )*Q)
170
0970 IF Nsd><0 THEN Error
Son5 II ABS<<2-Ns(I))/Ns(I))>.00001 THEN 10950
V Test*1
(-"ZERBST"
TestKSequenee)"CUBT"
1340 IF THEN
1350 IF K t > 1 THEN 1 1 I 80
13G0 END IF
ErrorKProbeJi"
1370 DISP ON CAP t"i Prober T-TRY AGAIN B-BYPASS R-RETURN T
PAGE"
i ID i
1360 6EEP
13SE INPUT Z*
Z*-"T"
1400 IF THEN 11180
ZS-"R"
1410 IF THEN Idpage
1420 Error ( Probe )-2
1430 GOTO 1 1180
i440 I
1450 !
1460 Cv graph: I 6reph C vs V data
1470 OUTPUT 2iClear*i
1480 PRINTER IS 701
1490 FOR 1-1 TO 3*Number
1500 I )-"CUBT"
1510 IF TestK Sequence AND (1-2 OR 1-3 OR 1-5 OR 1-6 OR 1-8 OR 1-9) THE
N 11580
1520 I
1530 Z-0
1540 ON ERROR 60T0 11670
1550 FOR J-1 TO Points
1560 IF A(I,J)>Z THEN Z-Ad.J) I Find maximum capacitance for scaling
1570 NEXT J
1580 Yranged )-INTi Z/5.0E-1 1 + 1 X5.0E-11
1590 IF Yranged J-5.0E-1 1 THEN Yranged )-INT( Z/1 1 + 1 )*l 1
.0E-1 .0E-1
1600 I >-"CU6T"
1610 IF TestK Sequence AND (1-1 OR 1-4 OR 1-7) THEN G0SU6 Cv scales
PROFILE"
1620 IF TestK Sequence
>-"CU"
OR Test*( Sequence >-"D0PING THEfl 60SUB Cv_
scales
1630 MOUE Bd,1(,A(I,1) I B->Uoltage array, A->Capacitance array
1640 CLIP Xmin.Xmax .Ymin.Ymax
171
\"U ^T0"^rTHEN,,83e
11760 END IF
11770 IF 1-3 OR 1-6 OR 1-9 THEN
1730 DUMP GRAPHICS
11790 PRINT USING "3/"
AN Nu"ber"3 THEN PRINT CHRK12)
END^F1"6
118*8
11820 NEXT I
11830 GRAPHICS OFF
PR0FILE"
*-18tHENF11670t$(SeqUenC
R TestK Sequence >-"CU6T"
> AND Number
1 1 940 ELSE
11950 Xmln-Ramp_stop
119B0 Xmax-Ramp start
11970 END IF
X8tP"nBS<
!1 !1 115
990 Ymin-0
(Ramp_start-Ramp_stop >/10 )
12000 Ymax-Yranged >
12010 Ystep-Yrange(I)/l0
12020 GINIT
12030 6CLEAR
12040 GRAPHICS ON
ISIS
!12060 n1^v ,("15-z*xS*P.5"'+X.tp,Yiiin-2Yitp>VnaK4.Yitep
CLIP Xmin.Xmax .Ymin.Ymax
12370 Z-Xmin+.5*Xstep
Type*-"P"
12380 IF THEN Z-Xmln+5*Xstep
12390 Z1-.S5*Ystep
12400 MOVE Xmln+2.SXstep,Ymax+Ystep/3
H'CV" "CAPACITOR" PLOT"
12410 IF TestK Sequence THEN LABEL 1 1
1"
CV
)-"CVBT"
12420 IF TestK Sequence THEN
12430 IF 1-1 THEN Z3-1
12440 IF 1-4 THEN Z3-2
12450 IF 1-7 THEN Z3-3
PLOTS"
12460 LABEL "CAPACIT0R"iZ3i"CV
12470 END IF
PROFILE" "CAPACITOR"
12480 IF TestK Sequence )-"DOFINS THEN LABEL 1 1 TPULSED CV PL
OT"
172
2520 IF Error ( Probe )-0 THEN 12570
12530 LABEL "* BAD DATA ?"
"
LABEL "58 ^TC 1 E-9.QSS( I >+ 5 >/ 1 B, "E 1 0
. .
Q/cm2"
12690 MOUE'z'Ymex-WI
bnPI1/^^ :iINT(ie0.Vfb(I>+.5>/l00, "VOLTS"
!???
12710 MOVE Z.Ymax-S*Z1
"
12720 LABEL ,rUth I INTd 00*Vt ( I )+.5 )/
I00TVOLTS"
12760 !
12770 I
12780 Ct graph: ! 6raph C vs T data
12790 OUTPUT 2iClear*i
12800 PRINTER IS 701
12810 FOR 1-1 TO Number
12820 G0SU6 Ct.scales
12830 CLIP Xmln.Xmax.Ymin.Ymax
t^E >,n(I,1 ) f B->TIME ARRAY, A->CAPACITANCE ARRAY
!?|i2
I28a0
,B<V
FOR J-2 TO Ct jointsd )
12660 DRAW Bd.JI.Ad.J)
12870 NEXT J
12880 CLIP OFF
12890 MOUE 0..95Cmin(I >
12900 IF Storage timedXCt max THEN 12950
12910 DRAW Xmin+7.5*XstepJ.'9S*Cmin(I>
12920 MOUE Xmin+5*Xstep,.95*Cmind)
"Cmin-"
12930 LABEL t INT< 9.5E+l2*Cmind >+.5 >/ 1 0
12940 GOTO 12990
12950 DRAW Storage_timed),.95*Cmln(I>
12960 DRAW Storage_timed ) ,0
13140 Ymin-0
13150 Ymax-INT(Cmin(I)/5.0E-11 + 1 XS.0E-1 I
13160 IF Cmind X5.0E-11 THEN Ymax-INTi Cmind )/1 1 + 1 )*1
.E-1I .E-1
13170 Xmin-0
13180 Xmax-INT( Storage t ime( I )/5+.5 )*5+5 ! ROUND TO NEAREST 5 SECONDS (+5)
13190 IF Storage time(T)>Ct max THEN Xmax-Ct_max
13200 Ystep-Ymax7l0
13210 Xstep-Xmax/10
13220 WINDOW Xmin-2*Xstep,Xmax+Xstep,Ymin-2*Ystep .Ymax+Ystep
13300 LABEL
13310 MOUE Xmin+2.5*Xstep,Ymin-Ystep
173
13320 LABEL Xstepi"SECONDS/DIV"
13330 MOUE Xmin-Xstep/S.Ymin-Ystep
V
13340 LABEL Xmin
13350 MOUE Xmax-Xstep/3,Ymin-Ystep
13360 LABEL Xmax
13370 MOUE Xmln-1.5Xstep,Ymin+3*Ystep
13360 DEG
13390 LDIR 90
"CAPACITANCE"
13400 LABEL
13410 MOUE Xmin-Xstep/2JYmln+3Ystep
13420 LABEL Ystep/1
13430 LDIR 0
13440 MOUE Xmin-1 .25*Xstep.Ymin-Ystep/4
13450 LABEL Ymin
13460 MOVE Xmin-1. 25*Xstep,Ymax-Ystep/4
13470 LABEL Ymax/1.E-12
13480 MOVE Xmin+3*Xstep,Ymax
"CAPACITOR" PLOT"
13490 LABEL i I i "CT
13500 RETURN
13510 I
13520 !
