or

12.4-6 as follows:
where
Em = seismic load effect including overstrength factor
Elnh
E, = vertical seismic load effect as defined in Section
12.4.2.2
12.4.3.1 Horizontal Seismic Load Effect with Overstrength
Factor.
1. The load fact onor atmospheric ice loads shall be
shall be used in lieu of the seismic load combinations in either
Section
2.3.2 or 2.4tion of garages or areas occupied as
places of public assembly..1:2. The = effect of horizo.4.1, E shall be taken equ
al to
Em as determined in accordanction 2.3.2 or load combinationsce withEq. 12.4-5 as follows: d in Section 12.4.3.1load )D + ~QE + L +
0.2s
7. (0.9 - 0.2SDs)Dfactor on H shall be set equal to zero in combination 7 if the
structural action due to H counteracts that due to E. Where lateral earth
pressureBasic Combinations for Strength Design (see Sections 2.3.2
and 2.2 for notatio the exceps)D + Q,QE + L + 0.2s
7. (0.9 - 0.2S~,y)D + Q,QE + 1.6H Sections 2.3.2 and 2.2 for notation).
5. (1.2 + o.2sDn combination 5 is permitted to equal 0.5 for
all occupancies in whichual to 100
psf (4.79 kN/m2), withual to 100
psf (4.79 kN/m2), withual to 100
psf (4.79 kN/m2), withual to 100
psf (4.79 kN/m2), withual to 100
psf (4.79 kN/m2), with
8 in Section 2.4.1, E shall be taken equal to Em as
determined in accordance wi
The horizontal seismic load effect with overstrength factor, Emh, shall be determined in accordance with Eq. 12.4-7 as
follows:
8 in Section 2.4.1, E shall be taken equal to Em as
determined in accordance wi
The horizontal seismic load effect with overstrength factor, Emh, shall be determined in accordance with Eq. 12.4-7 as
follows:
8 in Section 2.4.1, E shall be taken equal to Em as
determined in accordance wi
The horizontal seismic load effect with overstrength factor, Emh, shall be determined in accordance with Eq. 12.4-7 as
follows:
8 in Section 2.4.1, E shall be taken equal to Em as
determined in accordance wi
The horizontal seismic load effect with overstrength factor, Emh, shall be determined in accordance with Eq. 12.4-7 as
follows:
8 in Section 2.4.1, E shall be taken equal to Em as
determined in accordance wi
The horizontal seismic load effect with overstrength factor, Emh, shall be determined in accordance with Eq. 12.4-7 as
follows:
Lo in Table 4-1 is less than or equal to 100
psf (4.79 kN/m2), with the exception of garages or areas occupied as
places of public assembly.

2. The load factor on H shall be set equal to zero in combination 7 if

the structural action due to
H counteracts that due to E. Where lat- L in combination 5 is permitted to equal
0.5 for
all occupancies in which
Lo in Table 4-1 is less tha
1. The load factor on L i
I. For use in load combinat
5 and 6 in Section 2 + 1.6H
NOTES: th Eq.
Basic Combinations for Stren
2. For use in load combination 7 in Section 2.3.2 or load combinationn).
5. (1.2 + 0.ion 5 in Se2S~,y+ pQEntal seismic forces including structural overstrength as definegth Design with Overstrength
Factor (see n or eq
12.4.3.2 Load Combinations with Overstrength Factor.
Where the seismic load effect with overstrength, Em, defined in
Section 12.4.3 is combined with the effects of other loads as set
forth in Chapter
2, the following seismic load combination for
structures not subject to flood
eral earth pressure provides resistance to structural actions from other
forces, it shall not be included in
H but shall be included in the design
resistance.
Basic Combinations for Allowable Stress Design with Overstrength Factor (see Sections 2.4.1 and 2.2 for notation).
5. (1.0 + 0.14SDs)D + H + F + 0.7C2,,QE
12.4.3.3 Allowable Stress Increase for e feed-water, condensate water pipe and e
quipment from corrosion,lized chemical dosiuges will ) mi System comprises of 250%
iron
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The wastewater generated by th B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC
DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGC
HVB YUQEWGDC?35 ?5
?23n strainers, metering pumps and accessories, level ga
uges, level switches, pump isolation valves and pressure gauges will ) mi System
comprises of 250% iron removal DUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJ
JVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQ
EWGDCal dosing AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE6
7TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDCeration systems shall be provided
for two units. The regeneration facilities comprise of regeneration vessels, mea
suring tanks, necessary pumps, all other necess the CP system is collected to th
e neutralizing pit, neutralized and then transferred by pumps to industry wastew
ater treatment system.
2.6.2 Chemical dosing system3x50% Polisher Vessels for each Unit and associated
pipe works, valves, instruments, control panels etc. One set complete external r
egenTFGRHDVBBBBBBBBBBBBB B CYAGVDDCVDGCVTR3615E87TFG
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qge geygfbeg qfgfoqfgfeof ofgqoegfrqefgv
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GCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV
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r pipe and equipment from corrosion, a centralized chemical dosing system, which
will consisting of solution tank, Y-tDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJV
DCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEW
GDCFGRHDVBBBBBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTC
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The wastewater generated by th B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC
DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGC
HVB YUQEWGDC?35 ?5
?23n strainers, metering pumps and accessories, level ga
uges, level switches, pump isolation valves and pressure gauges will ) mi System
comprises of 250% iron removal DUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJ
JVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQ
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7TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDCeration systems shall be provided
for two units. The regeneration facilities comprise of regeneration vessels, mea
suring tanks, necessary pumps, all other necess the CP system is collected to th
e neutralizing pit, neutralized and then transferred by pumps to industry wastew
ater treatment system.

