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Kee-Bong Choi and Doo-Hyeong Kim
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REVIEW OF SCIENTIFIC INSTRUMENTS 77, 065106 2006
I. INTRODUCTION acteristics of one axis are different from those of the other
axis, and positional errors produced from each axis are accu-
Ultraprecision stages with nanometer resolution and sev- mulated in the final axis. Therefore, the parallel linear com-
eral micrometers traveling range are utilized in coarse-fine pliant mechanism is preferred over the serial mechanism as it
positioning systems, ultraprecision machining centers, wafer overcomes the disadvantages of the latter.
stages, and as scanners for atomic force microscopes. The In the design of a parallel linear compliant mechanism
typical ultraprecision stage consists of a compliant mecha- for two linear motions based on flexures, it is important that
nism with flexures for a motion guide, piezoelectric elements the resonance frequency of the rotational mode be greater
for actuation, and ultraprecision sensors for displacement than twice that of the translational mode in order to reduce
measurement. Since the motion accuracy of the ultrapreci- rotational parasitic motion. In addition, the flexure should be
sion stage depends on a compliant mechanism, considerable deflected by the bending moment rather than by the axial
interest has focused on the structure of the compliant mecha- force, because the deformation due to the axial force is
nism. smaller than that due to the bending moment when the same
A flexure is an elastic joint, which connects rigid bodies force is applied to the end of the flexure. Conventionally, a
or links, for small displacement. The flexure is a relatively two axes parallel linear compliant mechanism uses quad-
slender part as compared to the other parts in a body. The symmetric crab-leg flexures or quad-symmetric compound
slender part can be monolithically manufactured by machin- flexures. The former have been implemented in piezoelectric
ing techniques, such as wire electric discharge machining, jig element-driven stages3 and an electromagnetic stage,4
boring, and etching. Compliant mechanisms, consisting of whereas the latter have been implemented in microelectro-
rigid bodies and flexures, play important roles in nanoposi- mechanical system MEMS structures.510 Compared to the
tioning, nanomachining, and nanomeasuring mechanisms. former mechanism, the latter can reduce the rotational para-
Their utility in this regard can be largely attributed to the sitic error. However, the latter mechanism has the disadvan-
characteristics of the flexures, including a linear force- tage of limited displacement since some flexures in the
displacement relation and friction-free, fine, continuous mechanism require tensile extension.
motion.1 In this study, a parallel linear compliant mechanism is
The conventional flexure-based linear compliant mecha- presented for two axes ultraprecision linear motion. The
nism for two axes ultraprecision motions can be classified compliant mechanism consists of quad-symmetric simple
into serial and parallel types. In the serial linear compliant parallel linear springs and quad-symmetric double compound
mechanism,2 one axis linear flexure mechanism is attached to linear springs. While the simple parallel linear springs guide
another axis linear compliant mechanism. This type of com- the linear motion of a moving plate, the double compound
pliant mechanism has the disadvantages that dynamic char- linear springs follow the motion of the simple parallel linear
spring as well as compensate for the parasitic motions caused
a
Electronic mail: kbchoi@kimm.re.kr by the simple parallel linear springs. The linear springs are
nh
Kij = DijkHijkKijkDTjik , 11
k=1
1 0 0
Dijk = 0 1 0 , 12
dyijk dxijk 1
1 0 0
Hijk = 0 1 0 . 13
hyijk hxijk 1
FIG. 3. Two rigid bodies connected by a flexure.
In addition, the stiffness matrix expressed by the reference
coordinate O-XY is
hijk = hxijk hyijkT . 3
Assuming that the mass of the flexure is ignored, the Kijk = RijkKoijkRTijk . 14
equation of motion of the rigid bodies expressed in a matrix where Koijk is the 3 3 stiffness matrix of a flexure, which is
form is expressed by the flexure coordinate oijk-xijky ijk. The stiffness
matrix is expressed by the inverse of a compliance matrix.