13530 Title: I print title
13540 PRINTER IS 701
CHRS(27)6"tVk3S"
13550 PRINT
"
13560 FRINT
"
*>**
>&"
13650 PRINT
CHR*(27)&"&k0S"
13660 PRINT
13670 PRINTER IS 1
13680 RETURN
13650 I
13700 I
13710 Diag test: I System diagnostic test
13720 OFF KEY
13730 ON TIMEOUT 7.5 GOTO Err
13740 ON ERROR GOTO Err
13750 I
137B0 Begin: I
13770 OUTPUT 2iClear*i
13780 DISP CHECK"
13800 Z*-"TIMEOUT
interfacei"P0"
13830 OUTPUT
13840 ENTER Cv interfaceiStatus* STATE"
174
14090 WAIT .25
14100
14110 fcTMR1M?=T1rterface,s*atus
14120
OUTPUT*
rTa*uJ*><>80
THEN Err
OUTPUT Cv_interfacei "L0"
14130
14140 PRINT TABXY(40,5)i"OK"
14150
14160 OFF TIMEOUT 7
14170 OFF ERROR
14180 60T0 Haln menu
14190
14200 Err:
14210 OFF ERROR
14220 DISP Z*i" CALL ERIC MEISENZAHL FOR SERVICE'
14230 BEEP
14240 I
14250 I
14260 I
14270 Zero meter
14280
2,Cleer*,Zer
Mp "eler
"OUTPUT
14290 "RAISE PRBE *' FF 0F WAFER ftND PRESS 'CONT'
14300 PAUSE
14310 OUTPUT Cv interface i "PI"
14320 OUTPUT Hp7277i"Z0"
14330 DISF ^ZEROING CAPACITANCE METER "
14340
14350 60T0 Mein_menu
14360 END
175
APPENDIX K -
DC AUTOMATIC TEST PROGRAM
176
10 DC Automatic Probing Test Progrem
20 Rochester Institute of Technology
30 By Eric J. Meisenzahl
40 Revised 01/31/87
50
60
70 The following program contains code necessary to test and analyze
80 devices made from the Process Control Test Chip. The main program
90 flow Is listed just below this text. Subroutines are listed below this
100 main section and they are listed in alphabetical order. Wherever
1 10 appropriate comments are added throughout the code for documentation
120 purposes.
130
140 Matrix configuration
150 Inputs (rows ) 0 SMU1 ( from HP4145)
160 1 - -
SMU2 ( from HP4I45)
170 m-
-
VS1 ( from HP4145)
180 3 -
VMI ( from HP4145)
190 4 -
DRIVE ( from PAR M410)
200 5 - -
INPUT ( from PAR M410)
210 6 -
SMU3 ( from HP4145)
220 7 -
SMU4 ( from HP4145)
238
24B Outputs ( cols ) 0 Substrate
250 1 Pin 1 of device
2G3 Pin 2 of device
270 Pin 3 of device
280
290 NOTE: Voltages sent to the PAR M410 are passed through an Inverting
300 stage. The program automatically compensates for this.
310
320
330 Dimension/declare variables
34C
350 DIM Diex(50 > (50),Fcap1 200(50) , Fcapl 400(50 ), Fcapl 600(50 >
.Diey
450 ,YS(10)[
470 !
480 i
490 i
500
GOSUB Default values I Assign initial values
510
520 LOOP
GOSUB Main_menu Select test/defaults
530
OUTPUT 2iMenuSi Turn off softkeys
540
GOSUB Init_hp4145 Initialize HP4145 meters .sources
550
Initialize variables
560 GOSUB Zero_vanables
570
Timel-TIMEDATE Test stert time
580
590 FOR Chip-1 TO Number of_die
600 FOR Test-1 TO Number jf_t est 5
Move prober to chip location
610 GOSUB Move prober
GOSUB Test_wafer Test structure
620
630 NEXT Test
640 NEXT Chip
Test_time-TIMEDATE-Tlme1 Test time
650
6B0
Reset test equipment
670 GOSUB Reset_test
Calculate statistics
680 GOSUB Calc stats
Print test results
690 GOSUB Printout
Print statistics
700 GOSUB Prmt_stats
Turn on softkey menu
710 OUTPUT 2;Menu*i
720 END LOOP
730
740
750
7E0
770 l ji
780 nnnnnMMnMM
j^ SUBR0UTINES
(alphabetized)"*"
790
800
177
810
820 C 1rADtSts: Calculate avg, std. N and ^failures of each parameter
830 FOR Parameter-1 d ,, TO 31
840 GOSUB Transform I Copies parameter variables to general
850 ...
I to general variables 'Value' or 'Value*'
8G0 Nl -0
870 X-0
880 S-0
890 IF Parameter<-7 THEN GOSUB Calc stats!
900 IF Parameter-8 OR Parameter-9 THEN 60SUB Calc_stats3
910 IF Parsmeter>-20 AND Parameter<-25 THEN GOSUB Calc stats2
920 IF Process=2 THEN
930 IF Parameter>-10 AND Parameter<-1 5 THEN GOSUB Calc statsl
940 END IF
950 IF Process-3 THEN
960 IF Parameter>-16 AND ParameterC-1 9 THEN GOSUB Calc statsl
970 IF Parameter>-26 THEN GOSUB Calc stats2
980 END IF
990 NEXT Parameter
1000 I
1010 l This section determines the minimum defect
density based on capacitor
1020 I breakdowns <2MV/cm.
1030 !
1040 Area-. 0004
1050 Defect density-tErrort 1 ,2 1/100 !/Area
1060 Area-.001E
1070 Z-(Error( 1 ,3 >/1 00 )/Area
1080 IF Z>Defect density THEN Defect density-Z
1090 Area=.003B
1100 Z-(Error< 1 ,4 )/100 )/Area
1110 IF Z>Defect_density THEN Defect_density-Z
1 120 Area-.00E4
1 130 Z-(Error(1 ,5 )/100 (/Area
1 140 IF Z>Defect density THEN Defect_density-Z
1 150 Defect_densTty-PROUND(Defect density .0)
1 1E0 i
1 170 RETURN
1 180
1 190
1200 t 31 31 3t ][ 3t 3t It 3111 3t 3t 31 31 31 3131 3t 3[ 3t 31 3[ 3t 3t ]t 3t 3MC3I 3t ]t ]t ][ 3(3t 3t 3
1210
1220
1230 Calc_statsl: I Calculate statistics for parameters having failure codes
1240 ! -1,-2 or -3 that are real number parameters
1250 FOR 1-1 TO Number of_die
1260 IF Valued )<0 THEN
1270 IF Valued) 1 THEN Errorf 1 )=Error( 1
.Parameter )+ 1 .Parameter
1300 ELSE
1310 Nl -N1 + 1
X- X + Value( I )
1320
1330 S= S+Value(I XValued )
1340 END I F
1350 NEXT I
1360 I
1370 I Change Error<,*) to be a percentage ( format-xxx.x )
1380 Errort 1 Parameter )-100*PROUND( Errorf 1 )/Number_of_die
.Parameter ) ,-3
1410 I
1420 IF N1-0 THEN RETURN
1430 N(Pareme ter)-N1
1440 AvgtPara meter )-PR0UND( X/N1 ,-2)
14S0 StdlPara meter )-PR0UND! SQRt ABSt ( N1 S-XX )/( Nl *(N1 -1 )))>,-2>
1470 RETURN
1480
1490
1500 t 3t3[3t3[3t3t3t]t]t]t]t]t3t]t3t3t3I3I]t]t3[]t3[)I]I]I3t3I)t3[3I3[]t]t3[3
1510
1520
1530 Calc stats2: I Calculate stats from parameters that have failure code
'S* '0' 'R'
1540 I .
or
I5S0 .Parameter
)-"0"
THEN Errort 2 )-Error(2 )+l
IF Value*! I
.Parameter
1570 .Parameter
)-"R"
THEN Error! 3 >-Error< 3 )+1
IF UalueSd
.Parameter
1580 .Parameter
1590 NEXT I
1600 I
178
1610 ! Change Errort ,) to be a
percentage ( format-*** *)
.
1900 Errort 4 Parameter )-! 00PROUND( Error! 4 . Parameter (/Number of die -3)
1910 Errort 5 Parameter )-100PROUND< Error( 5 (/Number^oCdie [-3 )
.Parameter
1920 !