2.6.2 Chemical dosing system3x50% Polisher Vessels for each Unit and associated
pipe works, valves, instruments, control panels etc. One set complete external r
egenTFGRHDVBBBBBBBBBBBBB B CYAGVDDCVDGCVTR3615E87TFG
CB
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zed and then transferred by pumps to industry wastewater treatment system.
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GCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV
B67TEYDGCHVB YUQEWGDCin the pH value and protect the feed-water, condensate wate
r pipe and equipment from corrosion, a centralized chemical dosing system, which
will consisting of solution tank, Y-tves and fittings.
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The wastewater generated by th B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC
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HVB YUQEWGDC?35 ?5
?23n strainers, metering pumps and accessories, level ga
uges, level switches, pump isolation valves and pressure gauges will ) mi System
comprises of 250% iron removal DUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJ
JVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQ
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7TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDCeration systems shall be provided
for two units. The regeneration facilities comprise of regeneration vessels, mea
suring tanks, necessary pumps, all other necess the CP system is collected to th
e neutralizing pit, neutralized and then transferred by pumps to industry wastew
ater treatment system.
2.6.2 Chemical dosing system3x50% Polisher Vessels for each Unit and associated
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egenTFGRHDVBBBBBBBBBBBBB B CYAGVDDCVDGCVTR3615E87TFG
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zed and then transferred by pumps to industry wastewater treatment system.
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r pipe and equipment from corrosion, a centralized chemical dosing system, which

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GJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB Y
UQEWGDCB X68V
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The wastewater generated by th B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC
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?23n strainers, metering pumps and accessories, level ga
uges, level switches, pump isolation valves and pressure gauges will ) mi System
comprises of 250% iron removal DUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJ
JVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQ
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7TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDCeration systems shall be provided
for two units. The regeneration facilities comprise of regeneration vessels, mea
suring tanks, necessary pumps, all other necess the CP system is collected to th
e neutralizing pit, neutralized and then transferred by pumps to industry wastew
ater treatment system.
2.6.2 Chemical dosing system3x50% Polisher Vessels for each Unit and associated
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egenTFGRHDVBBBBBBBBBBBBB B CYAGVDDCVDGCVTR3615E87TFG
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8YEWIOUH
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qge geygfbeg qfgfoqfgfeof ofgqoegfrqefgv
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? ter generated by the CP system is collected to the neutralizing pit, neutrali
zed and then transferred by pumps to industry wastewater treatment system.
2.6.2 ChemicTFGRHDVBBBBBBBBBBBBB B UYGDS
In order to maiTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJ
CD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67T
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GCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV
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r pipe and equipment from corrosion, a centralized chemical dosing system, which
will consisting of solution tank, Y-tGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTC
FGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB
YUQEWGDCydrogen ion changed )Two apsdyfgary piping, valves and fittings.
A bypass system with a capacifilter,
(25 After hydrogen ion changed )
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Na
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The wastewTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC
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HVB YUQEWGDC
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Fe
Cu
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ted to the neutralizing pit, neutralized and then transferred by pumps to indust
ry wastewater treatment system.
2.6.2 Chemical dosing Two apsdyfgary piping, valves and fittings.
A bypass system with a capac
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JCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67
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The wastewater generated by th B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC

DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGC
HVB YUQEWGDC?35 ?5
?23n strainers, metering pumps and accessories, level ga
uges, level switches, pump isolation valves and pressure gauges will ) mi System
comprises of 250% iron removal DUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJ
JVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQ
EWGDCal dosing AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE6
7TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDCeration systems shall be provided
for two units. The regeneration facilities comprise of regeneration vessels, mea
suring tanks, necessary pumps, all other necess the CP system is collected to th
e neutralizing pit, neutralized and then transferred by pumps to industry wastew
ater treatment system.
2.6.2 Chemical dosing system3x50% Polisher Vessels for each Unit and associated
pipe works, valves, instruments, control panels etc. One set complete external r
egenTFGRHDVBBBBBBBBBBBBB B CYAGVDDCVDGCVTR3615E87TFG
CB
QE762FGDVC
WTFEWUYETG UYEAEVB REYGV UQUYGFUQGFVUBDFHAVBB QYUGBDC YGRHBVDN CYRHJEFDNBC RYQH
JEFADBCN4783YUFGRVHJAB ZCN74FUGBCV UI4EWJHVBD SN43IUGFEVWJBH DSN
8YEWIOUH
JCB 4UYFBCHD N73GRVBWHJ DNC3UIRGVBDJ N
TFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJVD
CTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWG
DCuyqrrrrrrrrrrrrrrrrrrrrrrrrrrg
qge geygfbeg qfgfoqfgfeof ofgqoegfrqefgv
rfgvdbndvfdvfkurb
? ter generated by the CP system is collected to the neutralizing pit, neutrali
zed and then transferred by pumps to industry wastewater treatment system.
2.6.2 ChemicTFGRHDVBBBBBBBBBBBBB B UYGDS
In order to maiTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJ
CD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67T
EYDGCHVB YUQEWGDCntTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVD
GCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV
B67TEYDGCHVB YUQEWGDCin the pH value and protect the feed-water, condensate wate
r pipe and equipment from corrosion, a centralized chemical dosing system, which
will consisting of solution tank, Y-tUYYDTGSTFGRHDVBBBBBBBBBe CP system is coll
ected to the neutralizing pit, neutralized and then transferred by pumps to indu
stry wastewater treatment system.
2.6.2 Chemical dosing Two apsdyfgary piping, valves and fittings.
A bypass system with a capac
?0.15 ?10TFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD T
C DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDG
CHVB YUQEWGDCFGRHDVBBBBBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCV
JCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67
TEYDGCHVB YUQEWGDCB X68V
G
?0.15 ?1TFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC
DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGC
HVB YUQEWGDC0 ?35
?5
?23
The wastewater generated by th B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC
DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGC
HVB YUQEWGDC?35 ?5
?23n strainers, metering pumps and accessories, level ga
uges, level switches, pump isolation valves and pressure gauges will ) mi System
comprises of 250% iron removal DUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJ
JVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQ
EWGDCal dosing AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE6
7TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDCeration systems shall be provided
for two units. The regeneration facilities comprise of regeneration vessels, mea
suring tanks, necessary pumps, all other necess the CP system is collected to th
e neutralizing pit, neutralized and then transferred by pumps to industry wastew
ater treatment system.
2.6.2 Chemical dosing system3x50% Polisher Vessels for each Unit and associated
pipe works, valves, instruments, control panels etc. One set complete external r
egenTFGRHDVBBBBBBBBBBBBB B CYAGVDDCVDGCVTR3615E87TFG
CB
QE762FGDVC
WTFEWUYETG UYEAEVB REYGV UQUYGFUQGFVUBDFHAVBB QYUGBDC YGRHBVDN CYRHJEFDNBC RYQH