Mq + Kq = Q, 4 When the dimensions of a prismatic beam are a and b with
respect to the x and y axes, and the depth is c, the compli-
where the equivalent mass matrix M is
ance matrix Co is given by12
M1 0 0
a
0 M2 0 0 0
M = , 5 Ebc
] ] ]
4a3 6a2
0 0 M nb Co = 0 , 15
Eb3c Eb3c
the equivalent stiffness matrix K is 6a2 12a
0
Eb3c Eb3c
K11 K12 K1nb
where E is the elastic modulus of the material. In addition, in
K21 K22 K2n Eq. 14, Rijk is a 3 3 transform matrix rotated by from
K = b , 6 the world coordinate O-XY to the flexure coordinate oijk-
] ]
xijky ijk as follows:
Knb1 Knb1 Knbnb
cos sin 0
the displacement vector q is Rijk = sin cos 0 . 16
q = q1 q2 qnb , T
7 0 0 1
As shown in Fig. 4, the parallel linear compliant mecha-
and the force vector Q is nism is augmented to amplify the displacement such that it
Q = Q1 Q 2 Q nb T . 8 has 16 rigid bodies and 44 flexures. The rigid body 0 is a
fixed frame and the other rigid bodies from 1 to 15 are mov-
In Eq. 5, the element of the equivalent mass matrix is ing bodies. Bodies 1 and 2 are for a displacement-
amplification mechanism. Since the size of the element ma-
Mi =
mi 0
0 Jz
, 9
trices in the equivalent mass matrix and the equivalent
stiffness matrix of Eqs. 911 is 3 3 and the number of
moving bodies is 15, the size of the equivalent mass matrix
where mi is a 2 2 mass matrix of the ith rigid body and Jzi and the equivalent stiffness matrix of Eqs. 5 and 6 is 45
is the z-directional mass inertia moment of the ith rigid body. 45.
In Eq. 6, the elements of the equivalent stiffness matrix The characteristic equation of Eq. 4 is
are11
I M1K = 0, 17
nb nh
Kii =
k=1
DijkK jikDTijk , 10 where is the characteristic root and I is an identity matrix.
Resonance frequencies can be obtained by solving Eq. 17
j=0
ji as follows:
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065106-4 K.-B. Choi and D.-H. Kim Rev. Sci. Instrum. 77, 065106 2006
f 0 f f T f 0 + f , 20
fR cf fT, 21
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065106-5 Parallel linear compliant mechanism Rev. Sci. Instrum. 77, 065106 2006
quencies are 186 Hz for the translational mode and 432 Hz sitioning systems such as the fine positioning tables in
for the rotational mode. In the translational mode, the experi- coarse-fine positioning systems, ultraprecision machining
mental result is very close to the FEM analysis result, centers, wafer stages, and atomic force microscope AFM
whereas in the rotational mode, the experimental result scanners.
shows an error of 17% relative to the FEM analysis result.
1
The error here is thought to be attributable to the machining S. T. Smith, Flexures-Elements of Elastic Mechanisms Gordon and
Breach, New York, 2000.
error in the inner plates of the double compound linear 2
D. Kim, D. Kang, J. Shim, I. Song, and D. Gweon, Rev. Sci. Instrum. 76,
springs. 073706 2005.
3
The working range of the stage was measured by apply- MicroPositioning, NanoPositioning, NanoAutomation, PI catalog, 2001.
4
K.-S. Chen, D. L. Trumper, and S. T. Smith, Precis. Eng. 26, 355 2002.
ing voltage to the piezoelectric elements. When the input 5
S. W. Schlosser, J. L. Griffin, D. F. Nagle, and G. R. Ganger, Carnegie
voltage sweeps between 30 and 150 V, the output displace- Mellon University Technical Report No. CMU-CS-99-174, 1999, http://
ment of the moving plate shows hysteresis behavior with a www.pdl.cmu.edu/PDL-FTP/Storage/CMU-CS-99-174_abs.html.
6
working range of about 90 m in the x and y axes, as shown J. F. Alfaro and G. K. Fedder, in Technical Proceedings of the 2002
International Conference on Modeling and Simulation of Microsystems,
in Fig. 10. For positioning of the stage, the hysteresis behav- MSM 02, San Juan, Puerto Rico, April 2225, 2002, pp. 202205.
ior can be compensated by a proportional and integral PI 7
J.-J. Choi, H. Park, K. Y. Kim, and J. U. Jeon, J. Semicond. Tech. Sci. 1,
controller. 84 2001.
8
Stepwise responses of the stage were measured using the J. Brugger, Ph.D. dissertation, University of Neuchatel, 2000.
9
K.-C. Lee and S. S. Lee, Proceedings of Micro Electro Mechanical Sys-
capacitance sensors, while the stage was controlled by the PI tems MEMS 03, Kyoto, Japan, Jan. 1923, 2003, pp. 558561.
controller. In the stepwise responses, as shown in Fig. 11, a 10
N. Takeshima, K. J. Gabriel, M. Ozaki, J. Takahashi, H. Horiguchi, and H.
resolution of 3 nm was attained in the x and y axes. Fujita, International Conference on Solid-State Sensors and Actuators, San
Francisco, CA, 1991, pp. 6366.
The above experimental results indicate that the stage 11
K.-B. Choi, J. Mech. Eng. Sci. 219, 225 2005.
implemented by the proposed parallel linear compliant 12
Y. Koseki, T. Tanikawa, N. Koyachi, and T. Arai, Adv. Rob. 16, 251
mechanism will be applicable to two axes ultraprecision po- 2001.
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