1930 IF N1-0 THEN RETURN
1940 N( Parame ter)-N1
1950 Avg! Para meter 1-PR0UND! X/N1 -2)
19E0 IF NI-1 THEN RETURN
1970 Std(Paraimeter >-PR0UND(SQR!ABS( < Nl *S-X*X )/< Nl ( Nl -1 ) ) ) ) -2 )
1980 RETURN
1990 1
2000
2010 t It 3t 3t 3t 3t 3I3t 3t 3t 31 ][ 31 31 31 3t 31 31 3t ][ ]!][ ]t It ]t It ]t 3t ]t ][ ]t 3I3I][ ]t 3
2020
2030
2040 Cat disk: ! Display contents of floppy disk files
Store_or_loadS="CAT"
2050
2068 ON ERROR GOTO Disk error ~
2310 Test*="CAP1"
2358 WAIT .5
23B0 END IF
2370 I
2380 Area-1 .6E-3
I 400x400uM cap area ( cm2 )
"TUB"
2390 CALL Meast 5) .Cox,
I Measure capacitance
2400 IF Cox<.1 OR Cox>9.9 THEN I Cap out of meter scale
179
"325"
2410 OUTPUT Matrix; ! PAR410 'INPUT' to 200uM cap
2420 OUTPUT Matrix ("304"
2910 NEXT I
2920 OUTPUT Hp4145; "DS1 I Substrate-8V
2930 I
2940 FOR 1-1 TO 4
2950 CALL Meast "TV'&VALKI ),Z1 ,3) I Meas breakdown at SMU T
29E0 I
2970 Z-ABS!PR0UND'Z1/( 1 .E-2*To* 1 ! Chip 1 ) , !))! Convert to field breakdown
2980 IF Z<2 THEN Z 1 ! <2MV7cm
2990 IF Zl>99 THEN Z 2 ! out of meas capabilities
3008 IF Z>10 THEN Z--3 ! don't believe it
Test*-"CAP1"
3010 IF THEN
3020 IF THEN Fcap1_200(Chip)=Z
3030 IF THEN Fcapl 400(Chip )-Z
3040 IF THEN FcapC608(Chip)-Z
3050 IF THEN Fcap1_800(Chip)-Z
3060 ELSE
3070 IF THEN Fcap2 200(Chip)-Z
3080 IF THEN Fcap2_400(Chip )=Z
3090 IF THEN Fcap2_E00(Chip)-Z
3100 IF THEN Fcap2_800(Chip)-Z
3110 END IF
3120 NEXT I
3130 GOSUB Reset_equip
3140 RETURN
3150 !
3160 i
j-mmcji nil jnnnnn
3170 nnt jntuinnnnnt jnrunjMt n jmmi jt
3180
3190
3200 Cap_range: Toggles selected PAR M410 capacitance range
180
3210 fro" MftIN-"ENU subroutine
3220 TF
ir r,n ,..!= c THEN
Lap_range=.5 Turn 7
Z-1,
3230 IF Cap_range-1 THEN Z-5
3240 IF Cap_range=5 THEN Z-10
3250 IF Cap_range=10 THEN Z-20
3260 IF Cap_range-20 THEN Z-50
3270 IF Cap_range=50 THEN Z-1 00
3280 IF Cap_renge-100 THEN Z-200
3290 IF Cap_range200 THEN Z-500
3300 IF Cap_range-500 THEN Z-1000
3310 IF Cap_range=1000 THEN Z-2088
3320 IF Cap_range2000 THEN Z-.5
3330 Cap_range=Z
3340 RETURN
33S8
33E0
3370 t3[3t3[3I3[3[]t3[3t ][3t 2131 3t3t3[ 31 31 3f3r3r][3t 3t3t]t]t]I 3t3t 31 313! 313
3388
3398
3408 Contl : l
3410 Test* "C0NT1"
3420 60T0 C ont
3430 Cont2: I
"C0NT2"
3440 Test*
3450 Cont : j Contact hole size test algorithm
34E0 GOSUB Display_status
3470 GOSUB Reset_equip
"306"
3488 OUTPU Matrix ; Connect substrate to SMU3
349e OUTPUT Matrix ; "331 "
Connect pin 3 to SMU2
"340"
3500 OUTPUT Matrix; Connect pin 4 to SMU1
3510 l
3520 OUTPUT Hp4145;"DU1 ,1 I SMU1 Force 6V , 100mA comp.
3530 OUTPUT Hp4145; "DV2 ,1
;-E*Type;"
100mA comp
"
3540 OUTPUT Hp4145;"DV3.1 1 ,0,. ! SMu3 ground
3558 GOSUB Cont test ! Peform contact test
t$-"C0NT1"
35E0 IF Tes THEN Cont3S(Chip (-Contacts
t*-"C0NT2"
3570 IF Tes THEN Cont 10S( Chip )-Contact$
3580 I
"
3590 OUTPUT Matrix; "231 ! Disconnect SMU2 from pin 3
"
3600 OUTPUT Matn> ;"31 1 ! Connect SMU2 to pin I
3610 GOSUB Cont_test
t$-"C0NT1"
3620 IF Tes THEN ContSSt Chip )-ContactS
tS="C0NT2"
3630 IF Tes THEN Cont I2S! Chip (-Contact*
3640 I
"
3E50 OUTPUT Matrix;"2l 1 ! Disconnect SMU2 from pin 1
"
3660 OUTPUT Matrix; "321 I Connect SMU2 to pin 2
3670 GOSUB Cont test
t*-"C0NT1"
3680 IF Tes THEN Cont7S(Chip )=ContactS
tS-"C0NT2"
3698 IF Tes THEN Cont 15S( Chip (-Contact*
3700 I
3710 RETURN
3720
3730
3740 I 31 3t 3t 3t 3t 31 3t 3t 3t 3t ][ 3[ 31 3t 3t 31 3t 3t 3I3t 3t 3t 3t 31 31 3t 3t 313131 3t ]I It ]
3750
37E0
3770 Cont test: I Perform contact hole test
3780 WATT .05
Meas("TI3"
3790 CALL .Leakage,
3) ! Measure substrate leakage
3800 R-ABS(E/(Leakage+1 .E-15))
"TI2"
3998
4000 GOSUB Display_statu5
181
4010 GOSUB Pretest 1
4020 IF Short to substrate pretest
Resistance-1 THEN
4830 ContrestChip > 1
4040 FdrtChip ) 1
4050 Vth(Chip) I
40E0 VbrtChip) 1
4070 RETURN
4080 END IF
4090 GOSUB Pretest2
4100 IF Resistancel-1 THEN Open contact pretest
4110 FdrlChip ) 2
4120 VbrtChip ) 2
4130 Vth(Chip) 2
4140 ContrestChip )2
4150 RETURN
41E0 END IF
4178 IF Resistance-1 THEN
4188 l ContrestChip >
2
4198 IF Resistance-0 THEN
4200 GOSUB Reset equip
4210 OUTPUT Matrlxi"310"
4220 SMUl to pin 1
OUTPUT Matrix; "321"
4230 SMU2 to pin 2
OUTPUT Matrix;"33S"
4240 SMU3 to pin 3
OUTPUT Matrix; "347"
4280
,0
SMUl I , 10U c omp
OUTPUT Hp4l45;"DI3 0
0,10"
Meas("TU3"
4350 CALL ,Voltage2 5)
43E0 Delta_v-ABS(Voltage1-0oltage2 ) Volt age drop
4370 ContrestChip (-PROUNDt Del ta v/Contres curr -2) cont act resistance
4380 IF Delta_v<.001 THEN Contres! Chip > 3 fail if <lmV
4390 IF ContrestChip )>-1 THEN ContrestChip
.00E+5
>--
3 ! fai 1 ir Rc>10Ei
4400
4410 Contrest Chip >2
4420 END IF
4430
4440 Icurr-1 ! Current
.E-3
setting for FDR meas
4450 GOSUB Reset_equip
"320"
44E0 OUTPUT Matrix; SMUl to pin 2
"330"
4470 OUTPUT Matrix; SMUl to pin 3
"301"
4488 OUTPUT Matrix; SMU2 to substrate
4490 I
4500 OUTPUT Hp4145;"DIl ; IcurrType;
"
SMUl Force
,0
182
ZS&" (max-100mA,min-10nA)"
4810 DISP ;
4820 INPUT Contres_curr
4830 IF Contres_curr<1 .0E-8 OR Contres curr> 1 THEN Contres_curr
.
