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1. Introduction
III-V compound semiconductors are known as an
attractive material for optical devices such as solar
cells [1], laser diodes [2], and light-emitting diodes [3]
amongst others. In particular, light-emitting diodes
based on AlGaInP materials, with a wavelength
ranging from 570 nm to 630 nm, have been developed
for commercial applications such as illumination,
traffic lights, vehicle lighting and indicators [4]. Ever
higher efficiency AlGaInP LEDs have been required
for high power devices with a low operating voltage.
The efficiency of AlGaInP LEDs has been significantly
improved by either increasing the internal quantum
efficiency by inserting multiple hetero-structures and
multiple quantum barriers, or by increasing the light
extraction efficiency by using a distributed Bragg
Corresponding author: Hyung-Joo Lee, Ph.D., research
fields: light emitting diode, AlGaInP and AlGaAs. E-mail:
lee-hyungjoo@auk.co.kr.
116
Efficiency Improvement of 590 nm AlGaInP Light Emitting Diode with a Reflective Top Electrode
2. Experiments
The AlGaInP LEDs used were grown on an n-type
GaAs (111) substrate at a 10 forward tilt [0-1-1]
0.5 using an MOCVD system. Here, trimethylgallium
(TMGa),
trimethylaluminum
(TMAl),
and
trimethylindium (TMIn) were used as the group III
sources; arsine (AsH3) and phosphine (PH3) were the
group V sources; and disillane (Si2H6) gas and
cyclo-peantadienylmagnesium (Cp2Mg) were the nand p-doping sources. Hydrogen (H2) was used as the
carrier gas for all sources.
The cross-sectional schematics of the AlGaInP LED
structures developed are shown in Fig. 1. In brief, the
substrate is a GaAs lattice matched with both AlGaInP
and AlGaAs. The AlAs/AlGaAs distribution Bragg
reflector (DBR) is used to reflect upward the light
emitted from the active region to the substrate. The nand p-AlGaInP materials were used as the n- and
p-confinement layers, respectively, by varying the
component ratio of Al and Ga in the AlGaInP materials.
The active region consists of 30 pairs of MQWs,
having 10 nm thick AlGaInP wells and 30 nm thick
AlGaInP barriers. In conventional AlGaInP LEDs, the
GaAs top layer of 80 nm thick was grown on a pconfinement layer for ohmic contact. In the developed
AlGaInP LEDs with a reflective top electrode, the
AlAs/AlGaAs top distributed Bragg reflector
(TDBR) ,consisting of ~68nm thick AlAs and ~57nm
Fig. 1
Schematics of structures of (a) conventional
AlGaInP LED and (b) AlGaInP LEDs with a reflective top
electrode.
thick AlGaAs periods, was grown on the pconfinement layer for both reflection and ohmic
contact. For further improved information, the TDBRs
of 4 and 12 periods were trialed for the reflective top
electrode.
In this work, all the epitaxial wafers used were
divided into 9 mil chips (230 m 230 m) using
dicing system.
Efficiency Improvement of 590 nm AlGaInP Light Emitting Diode with a Reflective Top Electrode
117
4. Conclusions
In this work, efficiency improvements for a 590 nm
AlGaInP light-emitting diode (LED) with a reflective
top electrode (RTE) were investigated. A distributed
Bragg reflector (DBR), consisting of AlAs/AlGaAs
pairs, was used as a reflector for a reflective top
electrode. It was found that a higher output power was
observed from the AlGaInP LED with a RTE as
compared to a conventional one. The output power of
the LEDs with a RTE depends strongly on the
reflectivity of the DBR used as its reflector. At an
118
Efficiency Improvement of 590 nm AlGaInP Light Emitting Diode with a Reflective Top Electrode
[6]
[7]
Acknowledgments
The authors wish to express their appreciation to the
Human Resources Development program (No.
20134030200250) of the Korea Institute of Energy
Technology Evaluation and Planning (KETEP) grant
funded by the Korea government Ministry of Trade,
Industry and Energy, and by a Korea Research
Foundation Grant from the ATC project (No.
10035863) by the Ministry of Knowledge Economy
[8]
[9]
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