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4 Drain
\1I II
-*
Gate
"- n'
d Source
(a)
Fig. 1 . Parasitic
IGBTs.
elements in
A Source
(b)
(a) MOSFETs and (b)
t- n+
turn-off t h e r e i s a r i s k of t u r n i n g o n t h e NPN-
' y p ~of
t r a n s i s t o r which t h e n may l a t c h t o g e t h e r w i t h t h e P N P .
The s o l u t i o n t o make l a t c h - f r e e IGB'I's i s t h e same
a s C O make r u g g e d MOSFETs, namely l o w R b r . T h i s i s why
b o t h t h e s e p r o b l e m s seem t o be s o l v e d a t t h e same
time.
I n t h i s p a p e r we show t e s t s on d i f f e r e n t I G B T s ,
where t h e h i g h - c u r r e n t , high-voltage a r e a is found.
The s h o r t - c i r c u i t e n d u r a n c e t i m e i s a l s o f o u n d .
The p r e l i m i n a r y t e s t s g a v e a s u r v e y of d i f f e r e n t
I G B T s ~a b i l i t y t o w i t h s t a n d s h o r t - c i r c u i t s t r e s s u s i n g
a simple s e t u p . The t r a n s i s t o r s w i t h p r o m i s i n g
q u a l i t i e s would b e f u r t h e r i n v e s t i g a t e d , while those
w i t h p o o r s h o r t - c i r c u i t r u g g e d n e s s w e r e e x c l u d e d . The
s i m p l i f i e d t e s t c i r c u i t i s shown in f i g . 4 .
o v L l u r ~ n gt h e t e T t , )unction t e m p e r a t u r e T J = 2 5 * ?
Fig. 4. T e s t c i r c u i t . Charged c a p a c i t o r a s v o l t a g e be f o I e t ti e s hor t - c I I c I 1 t c oiid i t i oil oc c II r s
source during short-circuiting. !I tlme 111 s h o r t - c i r c u i t bpforp latrhing
TlmeS includiiig " ) " denote 110 latchlllq
1 ) C i r c u i t Descr i o t i o n : A v a r i a b l e d c v o l t a g e V B so f a r
616
Table 2 shows the short-circuit capability of the TABLE 2
various transistors used in the test. It can be seen T E S T RESULTS. LOW IMPEDANCE VOLTAGE S O U R C E .
that the short-circuit capability is dependent on the
applied gate voltage, which controls the current level
in the active region. This dependence is further
visualized in fig. 6, where the high current, high
voltage area as a function of gate voltage is plotted
for Toshiba-s MGlOONZYSl. This 100 A module has a high
current level of 900 A at V G s = 15 V. During the tests
we obtained similar plots of all the tested tran-
sistors.
In the next chapter (IIIB), the consequences of
reducing the gate voltage, is discussed. Some IGBTs
are short-circuit proof only at reduced gate voltages.
These are fully acceptable components provided that
they satisfy the requirements of chapter IIIB. It will
also appear that the effects of such a reduction often
are' so small that a transistor which is short-circuit
proof at V G s = 15 V, may be driven at lower voltages. [XGH25NBOA Iopeak[A] 7 8 100 209
This will always increase the short-circuit
capab il i ty . [XYS tl [ P S I >10 >10 >In 20d
400 500 1 5 0 1
CXGH20NSOA IDpeakIA] 25 48 97
IXYS tl I P S 1 10 30d
V,,=l5V 400 500 ( 5 0 )
IXGH30N50 1 ~ ~ ~ ~ l ; I A 1l2 5
V,,=l2V
V=
,l ov
I - latch-up
impact a reduced gate voltage has on the forward
test voltage drop.
__-
a
Fig. 8. Non-latching ( a ) and latching ( b ) conditlon of an MGlOON2YSl
a b
Fig. 9. Non-latching ( a ) and latching ( b ) condition of an IXGH25N100A.