4850 RETURN
4860
4870
4880 t 3t 3t 3t3t ]t It 3t 3t3t 3t ][ 3MI3I ]t 3t 3t 3t Hit ]t 3t 3t 3t 3t 31 3t 3t 3t 3t ]t 3t 3t3
4890
4908
4910 Date: ! Set date from Main_menu
4920 CONTROL 1,10|1 l Turn on cursor
4930 DISP "Enter Date (format- mm/dd/yy)";
4940 INPUT DateS
4950 IF LEN(Date$X>8 THEN Date
49B0 CONTROL 1 ,10;0
4970 RETURN
4980
4990
5000 t 3t 31 3t 3t ]t 31 3t 3t 3t 31 3t 31 3t 3t 3t 3131 It It ]t 3t ][ 3t 3t 31 3t 3t 3t 31 3t 3t 3t ][ ]
5010
5020
5030 Default values: i Start up default values
5040 PRINTER IS 1 Output is screen
5050 GCLEAR Reset graphics
5060 ClearS-CHRS! 255 l&CHRS! 75 ) Assign Clear* to clear screen
5070 SystemS=CHRS(255 l&CHRS! 125) System softkeys
50B0 MenuS-CHRS! 255 (iCHRS! 1 24 ) Assign Menu* to turn on/off softkeys
5090 UserS=CHRS!2S5)&CHRS( 123) Assign UserS to turn on user softkeys
5100 Userl*=CHRS!255)&CHR$( 12E ) Assign userlS to select softkey sets
5110 InverseS-CHRS! 129) Inverse video (screen)
5120 Of fS-CHRS( 128) Normal video (screen)
5130 OUTPUT 2;ClearS; Clear Screen
5140 Hp4I4S=717 HP4145 select code eddress
5150 Prober-707 Prober select code eddress
51E0 Matnx-709 Matri* select code address
5170 Plotter-705 PLotter select code address
5180 LOCAL Prober Release prober from computer control
5190 Xdim-762 X-steppmg distance
5200 Ydim-7G2 Y-stepping distance
5210 Cap_range-2O0 PAR M410 Capacitance range
5220 Eox-3.45E-13 Permittivity of oxide
5230
Uafer_type*="N"
Default wafer type
5248 Type=1 Type=1 for N-type, -1 for P-type
5250 GOSUB Die_pattern Generate die stepping pattern
5260 GOSUB Step_pat_table Lookup table for inter-die stepping
5270 GOSUB Pnnter_setups Printer variables
5280 GOSUB Parameters Assign numbers to parameters
5290 Process-1 Default process number
Menu_page$="MAIN"
Default menu page
5300
5310 Udpw1_current=. 1 Default forcing current VDPU1
5320 Udpw2_current=. 1 Default forcing current VDPW2
5338 Lw38_188 curr-. 1 Default forcing current LW30_100
Lwl5_!000"_curr=. 1 Default forcing current LUIS 1000
5340
5350 Contres curr-.l Default forcing current CONTRES
53E0
Param_type*-"NUM+STD"
183
5S10
5620 Disk_error: ! I Error recovery from disk operations
5638 SELECT ERRN
5640 CASE 54
5650 "Duplicate filename
5660
915?
GOTO Disk
press <RETURN> to continue";
Jump
5E78 CASE 5B
5680 "Filename is
5B90
Bllf,
GOTO Disk
undefined press <RETURN> to continue";
jump
5700 CASE B4
5710 glSP "Mass storage media overflow press <RETURN> to continue";
5720 GOTO Disk Jump
5730 CASE 80
5740 DISP "Media changed or not in drive press <RETURN> to
continue"
Exit files
6200 " data"
"
184
6410
Jt3[3t313[3t]13[][3[]t]13t3[]t]l][3[313t3t][3[3[3[3[3t3t3t3t3t3t3t3[3
,
E5E0 GRAPHICS ON i Turn on "
graphics
p
6570 Xmin-MIN(Diex(*)>
6580 Xma*-MAX!Diex( ) )
6590 Ymin=MIN(Diey< ) )
6B0O Ymax=MAX(Diey( ! )
6E10 WINDOW Xmin-1 +2
.Xma* ,Ymln-1 ,Ymax+2 I Graph scales
EB20 FOR 1-1 TO Number of die
6E30 MOUE Die*! I ),Diey(I )
6B40 RECTANGLE 1.1 ! Draw chip locations
BB50 NEXT I
6660 CSIZE 2 | Character sizes
6B70 FOR I-Xmin TO Xmax
6680 MOUE I+.4,Ymin-.25
6690 LABEL I I Label X chip coordinates
6700 NEXT I
6710 LDIR 90 ! labels are at 90 degrees
6720 FOR I-Ymin TO Ymax
6730 MOVE Xmin-.l .I+.4
6848 !
E858 CSIZE 3
E8E0 X-.1
6870 Y-.4
E88B IF Flag-1 THEN X-.4
6890 i
E9BB FOR 1=1 TO Number of_die I Place parameter values in chip locations
6910 !
B92B IF Flag=8 AND Stdt Parameter >>0 THEN
6930 Num_std-PROUND< (Valued )-Avg< Parameter ) )/Std( Parameter ) ) ,-2
6940 END IF
E95B !
69E8 MOVE Diexd )+X I )+Y .Dieyt
7000 IF
type$="NUM+STD"
71E0 ELSE
7170 MOVE Xmin+1 ,Ymin-1
185
7200 MOUE Xmin+1 ,Ymin-.75
contact <R>20Mohm)
<"
:K;3D-^K"'ZI.E'"^(2.Parameter)."!d"
77$
ti.5VS fcn?j|LUSI5?
MOVE Xmin+ 1 .50
7240 ZS-"R -
7260 END IF
7270 MOVE Xmin.Ymin
7280 PEN 0
7290 !
7300 IF Graphics outputS-"PRINTER"
THEN
7310 DUMP GRAPHICS
7320 PRINTER IS 701
7330 PRINT FfS
7340 PRINTER IS 1
7358 END IF
736B !
7370 IF Graphics_output*-"SCREEN" THEN INPUT Z*
7380 !
7390 GINIT
7400 GRAPHICS OFF
7410 OUTPUT 2;MenuS;
7420 RETURN
7430 !
7440 I
7450 lt]n[][][][]n[][][J[][][)[][][][][][]t][]I3[][][lt][][][][3I][][][]
74E0 !
7470 !
Gr2P,Si.c5-nenu: ! Sel=t wafer mapping or histogramming of any parameter
Zf5
7490 OUTPUT 2;ClearS; ! clear screen
7580 GOSUB Userl I softkeys
7510 Flag=0
7520 Flagl=0
7530 Parameter-0
7540 FOR 1-0 TO 23
7550 OFF KEY I
75E0 NEXT I
7570 !
7580 LOOP
InverseSS"
7590 PRINT TABXY(20,1 > ; PARAMETER WAFER MAPPING "iOffS
7600 FOR Ii-1 TO 15
7610 IF Ii<l0 THEN PRINT TABXYdS 1 ) ;UALS( 1 1
,Ii+
)
)&"
"UParameterS! Ii )I I ,
93
)&"
7620 IF Ii>9 THEN PRINT TABXY! 1 5 + 1 ) ; VALS! Ii
,11 ) "&ParameterS( I i )[ 1 ,93
7B30 NEXT Ii
7648 FOR I1-I6 TO 31
)5"
7650 PRINT TABXY(43,Ii-14);UALS(Ii ) "SParameterSt Ii )f 1 ,93
7660 NEXT II
-"
7700 !
" PARAM"
7710 ON KEY 1 LABEL SELECT GOSUB Select param
,5
"
7720 ON KEY 3 LABEL PLOT "&Peram_type* 60SUB Param type
,5
7900 IF THEN
7910 Graphics_output$=ZS
7920 RETURN
7930 !
7940 I
7950 innt junnnnnnnc unit jnnnnnnnt jnnt Jtjnnnnnt mM
7960 !
7970 i
7980 Histogram: I Histogram graphics tclasses -
10 (fixed)
186
7990 IF Parameter-0 THEN RETURN
8000 IF Flag-0 THEN
8010 IF Stdt Parameter (-0 THEN RETURN
8020 ELSE
8030 IF UalueSd)-"" THEN RETURN
8040 END IF
8050 OUTPUT 2;ClearSiMenuSi
8060 MAT Class- (0)
8070 GINIT
8080 GCLEAR
8090 DEG
THEN PL0TTER
InO IS Plotter
8550 Ystep=Yma>./10
85G0 END IF
8570 IF Ymax-Ymin<-0 OR Xmax-Xmin<-0 THEN
8580 OUTPUT 2;ClearS;MenuS;
859B RETURN
8B0O END IF
8E10 i
8620 WINDOW Xmin-Xstep + Xstep
,Xma*
,Ymin-2*Ystep ,Ymax+3*Ystep
187
8790 LABEL Ymin
8800 MOVE Xmin-Xstep
,Ymax-.25Ystep
8810 LABEL PROUNDt Ymax -2 >
8830 MyES---SXsteP.Ymin+3.Ystep
|IgfEL0PROUND<Ystep'-2,'',/Dly"
II50
88E0 IF Flag-0 THEN
111%
8880 T2HI, Xmln-.S.Xstep
LABEL PROUND! Xmin )
.Ymln-Ystep
.-2
Iq
8900 M2yj Xmax-Xstep.Ymin-Ystep
LABEL PROUNDt Xmax ) .-2
8950
^ELXm|n+'-3*^tep .Classd)
^ELX?0n+-3*XstaP.Class(2)
8970
^ELX^+3-3-^tep.Class<3
HIS
9080 END IF
9018 I
9828 !
