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37 MICROFABRICATION TECHNOLOGIES
Review Questions
37.1
Why is it reasonable to believe that microsystem products would be available at lower costs than
products of larger, more conventional size?
Answer: Because less material is used in microsystem products.
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Solutions for Fundamentals of Modern Manufacturing, 3/e (published by Wiley) MPGroover 2007
Microsystem technology includes which of the following (three best answers): (a) LIGA
technology, (b) microelectromechanical systems, (c) micromachines, (d) nanotechnology, (e)
precision engineering?
Answer: (a), (b), and (c).
37.2
37.3
The polymer used to make compact discs (CDs) and digital versatile discs (DVDs) is which one
of the following: (a) amino resin, (b) epoxy resin, (c) polyamides, (d) polycarbonate, (e)
polyethylene, or (f) polypropylene?
Answer: (d).
37.4
The most common work material used in microsystem technology is which one of the following:
(a) boron, (b) gold, (c) nickel, (d) potassium hydroxide, (e) silicon?
Answer: (e).
37.5
The aspect ratio in microsystem technology is best defined by which one of the following: (a)
degree of anisotropy in etched features, (b) height-to-width ratio of the fabricated features, (c)
height-to-width ratio of the MST device, (d) length-to-width ratio of the fabricated features, (e)
thickness-to-length ratio of the MST device?
Answer: (b).
37.6
Which of the following forms of radiation have wavelengths shorter than the wavelength of
ultraviolet light used in photolithography (two correct answers): (a) electron beam radiation, (b)
natural light, (c) X-ray radiation?
Answer: (a) and (c).
37.7
Bulk micromachining refers to a relatively deep wet etching process into a single-crystal silicon
substrate: (a) true or (b) false?
Answer: (a).
37.8
In the LIGA process, the letters LIGA stand for which one of the following: (a) let it go already,
(b) little grinding apparatus, (c) lithographic applications, (d) lithography, electrodeposition, and
plastic molding, (e) lithography, grinding, and alteration?
Answer: (d).
37.9
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Solutions for Fundamentals of Modern Manufacturing, 3/e (published by Wiley) MPGroover 2007
thus permitting a suitable etchant to remove the exposed regions much more rapidly. This is not
the same as photolithography, in which resists are used to determine the regions to be etched.
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students enrolled in courses for which the textbook has been adopted. Any other reproduction or translation of this work beyond that permitted
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