A. Forward V o l t a a e Droe
a
C
I 1 I I ) Oo/
2 4 6 8
'DS v) 'DS M
618
I n t h e previous chapter, s h o r t - c i r c u i t endurance IXGH30N50 VGS = 1ov
was shown t o b e e n h a n c e d by r e d u c i n g t h e g a t e v o l t a g e . IXGH25N100A VGs = 8V
The i n f l u e n c e s on f o r w a r d v o l t a g e d r o p c a u s e d by V G s IXGH25N80A none
i s shown i n f i g . 1 0 . A s c a n b e s e e n , a t low g a t e
v o l t a g e s t h e IGBT m i g h t e n t e r t h e a c t i v e a r e a a t I D With a f a s t e r s h o r t - c i r c u i t d e t e c t i o n , I X G H Z S N l ( ! O A
b e l o w two times r a t e d I o . I n m o s t a p p l i c a t i o n s t h i s may b e d r i v e n a t V G s = 10V. The IXGH25N80A i s
must be a v o i d e d . balancing b e t w e e n r e c o m m e n d a t i o n a n d r e j e c t i o n by t h e
a u t h o r s . However, d u e t o a p o s s i b l e s p r e a d b e t w e e n
E. Forward Voltaqe DroD Ve r s u s S h o r t - c i r c u i t CaDa- different s a m p l e s of t h e same IGBT r e g a r d i n g t h e h l g h
bilitv current level a t a specific voltage, t h i s d e v i c e 1s
n o t recommended w i t h o u t f u r t h e r i n v e s t i g a t i o n s .
At a swithcing frequency of 20kHz t h e s w i t c h i n g When e v a l u a t i n g t h e s e r e s u l t s , t h e - l i m i t e d number
l o s s e s o f t h e c u r r e n t f a s t e s t IGBTs a r e approximately o f e a c h IGBT i n v e s t i g a t e d must b e t a k e n i n t o a c c o u n t .
twice the conduction l o s s e s . Hence, a moderate The v a r i a t i o n i n h i g h c u r r e n t l e v e l b e t w e e n two
i n c r e a s e i n f o r w a r d v o l t a g e d r o p may b e a c c e p t e d . t r a n s i s t o r s o f t h e same t y p e , may b e c r i t i c a l i n some
When s h o r t - c i r c u i t p r o o f t r a n s i s t o r s a r e demanded, occasions, and t h i s t e s t c o m p r i s e t o o few samples f o r
t h e maximum a l l o w e d g a t e v o l t a g e s a r e f o u n d i n t a b l e a f i n a l c o n c l u t i o n on t h e s e f e a t u r e s . A more c o m p l e t e
2. Some a p p l i c a t i o n s r e q u i r e p e a k d r a i n c u r r e n t s o f test i s v e r y e x p e n s i v e t o c a r r y o u t . Hence u s e r s a r e
twice t h e rated continous currents. If t h e IXYS l i k e l y t o u s e t h e IGBTs o f m a n u f a c t u r e r s who p u b l i s h
t r a n s i s t o r s must be s h o r t - c i r c u i t proof without t h e information about t h e s h o r t - c i r c u i t c a p a b i l i t i e s
entering t h e a c t i v e region a t t h i s current l e v e l , the of t h e i r d e v i c e s .
a l l o w e d g a t e v o l t a g e s a r e (comparing t a b l e 2 and f i g .
IO):
____-_______________---------------
IV. CONCLUSIONS
REFERENCES
[ l ] "Application notes. IGBT. B i p o l a r - m o d e MOSFET". [3] F . Goodenough: " L a t c h - f r e e MOS IGT g a t e s 800 V a t
Toshiba D i s c r e t e Semiconductor Engineering Dept., 50 A " . E l e c t r o n i c D e s i a n . v o l . 34, no. 1 6 , pp.
1986. 45-48, J u l y 1986.
619