9030 PEN 2
9040 CSIZE 4
9050 MOUE Xmin, Ymax+1 .BYstep
IS6,0. LABEL "Date:"&DateS&" Run: "&RunSS."
Wafer: "&WaferS
9070 MOUE Xmin, Ymax+1 .lYstep
lj-flBEL "Pi"oces5 ";Process;"
= Parameter-"
iParameterK Parameter )t I
9038
,93
9100 I
9110 CSIZE 3
9128 IF Flao=0 THEN
9130 MOVE Xmin+8.5Xstep Ymax + 1 .2*Ystep ,
"
9140 LABEL "Std- ;Std< Parameter )
9150 MOUE Xmln+8.5Xstep Ymax + 1 .8Ystep ,
"
91E0 LABEL "Avg- ;Avg( Parameter )
9170 ELSE
9180 MOUE Xmin+.5*Xstep ,Ymin-2*Ystep
9190 ZS="S Short to sub
-
(R<20Mohm) C
92e8 LABEL USING "K D .3D.
; ZS Error! 1
, ). "X
.Parameter
)"
<R>20Mohm)
("
9278 END IF
9288 MOUE Xmin, Ymin
9290 PEN 0
9300 l
Graphics_outputS="PRINTER"
9310 IF THEN
9320 DUMP GRAPHICS
9330 PRINTER IS 701
9340 PRINT Ff$
9350 PRINTER IS 1
9360 END IF
9370 !
outputS-"SCREEN"
9570 INPUT Z*
9580 CONTROL 1 ,10,0
188
ZSO"YES"
9590 IF THEN RETURN
9S00 I
9610 OUTPUT 2;ClearS;
9E20 DISP "Initializing disk "
9898 Store
File*-""
99B0
9910 CONTROL 1 ,10;1
9920 DISP "Enter filename of data you wish to receive <RETURN> to exit";
9930 INPUT FlleS
9940 CONTROL 1 ,10;0
FlleS-""
9950 IF THEN RETURN
99B0 I
"
9970 DISP "Loading data from disk
9980 ON ERROR GOTO Disk_error
9990 GOSUB Zero_vanables
10000 I
leS&" "
10010 ASSIGN SPath I TO Fi : ,7001
10020 ENTER SPath T USING "7A ,2A ,8A (RunS .DateS
.Wafer* .Process
10100 END IF
101 18
10120 ENTERS|path 1 ; Cont res! * ) ,Uth( ) * )
,Fdr< )
.Vbr! ,Cont3S( ) ContSS! * )
),Cont12S(* ),Cont15S< >
10130 ENTER ePethlt ;Cont7*( ),Cont10S(
10140
10150 ENTER 8Path 1 ;Test t ime ,Uafer_typeS Type
,Udpw1
,Cap_range
,
current
10260
10270 i
10280
10290 Lw15_1000: I tabs
Length-1000
Distance between voltage
10300
Conductor linewidth
10310 Linewidth-15
1000"
10320 TestS-"LW15
10330 Current-Lw15"_1000_
10340 GOTO Linewidth
10350 Lw30_100: I
Length- 100
10360
10370 Linewidth-30
Test$-"LW30_100"
10380
189
10390 Current -Lw30_100_curr
10400 Linewidth: I
10410 Electrical linewidth test algorithm
GOSUB Display status
10420 IF Process-3 THEN Current
Current
10430
10440 IF Sheet_rho1
(Chip X0 THEN
10450 IF Sheet_rho2(Chip X0 THEN
10460 Teo+.I-"L.U|30 100"
10470 ?r ~
THEN Lw30 100<Chip> 10
"
EN L""S_1000(Chip)-10
10480 RETURN
10498 ELSE
10500
10510 Sht_rho-Sheet_rho2(Chip )
10520 ELSE
10530 IF Sheet_rho2(Chip ><0 THEN
10540 )
ELS|heet_rho-Sheet_rho1(Chip
10550
I05B0 S|jeet_rho-Sheet_rho2<Chip>
10570
10580 END IF
10590 !
10600 GOSUB Pretest I
10610 IF Resistance-1 THEN
10E20 IF TestS="LU3B_100" THEN Lw30 1 00!
10E30 |PTTe5tS="LW15_1000" Chip ) 20
THEN Lw15"_l000< Chip ) 20
10E40 RETURN
10E50 END IF
10E6B GOSUB Pretest2
10670 IF Resistance-1 THEN
1068B IF TestS-"LW3B_100" THEN Lw30 100! Chip) 30
10690 IF TestS-"LW15 1000'
THEN Lw15"_1000(Chip) 30
10700 RETURN
10710 END IF
10728
10730 GOSUB Reset equip
"310"
10740 OUTPUT Matrix; i "321
" j"33E";"347";"302"
10750
10760 Ttype-1
10770 IF Process=3 THEN Ttype 1
10780 OUTPUT Hp4145; "DI1 ,1
0,10"
;TypeTtype;
, 1
"
,.
"
Tes*.S="LW15_l000"
10810 IF THEN OUTPUT Hp4145;"DI3 1
100"
10820 IF Test$="LW30 THEN OUTPUT Hp4145;"DI4 1
TestS="LW15_1000"
10830 IF THEN OUTPUT Hp4145;"DV4 1 "
;TypeTtype; 1
"
.
'
, ,
10840 OUTPUT Hp4 1 45 ; "DS1
10850 WAIT .05
"TV1"
108EB CALL Meas! .Voltagei ,5)
TestS="LU30_100" "TU4"
10870 IF THEN CALL Meast tage2
,Uol ) ,5
1000" "TV3"
10880 IF TestS="LU15 THEN CALL Meas! ,Voltage2) .5
10900
10910 Delta v=ABS< Vol tagel -Vol tage2 )
10920 R=ABS(Delta_v/Current )
10930 IF Delta v<.00! OR Vcomp>9.9 THEN
TestS="LW30_100"
10940 IF THEN Lw30 100(Chip)=- 40
TestS-"LU15_1000"
10950 IF THEN Lwl5 1000! Chip (40
109E0 RETURN
10970 END IF
10980 Wcalc-Sheet_rhoLength/R
10990 Lw=PR0UND(Wcalc-Linewidth,-2)
1 1000 IF Process=3 THEN
1 1010 IF ABS(Lw)>10 OR Lw<0 THEN Lw 50
1 1020 ELSE
1 1030 IF Lw<-Linewidth/3 OR Lw>0 THEN Lw 50
1 1040 END IF
1000"
1 1050 IF Test$="LW15 THEN Lw1 5_1000( Chip )-Lw
TestS-"LW30ll00"
1 1060 IF THEN Lw30_100( Chip )-Lw
1 1070 RETURN
1 1080 |
1 1090 i
1 1 100 !t 31 3t 3t 31 3t 3t 31 31 3t 31 3 1 3t 3t ]t 3t 3t3I 3t 3[ 31 3t 31 3t 3t 3t 3t 3t 3t 3[ 3t 3t 3t 31 3
11110 I
1 1120 j
11 130 Lw30 100_curr:l set default forcing current
1 1 140 CONTROL 1 1 ,10;
structure"
190
11190 CONTROL 1 ,10:0
11200 RETURN
1 1210
11220
1 1230 t 3t 31 )t 31 3 1 ][][][][ 3t 3t It It 3t3t 3t 3t 3t 31 3t 3t UK 31 It 3t 31 3t It ]t ]t 3t 3t 3
1 1240
1 1250
11260 Lw15 1000 curr: ! set default forcing current
1 1270 CONTROL 1 ,10; 1
structure"
1 1330 RETURN
1 1340
1 1350
1 13E0 t 3MI3I 3tU 3t3I3[]t]t 3t K U U K K ]I ]t 3t 3t3t3t U 3t3t]tK]t]t 3t 3t3tK JI)
11370
11380
11390 Main_menu: ! Main menu (program beginning)
1 1400 I
11410 CONTROL 1 ,10;0
1 1428 LOOP
1 1430 OUTPUT 2;ClearS;
11440 GOSUB Userl
1 1450 FOR 1-0 TO 23
1 1460 OFF KEY I
1 1470 NEXT I
1 1488 !
