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p-n junction under forward bias

q (Vbi- VR)

q VR

q VF
=qV
qV
bi o qV

qVoq(V
- qV-V )
bi
F

V>0: the bias is called POSITIVE or Forward,


if the polarity is opposite to the built-in barrier.
Typical notation: VF. Forward bias REDUCES the potential barrier
V<0: the bias is called NEGATIVE or Reverse
if the polarity is the same as the built-in barrier.
Typical notation: VR. Reverse bias INCREASES the potential barrier

Electron injection

q (Vbi- VR)

q VR

q VF
=qV
qV
bi o qV

qVoq(V
- qV-V )
bi
F

V =0; The electron concentration on the p-side: n p = nn e

qVbi
kT

Also, n p = n p0 (equilibrium electron concentration on the p-side)


because the junction is in equilibrium

V >0; New barrier height = qVbi - qV.


n p = nn e

qVbi qV
kT

= n p0

qV
e kT

Hole injection
In the equilibrium

pn0 qVbi / kT
=e
p p0

(1)

Under forward bias VF, the barrier decreases by qVF:

pn
= e q(Vbi V ) / kT
p p0

(2)

Dividing (2) by (1):


pn
= e qV / kT
pn 0

(3)

pn = pn0 eqV / kT

The concentration of injected holes exponentially increases with the forward voltage
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Summary of carrier injection under forward bias

Injected electron and hole concentrations:


=qVo qV

n p = n p 0 eqV / kT

qVo - qV
-xp0

xn0

pn = pn0 eqV / kT

The change in the electron concentration in the p-region:

n p = n p n p0 = n p0 (eqV / kT 1)
The change in the hole concentration in the n-region:

pn = pn pn0 = pn0 (eqV / kT 1)


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Carrier injection and


forward current mechanism in p-n junction

=qV
qV
bi o

qV
q VF

qVo - qV

Forward bias is applied: VF>0.


As compared to equilibrium conditions, much more electrons can overcome the barrier.
Electrons are injected into the p-side.
Injected electrons recombine with holes.
To compensate the loss, more electrons and holes are pulled from the n- and p-contacts
correspondingly.
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Injected carrier spatial distribution (1)

=qVo qV

Note that the carrier injection


takes place OUTSIDE the spacecharge region of the p-n junction.

qVo - qV
-xp0

xn0

We assume that the space charge


region is thin so that hot carriers
quickly drift through the
depletion region due to high
initial velocity.
Outside the depletion region the
field is low. Therefore the
electron and hole transport can
only be due to diffusion.

Injected carrier spatial distribution (2)

The injected carriers diffuse into n- and p-portions of the junctions and
RECOMBINE along with DIFFUSION;
SpaceCharge
region

SpaceCharge
region

Injected carrier spatial distribution (3)


The steady-state distribution of the injected holes can be obtained from the
following balance equation:

p
={Income} {Outcome} = 0 , or
t

pn pn0
2 pn

+ Dp
=0
2
p
x
The solution is:

pn ( x ) = pn (0) e

x / Lp

where

Lp = p D p
is the diffusion length of the holes.
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Injected carrier spatial distribution (4)


This solution describes non-uniform spatial distribution of the injected carriers:

pn ( x ) = pn (0) e

x / Lp

The solution applies to the


regions that begin at the
space-charge region edges.
Thus, pn(0) is measured at x
= xn
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Injected carrier voltage and distance dependences


As a function of distance from the depletion region edges, the injected carrier
concentration can be found as

n p ( x p ) n p0 eqV / kT e

pn ( xn ) pn0 eqV / kT e

x p / Ln
(for np >> np0)

xn / L p

(for pn>> pn0)

Injected (excessive) electron and hole concentrations:

n p ( x p ) = n p 0 (eqV / kT 1) e

pn ( xn ) = pn0 (eqV / kT 1) e

xp

xn

x p / Ln

xn / L p

xn and xp are the absolute distances


counted from the edges of the space
charge regions on the n- and p- sides
correspondingly.
We assume that xn0 << Ln, xp0 << Lp

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Recombination current of the forward biased p-n junction


Injected (excessive) electron and hole concentrations in the p-n junction:

n p ( x p ) = n p 0 (eqV / kT 1) e

pn ( xn ) = pn0 (eqV / kT 1) e

x p / Ln

xn / L p

Total excessive injected charges (A=junction area):

(
)

Q p = qA pn ( x ) dx = qApn0 ( eqV / kT 1)L p


0

Qn = qA n p ( x ) dx = qAn p 0 eqV / kT 1 Ln
0

The charge Qn dissolves at the rate of Qn/n


The charge Qp dissolves at the rate of Qp/p
The current supplied from the contacts
to compensate the recombination:

I =Qn/n+ Qp/p

Total injected
electrons
per unit area

Total injected
holes
per unit area
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Recombination current of the forward biased p-n junction (2)

Qn = qAn p 0 eqV / kT 1 Ln

Q p = qApn0 eqV / kT 1 L p

The compensating current:

I =Qn/n+ Qp/p

I = qAn p 0 eqV / kT 1 Ln / n + qApn0 eqV / kT 1 L p / p


Electron current

I = qA e

qV / kT

Hole current

Lp
Ln
1 n p 0 + pn0

n
p

Ln, p = Dn, p n, p

I = qA e

qV / kT

>

n, p = L2n, p / Dn, p

Dp
Dn
1 n p0
+ pn0

Ln
Lp

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Total p-n junction current

I = qA e

qV / kT

Dp
Dn
1 n p0
+ pn0

Ln
Lp

This current can be re-written as:


qV
I = IS exp 1
kT

where

Dp pn0 Dnn p0

+
IS = q A
Lp
Ln

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P-n junction current voltage characteristic (I-V)


qV
I = I S exp
kT


1

Forward current

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p-n junction under reverse bias

q (Vbi- VR)

=qV
qV
bi o

q VR

qV

qVo - qV

V<0, the reverse bias. The external voltage increases the built-in barrier.
As compared to the equilibrium, even less electrons and holes can overcome the barrier
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The concentrations of holes in the n-region and electrons


in the p-region:

pn = pn0 eqV / kT << pn0

n p = n p 0 eqV / kT << n p 0

(V < 0)

(V < 0)

The concentrations of injected electrons and holes


exponentially decrease with the reverse voltage
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Reverse current of the p-n junction


Using the same expression as for the forward current
qV
I = IS exp 1
kT

note that

qV
exp 0
kT

when V<0 and |V| >> kT/q

Note that kT/q = 0.026 V.


Typical reverse bias, |VR| >> kT/q
From this:

I IS

Dp pn0 Dnn p0

IS = q A
+
Lp

L
n

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Reverse current of the p-n junction


qV
I = I S exp
kT

I IS

at negative V

Reverse current

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The origin of the p-n junction reverse current

qV
I = I S exp
kT

IS

1.
2.
3.

Zero bias: the thermo-generated current of minority carriers is compensated by the


diffusion of hot carriers.
Positive (forward) bias: thermo generated current the same as at zero bias; the
diffusion current increases due to lower barrier. Total current ~ the diffusion current
Negative (reverse) bias: thermo generated current the same as at zero bias; the
diffusion current decreases due to higher barrier.
Total current ~ the thermo-generated current
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Electron hole flow balance in p-n junction

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