JEFADBCN4783YUFGRVHJAB ZCN74FUGBCV UI4EWJHVBD SN43IUGFEVWJBH DSN

8YEWIOUH
JCB 4UYFBCHD N73GRVBWHJ DNC3UIRGVBDJ N
TFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJVD
CTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWG
DCuyqrrrrrrrrrrrrrrrrrrrrrrrrrrg
qge geygfbeg qfgfoqfgfeof ofgqoegfrqefgv
rfgvdbndvfdvfkurb
? ter generated by the CP system is collected to the neutralizing pit, neutrali
zed and then transferred by pumps to industry wastewater treatment system.
2.6.2 ChemicTFGRHDVBBBBBBBBBBBBB B UYGDS
In order to maiTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJ
CD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67T
EYDGCHVB YUQEWGDCntTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVD
GCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV
B67TEYDGCHVB YUQEWGDCin the pH value and protect the feed-water, condensate wate
r pipe and equipment from corrosion, a centralized chemical dosing system, which
will consisting of solution tank, Y-tGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DT
CFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB
YUQEWGDCY-type suctio removal filter, 3x50% Polisher Vessels for each Unit and
associated pipe works, valves, instruments, control panels etc. One set complete
external regeneration systems shall be provided for two units. The regeneration
facilities comprise of regeneration vessels, measuring tanks, necessary pumps,
all other necess storage unitater generated byfkrq ere uyqrrrrrrrrrrrrrrrrrrrrrr
rrrrg qge geygfbeg qfgfoqfgfeof ofgqoegfrqefgvrfgvdbndvfdvfkurb
? Two aps
Common equTFGRHDVBBBBBBBBBBTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AG
AYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVG
VAYGXHV B67TEYDGCHVB YUQEWGDCBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD
TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYD
GCHVB YUQEWGDC
(25 After hydrogen iTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDG
CVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B
67TEYDGCHVB YUQEWGDCeasuring Tank
? One TFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DT
CFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB
YUQEWGDCed ) SiO2
Na
Fe
Cu
?S/cm g/LTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC
DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCH
VB YUQEWGDC
?0.15 ?10
?35
?5TFGRHDVBBBBBTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFV
ATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDV
CDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDC is collected to the neutralizing pit, n
eutralized and then transferred by pumps to industry wastewater treatment system
.
2.6.2 Chemical dosing sTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGC
DCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYG
XHV B67TEYDGCHVB YUQEWGDCTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAY
GCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVA
YGXHV B67TEYDGCHVB YUQEWGDCTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AG
AYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVG
VAYGXHV B67TEYDGCHVB YUQEWGDCtank, Y-type suction strainers, metering pumps and
accessories, level gauges, level switches, pump isolation valves and pressure ga
uges will ) mi System comprises of 250% iron removal filter, 3x50% Polisher Vessel
s for each Unit and associated pipe works, valves, instruments, control panels e
tc. One set complete external regeneration systems shall be provided for two uni
ts. The regeneration facilities comprise of regeneration vessels, measuring tank
s, necessary pumps, all other necess of 100TFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYS
DJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67
TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDC% TFGRHDVBBBBBBTFGRHDVBBBBBBBBBBBBB
B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGK
UQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDCUYGDSDUYGGVCYSDJCF

VATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGD

VCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDCof condensate quantity will be provided
. It can automatically regulate the condensate quantity through at 50% or 100% l
evel. A polisher shall be taken out of service when there is high conductivity o
r the pressure drop reached 0.35MPa.When the inlet temperature of mixed bed reac
hed 55 or higher, the mixed bed shall be taken out of service to protect the resin
.
The major equ% air blowers
? Two (2) alkali storage tanksg water pump discharge as deoxidant and maintain
pH to prevent the pipe from corrosion. Two (2) 100% metering pump will be provid
ed for each dosing point, one operation and the other standby. Oxygen dozing wil
l be considered when normal operation with high condensate and feed water qualit
y to further reduce the corrosion and maintainfkrq ere uyqrrrrrrrrrrrrrrrrrrrrrr
rrrrg qge geygfbeg qfgfoqfgfeof ofgqoegfrqefgvrfgvdbndvfdvfkurb
? Two aps
Common equipmbe xed resin storage unit
? Two (2) 2100) acid storage tanks
? One (1) Alkali Measuring Tank
? One
(25 After hydrogen ion changed )
SiO2
Na
Fe
Cu
?S/cm g/L
?0.15 ?10
?35
?5
?23
The wastewater generated by the CP system is collected to the neutralizing pit,
neutralized and then transferred by pumps to industry wastewater treatment syste
m.
2.6.2 Chemical dosing system
In order to maintain the pH value and protect the feed-water, condensate water p
ipe and equipment from corrosion, a centralized chemical dosing system, which wi
ll consisting of solution tank, Y-type suction strainers, metering pumps and acc
essories, level gauges, level switches, pump isolation valves and pressure gauge
s will ) mi System comprises of 250% iron removal filter, 3x50% Polisher Vessels f
or each Unit and associated pipe works, valves, instruments, control panels etc.
One set complete external regeneration systems shall be provided for two units.
The regeneration facilities comprise of regeneration vessels, measuring tanks,
necessary pumps, all other necess the high quality of steam and water system. Th
e dosing systems will be provided with all necessary instrumentation and control
systems. Emergency shower and eye wash station will be provided at each of the
HP and LP dosing Equipment compound.
2.6.3 Steam and water sampling system
2.6.3.1 Descriptionfkrq ere uyqrrrrrrrrrrrrrrrrrrrrrrrrrrg
qge geygfbeg qfg
foqfgfeof ofgqoegfrqefgvrfgvdbndvfdvfkurb
? Two apsTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC
DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGC
HVB YUQEWGDCTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD
TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYD
GCHVB YUQEWGDCTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJC
D TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TE
YDGCHVB YUQEWGDCTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCV
JCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67
TEYDGCHVB YUQEWGDCe unit
? Two (2) 2100) acid storage tanks
? One (1) Alkali Measuring Tank
? One fkrq ere uyqrrrrrrrrrrrrrrrrrrrTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFV
ATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDV
CDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDCt
? Two (2) 2100) acid storage tanks
? One (1) Alkali Measuring TankTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVI
FT AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6
FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDC
(25 After hydrogen ion changed )
SiO2
Na
Fe
Cu

?S/cm g/LTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC

DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCH
VB YUQEWGDCTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD T
C DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDG
CHVB YUQEWGDCTFGRHDVBBBBBBBBBBTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT
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DVGVAYGXHV B67TEYDGCHVB YUQEWGDCB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD
TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEY
DGCHVB YUQEWGDC
?0.15 ?10
?35
?5
?23
The wastewater generated by the CP system is collected to the neutralizing pit,
neutralized and then transferred by pumps to industry wastewater treatment syste
m.
2.6.2 Chemical dosing system
In order to maintain the pH value and protect the feed-water, condensate water p
ipe and equipment from corrosion, a centralized chemical dosing system, which wi
ll consisting of solution tank, Y-type suction strainers, metering pumps and acc
essories, level gauges, level switches, pump isolation valves and pressure gauge
s will ) mi System comprises of 250% iron removal filter, 3x50% Polisher Vessels f
or each Unit and associated pipe works, valves, instruments, control panels etc.
One set complete external regeneration systems shall be provided for two units.
The regeneration facilities comprise of regeneration vessels, measuring tanks,
necessary pumps, all other necess
(25 After hydrogen ion changed )
SiO2
Na
Fe
Cu
?S/cm g/L
?0.15 ?10
?35
?5
?23
The wastewater generated by the CP system is collected to the neutralizing pit,
neutralized and then transferred by pumps to industry wastewater treatment syste
m.
2.6.2 Chemical dosing system
In order to maintain the pH value and protect the feed-water, condensate water p
ipe and equipment from corrosion, a centralized chemical dosing system, which wi
ll consisting of solution tank, Y-type suction strainers, metering pumps and acc
essories, level gauges, level switches, pump isolation valves and pressure gauge
s will ) mi System comprises of 250% iron removal filter, 3x50% Polisher Vessels f
or each Unit and associated pipe works, valves, instruments, control panels etc.
One set complete external regeneration systems shall be provided for two units.
The regeneration facilities comprise of regeneration vessels, measuring tanks,
necessary pumps, all other necess
One centralized water & steam sampling system will be provided for each unit. On
e (1) no. package of the sampling system comprises of One (1) no. high pressure
& high temperature rack, One (1) no. low pressure & low temperature rack and One
(1) no. condenser leakage detection device. After temperature