11490 Z*-InverseS
Electrical In-Process Control Test Chip Program
Z$=Z*&"
I 1580
11510 PRINT TABXYtE 1 );ZS
1 1528
ZS="
Rochester Institute of Technology
11530 ZI=ZSf,Off$
1 1540 PRINT TABXY(6,2 2);Z$
11550 I
Date"
ON KEY LABEL
'
Wafer GOSUB Type
1 1660
GOSUB Cap_range
lange"
ON KEY LABEL
"
VDPW1 GOSUB Vdpw1_current
1 1680 Current"
ON KEY LABEL
"
VDPW2 GOSUB Vdpw2 current
11690 Current"
LABEL
"
LU30 GOSUB Lw30_T00 curr
1 1700 ON KEY Current"
LABEL
"
LWI5 GOSUB Lu15_1008_curr
1 1710 ON KEY Current"
11780
11790 ZS-ZS&ZS
11800 PRINT TABXYf 1 ,Z);ZS
1 1810 NEXT Z
1 1820 LOOP (Date*
PRINT TABXY! 15,5)|"f 1 Date
11830 "iRun*
PRINT TABXYt 15,6);"f2 Run
1 1840 ";UaferS
Wafer
1 1850 PRINT TABXY(15,7);"f3 "
iProcess
PRINT TABXYt 15,9);"f4 Process
11860
1 1870 DISP TAB(25);"Select desired
11880 EXIT "IF Menu_pageS="PARAMETERS
1 1890 EXIT IF Menu_flag=1
1 1900 END LOOP
1 1910 ELSE ,
.,.
1 1930
Z$Z$&ZS
11940
1 1950 PRINT TABXY! 1 ,Z);ZS
11960 NEXT Z
1 1970 LOOP , ,
Z$="f1 Wafer -
type
1 1980
191
11990 PRINT TABXY(S.5>;ZS|Wafer type*
12000 i5r"t^,~
12030 (A)
PRINT TABXY!5.7),Z*;Vdpw1 current,'
12050 (A)
PRINT TABXYt 5 >;ZS; Vdpw2 current ,8
12060 ;
LW30_100 forcing"current (A)
12070 PRINT TABXYt 5,9); ZS;Lw30 100 curr;'
12090 (A)
,
12120 ;
12130
12140 BXY(61.Z+6);"Vcomp=10V (fixed)'
NEXT Z
12158 !AB(25);"Select desired softkey"
12160 rvr?1^
EXIT IF Menu_pageS-"MAIN"
12550 RETURN
125B0
12570
12580 t3t3I3t]t]t]l]t3[]t 3l3t3t3t3t 3t3t3t3tU3tK][]t3t3t ]t][]t]I3t3t 3t3t3
12590
12B08
12610 Param_type: ! Choose type of data to wafer map
Param_type*="NUM" ZS="NUM-fSTD"
12620 IF THEN
Param_typeS="NUM+STD" ZS="STD"
12630 IF THEN
Param_typeS="STD" ZS="NUM"
12648 IF THEN
12650 Param typeS=ZS
126E0 RETURR
12E70
12680
12690 t It 31 31 3 t 31 3t It 3t )t 3t 3t 3t U 3t 3t 3t 3t 3t 3t 3t 3t 3t 3t 3t 3t3t 3t 3t 3t 31 3t 3t 3t 3
12700
12710
12720 Parameters: ! Parameter assignments/labels
(Ang)"
(MV/cm)"
>"
12760 ParameterS(4)="FCAP1_600 CAP1 < MV/cm
(MV/cm)"
192
12790 Farame terS! 7>- "SHEETRH02 UDPU2 (Ohms/sq)
12800 Parame terS! B>- "LW15_1000 LW15_1000 (uM)"
12810 Parame terS! 9(- "LW30 100 LW30 100 tuM>"
12820 Parame terS! 20) "COMB'S COMB"5/COMBI0 <S,0,R)"
12830 Parame terS! 21 ) ""COMB10 COMB5/COMB10 (S.O.R)"
12840 Parame terS! 22) "COMB 15 C0MBI5/SERP5 <S,0,R>"
12850 Parame terS! 23) ""SERP5 C0MB15/SERP5 (S.OjR)"
128E0 Parame terS! 24) "SERP10 SFRP10/SERP15 (S.O.R)"
-
13040 RETURN
13O50
130E0
13070 t][3t]t3I3[3t3t3t3IU3t3t3t]I3t]t]t]tK]I][3[3[3I3[3[3t3t3tU3t3I3[3
13080
13090
13100 Pretestl : I I Check for sub shorts
13110 Resistance-0
13120 Curr=1 .00E-7
! Force 100nA
13130 IF Process-3 THEN Curr Curr
13140 Rmin-2.0E+7 ! Resistance limit
13150 GOSUB Reset_equlp
"340"
13160 OUTPUT Matrix; "320 ; "330"; "310"; ! Connect PINS 1-4 to SMUl
13170 OUTPUT Mstn*;"301 I Connect substrate to SMU2
13180 OUTPUT Hp4145;"DIl 5 ;CurrType;
"
! SMU1=100nA, Vcomp=5V
13198 OUTPUT Hp4145; "DV2 1 ! SMU3=0V , Icomp-100mA
13288 WAIT .05
"
13210 CALL Meas! "TV! ,Z1 ,3)
1 Measure voltage on SMUl
13228 R=ABS(Z1/Curr)
13238 IF RRmin THEN Resistance=1 I Fail if R<Rmin
13248 RETURN
13258
132GB
13278 t 3t 3t 31 3t 3t 3131 3t 3t 3t 3t 3t 3t 3t 3t 3t 3t 31 3t 3I3t 3t 3t 3t 3t 3t 3t 3t 3t 3I3t 3t 3t 3
13288
1323B
13388 Pretest2: ! Check for opens on all pads
13310 Resistance=0
13320 Resistancel -0
13338 Resistance2=0
13348 Rma*=2.0E+7
13350 Curr=I .00E-7
13470 Delta_v-1-ABS(Z)
13480 R-ABS(Delta v/Curr)
13490 IF R>Rmax OR ABS!Z)>5.9 THEN Resistancel-1 ! Open contact if R>20Mo
"000"
193
13590 RETURN
13600
13610
13620
13630 tK3t3t]t3t3t3[][3[]t3[]t3[][][3I]t3t][][3[3I3I3t3t3t3t3t3t][]t][]t3
13G40
13650 Pj^St.stats:! Print statistics
13660 DISP Printing statistics "
D.D.4X.3D D
13980
13990 PRINT
1403B Test time=PR0UND(Test_time,-2 )
14010 Time_per die-PROUND! Tes t_t lme /Number of
"
14020 PRINT "Test t ime ;Test_t ime ; "Sec
"Sec"
14030 PRINT "Test time per die ;Time_per_die;
14040 PRINT
14858 PRINT Wafer type - ";Wafer typeS
Capacitance Range - T;Cap_range ;
"pF"
140G0 PRINT
" "A"
14070 PRINT VDPW1 forcing current - ; Vdpwl_current ;
" "A"
194
14370 IF Parameter>-2 AND
14380
Parameter<-15 THEN
0R parameter> = 12 THEN
14390
"i 111 Plai breakdown is <2MV/cm"
14400 YS t-
Y$(2
YS(.)-) -"Cod*
Cod* -2
"Code .. i
-.
Exceeds measurement
txteeas (100V)'
14410 YS(3) "Code Bad data capability (10
capability
14420 Field breakdown) 10MV/cm
-
END IF
14430 END IF
14440 I
14450 IF Parameter-E OR Parameter-7
THEN
144E0 Y*( 1 ) "Code -1 Short to substrate (Rs'20Mohms >"
14540 vs S l!-rS2!
I-rSn6 ~ "I 2PSn ""tact
substrate
<R>20Mohms>"
14550 vi 4
YS!4) "5S "I
Code -40 --> Exceeds meas capability dmv) or compliance met
14560 Y*(5)-"Code -50 --> Invalid
14570 END IF
measurement (Value not
possible)"
14580 I
1459B IF Perameter-1 1 THEN
14600 YSd )-"Code -1 > Tox from CAP1 or CAP2 bad"
14610 END IF
14E20 I
I4E30 IF Parameter>-1E AND Parameter<-1 9 THEN
14640
~\ ""? S.nort to substrate (R<20Mohms
>"
1465B
~l "I P-pen ""tact
'.r2e <R)20Mohms>"
14EE8 v5 5 R>I00kohms"
14E78 TF P.r.S??".
IF na5 capability (lmV) or
Parameter-7 THEN Y*(3)="Code -3 --> Threshold )
.'tVtuc^SS6^ 10V"
14758 END IF
147GB
14778 Z-Parameter
14788 PRINT Under_onS;ZS; Under off*
14798 Flao3=0
14808 IF ?)=2 AND Z<-4 THEN Flag3=1
14810 IF Z6 THEN Flag3-1
14828 IF Z=8 THEN Fleg3=1
14838 IF Z>-12 AND ZC-14 THEN Flag3=1
14848 IF Z>=20 AND Z<=30 THEN Fleg3=1
14850 IF Flag3=0 THEN
148E0 FOR 1=1 TO 5
><)""
14870 IF YS< I THEN
14880 PRINT TAB(5);Y$(I)
14898 END IF
14980 NEXT I
14910 PRINT
14920 END IF
14930 NEXT Parameter
14940 PRINT Normal spacing*
14950 PRINT Ff*
14960 PRINTER IS 1
14970 RETURN
14980
14990
15000 t 3t 3t 3t ][ 31 3 1 31 31 3 1 3t 3t 3t 3t 3[ 3[ 31] I 31 3 1 UU 3t 3t 3t 31 3t 3t U It K K 3t 3t 3
15010
15020 I
15030 Pnnter_setups : ! Define various primting features
Normal*=CHRS!27)t."&k0S"
15040 Print in normal mode
ExpandedS=CHRS!27)&"&k1S"
15058 Print In expanded mode
)&"&k2S"
15060 Compressed*=CHRS< 27 Print in compressed mode
)&"&dD"
195
15150
15160
PRINTER0lSfl1$iUnder-0ff$&Nor"al-Spaclno$il
Reset prlnte
15170 l
15180 i
ZS="
15190 < CAP1
1520B UDPWt
ZS-ZS&"UDPW2 LW30 100 LW15 1000
15210
-COMB
>
ZS=ZS&"< SERP
>"&C"rlfS
15220 Headerl*=ZS
15230 ZS-"CHIP Tox1 200 400 600 800 Rhosl
15240 "=2J&"Rhos2 Delta linewidth 5 10 15
15250 ZS=Z*&"10 15"iCrlf*
152G0 Header2S=Z*
15270 Z*="XX:YY (ANG) < (Mv/cm2)
15280 ZS=ZS&"(Ohms/square ) (uM) (uM)
15290 ZS=Z*8."(0pen, Short or Resistive) "&CrlfS
15300 Header3*=ZS
15310
ZS="
15320 CAP2 ->"&CrlfS
15330 Header4*-Z*
15340 ZS="CHIP Tox2 200 400 600 800 Tox1-Tox2 "&CrlfS
15350 Header5S=Z*
15360 ZS="XX:YY (ANG) (Mv/cm2) (ANG) "SCrlfS
15370 Header6*=ZS
15380
ZS="
15390 -CONTI
-
<
C0NT2 > CONTRES/DIODE (10uMx1
0uM)"f,CrlfS
15400 Header7S-ZS
15410 Z$="CHIP 3uM 5uM 7uM 10uM 12uM 1 5uM Re Fdr Uth
Vbr"lCrlfS
15420 Header8S-ZS
15430 Z$="XX:YY (Open, Short or Resistive) Ohms kOhms (V)
(U) "SCrlfS
15440 Header9$=ZS
15450 I
15460 I
15470 RETURN
15480 I
1549B i
15500 !!][][ 3t 3t 3t 3t 31 3t 31 3t3t 3t 31 ][][1M[][ UKKKKK 31 3f 3t3t 3t3t 3131313
15510
15520 I
15530 Printout: ! Data output printout
"
15540 DISP "Printing data
15550 PRINTER IS 701 I Output is printer
155EB GOSUB Title I Print title page
15570 IF Process-1 THEN PRINT ExpandedS&"PAGE 1 OF 2"
3"
15580 IF ProcessOl THEN PRINT ExpandedSS "PAGE 1 OF
15590 PRINT Normal*
15E00
15610 PRINT USING SeolS;CompressedS&Header1S I Print 1st header
15E20 PRINT USING SeolS;Header2$ I Print 2nd header
15630 PRINT USING SeolS;Under on*&Header3S8,Under_of f* ! Print 3rd header
15B40
15E50 FOR Chip=l TO Number of die
ZS=",9A,SD,2X,2D72D,2X,2D.2D,2X,2D.2D,2X,2D.2D,"
15660
15E70 ZS=ZS&"2X ,A ,2X .5D.2D ,2X .5D.2D ,2X ,A ,2X
15698 ZS=ZS&"AJ4X,A.4X,A,3X
AS=UALS(Diex<Chip>>&" "&VALS(Diey(Chip))f," "
! Printing format
15700 1
15710 A=Toxl(Chip)
15720 B-Fcapl_200!Chip)
15730 C=Fcapl_40B(Chip)
15740 D=Fcapl 600(Chip)
15750 E=FcapC80B(Chip )
1576B F=Sheet_rhol (Chip)
15770 G=Sheet_rho2(Chip )
15788 H-Lw30_10B(Chip )
15790 I-Lw15_1000!Chlp)
15800 J*=Comb5S< Chip )
15810 KS=Comb10S(Chip )
15820 LS=Comb15S(Chip >
15830 MS=Serp5*(Chip)
15840 NS=Serp10S(Chip)
15850 0S=Serp15S(Chip)
A.B.C.D.E,"!" " "
"I"
,Crlf*
15890
15908 IF Process=2 THEN
196
15910 GOSUB Title
3"
15920 PRINT Expanded*". "PAGE 2 OF
15930 PRINT Normal*
15940
15950 PRINT USING SeolSiCompressedS&Header4S I Print first header
15960 feol$.Header5S
15970 EEtKt
PRINT HUMS
USING SeolS;Under_on$&HeaderES&Under_offS
I Print second header
! Print 3rd header
15990
15990 FOR Chip=1 TO Number_of die
16000 !;S=."!-9Aa5D'2x.:d-zdT2><.2D.2D,2X,2D.2D,2X,2D.2D,2X,A,2X,5D,2X,A,2A"
A*-VAL*(Diex(Chip))&":"&VAL*(Diey<ChipS)&"
16010 I
"
16020 A=To*2(Chip)
16038 B=Fcap2 200(Chip )
16040 C-Fcap2 400(Chip >
16058 D-Fcap2_600(Chip )
16068 E-Fcap2_800(Chip )
16878 F-Delta_tox(Chip )
Z*;AS,A,B,C,D,E."1"
16B8B PRINT USING .CrlfS
16660 i
16670
I Reset test equipment
16680 Reset test : "t,K"i"H"
197
16710 GOSUB Reset equip
16720 OUTPUT 2;ClearS; ! Clear screen
16730 RETURN
16740 I
16750 l
16760 jnnnnnnnnnnMMnnnt innn i uuuuun] nnnnnnnt i
16770
16780 i
16790 Run: ! Select run number (from Main_menu)
16800 CONTROL 1 .10; 1
16810 DISP "Enter run number (max characters-7
)"
;
16820 INPUT Run*
16830 IF LEN(RunS)>7 THEN Run
16840 WHILE LEN(Run$X7
Run$-RunS&" "
16850
16860 END WHILE
16870 CONTROL 1 .1010
16880 RETURN
16890 !
16900 i
16910 it 3t 3t 3t3t 3t 3t3t 3 13t U 3t 3t 3t 3t 3t 3t U 3f] tit UU U U U3t3t 3t 3t 3tU ][][ 3
16920 I
16930 i
16940 Select param: ! Select parameter for wafer mapping or histogramming
16958 Flag=B
16960 CONTROL 1 1 ,101
17130
17140 GOTO Serp_comb
Comb15_serpS: '
17150 Test*-"C0MB15/SERP5"
17160
17170 GOTO Serp_comb
17180 SerpIO serp15: !
Test*-"SERP10/SERP15"
1-'
33
17200 Serp_comb: ! Serpentine/Comb test algorithm
17240 Ttype=1
Ttype 1
17250 IF Process-3 THEN " "
1732B IF
THEN Combl5S( Chip )-Serp_combS
Test*-"C0MB15/SERP5"
17330 IF
THEN Serp 10S( Chip )-Serp_combS
Test*="SERP10/SERP15"
1734B IF
17350 I
"340" T30E"
"000"
17380 IF
THEN Serp5S( Chip )-Serp_combS
Test*-"C0MB15/SERP5"
17390 IF
THEN Serp15S( Chip >-Serp_combS
Test*-"SERP10/SERP15"
17400 IF
17410 I
17420 RETURN
17438 !
17440 lt3t3t3t3[3I3I3I3tUU]t3I3t3t3IU3t3t3I3tU3I3[3tU3t3I3t3t3t3t3
17450
17460
17470
test: Serp/Comb measurment
17480 Serp comb
17490 WAIT .05
"TI3"
198
17510 .-- -.
jge+1 .E-151)
17540 RETURN
17550 END IF
17560 OUTPUT Hp414Si"DV2. ,";TypeTtypei.1
"
100E-3"
,
17570 WAIT .05
17970 RETURN
17980
17990
18000 t 3t 3t 3t 3t 3t 31 3t 3t 3t 3t 3t 31 3t 3t 31 3t 3t 3t ]IU 3t 3t 3t It It It U ]tlt 3I3I3I 313
18010
18820
16030 Store_data: ! Store data on floppy disk currently in memory
load*="ST0RE"
18040 Store_or
18050 CONTROL T,10;1
18060 DISP "Store data routine Enter (Y/N) to continue"!
18870 INPUT ZS
18080 CONTROL 1 ,1010
ZSO"Y"
18090 IF THEN RETURN
18100 IF LEN(Run*X)7 THEN GOSUB Run
181 10 IF LEN! Wafer* )<>2 THEN GOSUB Wafer
18120 DISP "Storing data on disk.
18130 ON ERROR 60T0 Disk_error
18140 l
File$=Run*&"
18150 "&WaferS
leS&" "
leS&"
50
,
"
SPath 1 TO Fi , 1
18170 ASSIGN : ,700
18260 .END IF
18270
0UTPUT56Path 1 ;Contres( > ) * ) > ) ContSK )
18280 ,Vth< ,Fdr( ,Vbr( ,Cont3$(
),Contl2K* ).Contl5S( )
18290 OUTPUT SPathJj iCont7S(* ),Cont10*(*
18300 END IF
199
18310
18320 nnTPNT
Ia4t;-!!Tst^tl,,'e'Us1fer4):p?LTYPe,Cap_r6noe,Vdp^l_current
RHtdHt Pstt|_ tVdpw2 current ,Lw30_100_curr,Lwl5_100B
-
curr ..Contres _
curr
18330 OUTPUT SPath liDefect
_
~ density
16340 ASSIGN 6Path~1 TO *
18350 I
18360 Store error: I
18370 off Error
183B0 RETURN
18398
18400
184 IB tint uuuuuuuuinnnnnnruuuuuuuuuuuuinnnn
18420
18430
1B440 Test wafer: Test structure program flow
18450
18460 IF Test-1 THEN GOSUB Cap1
18470 IF Test-2 THEN GOSUB Vdpwl
~
200
191 10 IF Parameter-;3 THEN MAT Value* SerpSS
19120 IF Parameter-24 THEN MAT ValueS Serp 10$
19130 IF Parameter-25 THEN MAT ValueS SerpISS
19140 IF Process-3 THEN
19150 IF Parameter-26 THEN MAT ValueS- Cont3S
19160 IF Perameter-27 THEN MAT ValueS- ContSS
19170 IF Parameter=28 THEN MAT ValueS- Cont7S
19180 IF Parameter-29 THEN MAT Value*- ContlOS
19190 IF Parameter-30 THEN MAT ValueS- Cont12$
19200 IF Paremeter-31 THEN MAT Value*- ContlSS
19210 END IF
19220 RETURN
19230 l
19248 I
19258 [t U3t U UUUU UUU U3t3t U]t3I3[U3t3[][3I3[][3t][3t3t 31 3I3[3Nt3
I92E0
1 9278 i
1928B Type: I Select wafer type (from main_menu)
19298 IF Wafer ty THEN
Wafer_type$-"P"
19300
19310 Type 1
1932B ELSE
Wafer_typeS="N"
1933B
19340 Type=1
19350 END IF
I93G0 RETURN
19378
193B0
1939B t 3t 3t ]t U ][][][ U][ ]I3t 3t 3t 3t 3t 3t 3t 3t 3t 3t 3t 3t 3t 3t 3[ 3t 3t 3t 3t 3t ][][ U]
19400
19410
19420 Userl: ! Select softkeys 1-8
19430 OUTPUT 2;SystemS;UserS;
Menu_pageS="MAIN"
19440
19450 RETURN
1946B
19470
1948B [ It 31 U ][ ][ U ][ ][][ 31 3t Jt 31 3t 3t 31 3t 3t 3t 3I3I3I 3t 3t 31 3t 3t U3t 31 31 3t U ]
19498
1 9500
19510 User2: ! Select softkeys 9-1E
19520 OUTPUT 2;SystemS;UserS;User1S;
"
19530 Menu_page$= "PARAMETERS
19540 RETURN
19550
19568
19578 int u uu u 3t u uu u 3t uu uu u u u u u u u u u u 3t uu ir u mm ]
19588 !
19598 i
19608 Vdpwl: !
"
19610 TestS="VDPU1
19E20 Current =Vdpwl_current
19E3B GOTO Vdpw
19E40 Vdpw2: i
Test*="VDPW2"
19E5B
19EEB Current=Vdpw2 current
19S70 Vdpw: i van der Pauw test algorithm
19E80 IF Process-3 THEN Current- -Current
19E90 GOSUB Display_status
19700 GOSUB Pretest I .
-,,.,- .,.,
.
19720 IF
THEN Sheet_rho2( Chip ) 1
TestS="VDPW2"
19730 IF
19740 RETURN
19750 END IF
19760 GOSUB Pretest2
19770 IF Resistance-1 THEN
THEN Sheet_rho1 ( Chip > 2
"
19780 IF TestS="VDPW1
THEN Sheet_rho2( Chip ) 2
TestS="VDPW2"
19790 IF
19B00 RETURN
19810 END IF
19820
19830 GOSUB Reset equip "347"
" "
,10Ucomp
201
19910 OUTPUT Hp4145;"DS1 i US1-0V
b "
19920 WAIT .05
"TV3"
19930 CALL Measf 5)
.Voltagei
"TV4"
19940 CALL Meas! 5)
,Voltage2
"
19950 CALL Meas! "TV1 .Vcomp .3)
199E0
19970 Delta_v-ABS(Voltage2-Voltaoel )
19980 R-ABS(Delta v/Current )
19990 Z-PR0UND(4.5"*R
"
-2)
Tests-"
28888 IF VDPWf "'"THEN Sheet_rho1 ( Chip >-Z
TestS-"VDPW2"
20010 IF lestS-"VDPWZ"
20140 ZS-"Enter forcing current (in Amps) for VDPW1 test structure"
ZS&"
20150 DISP (me*-l00mA,min=10nA)";
201EB INPUT Vdpw!_current
20170 IF Vdpwl current<! OR Vdpwl current). 1 THEN Vdpwl current
.0E-8
20440 RETURN
20450
20460
t3I3I3t3t3I3[3I3I3[3t3I3t3[3t3t3t3t3I3[3[3t3[3t3I3tU]t][]t3t3t3t3t3
20470
20480
20490
20500 Zero_varlables: I Intialize parameters
20510 MAT Fcap1_200= (0)
Fcap1_400- (0)
20520 MAT
20530 MAT Fcap1_600- (0)
- -"-
202
"
20710 MAT Serp5S- (
"
20720 MAT Cont3S- (
"
20730 MAT ContSS- (
20740 MAT Cont7- (
20750 MAT ContlOS- (
20760 MAT Cont12S- (
20770 MAT ContlSS- (
20780 MAT Contres- (0)
20790 MAT Fdr- (0)
20800 MAT Vbr- (0)
20810 MAT Vth- (0)
20820 MAT N- (0)
20830 MAT Avg- (0)
20840 MAT Std- (0)
2085B MAT Error- (0)
208EB RETURN
20870 I
20880 I
20890 END
209B0 I
20910 l
20920 SUB Meest Channel* ,Avg_value .Number ) measure channel and average
20930 Hp414E=717
20940 Value-0
20950 FOR 1-1 TO Number
20960 OUTPUT Hp4145;ChannelS
20970 ENTER Hp4145;Z
20980 Value-Value+Z
20990 NEXT I
21000 Avg value-Value/Number
21010 SUBEND
203