Professional Documents
Culture Documents
SP Production II Team
Process
Plating
Chemical polishing
2001-04-18 Rev.0
Function
Requirements
- Prevent Oxidation
- No visual defect
- No uncoated area
Pattern of Defect
- Discoloration
Effect of Defect
- 2nd W/B failed
- unpolished
- overpolished
- Uncoating
Cause of Defect
Effect
occurrence
Defect
RPN
75
50
- Unsuitable process
50
18
conditions(Speed,temp,concentration)
18
20
12
20
16
16
PR Coating
Exposure
Developing
12
- No undeveloped area
- O/S
20
24
- No bubble
36
- PI side etched
24
24
- No uncoated area
- PI side etched
24
- SR bleed out
- W/B Fail
24
32
24
18
Back Coating
to protect from etching chemical
SR Printing
- SR Spec out
24
Tape Aging
- Bad adhesion
- Bubble at Cu Laminating
- absorbing moisture
45
Punching
30
Vacuum dry
- Bad adhesion
- Bubble at Cu Laminating
- Poor vacuum
45
Cu Lamination
- Circuit open/short
12
- Visual control
- No transformation
Cure
- Bad adhesion
- Delamination
20
Elastomer Attach
- No unattached area
- Unattached
Chip Crack
10
Slitting
18
Adhesive Lami'
Laminationg adhesive for Heat Sinker atta - Meet spec by Adhesive materials
50
Tape Lamination
15
package assembly
- No transformation
Warpage
Chip Crack
15
Busbar Punching/Singulation
- Minimize Burr
36
Debussing
Center Alignment
Remark
Precess
FMEA NO
Start date
Completion date
Engineer
Control or not
1 Precess
Discoloration
01-PLAT-001
01.01.25
01.04.20
Y. K. Cho
Controlled
2 Inspection
Discoloration
01-CUIN-001
01.01.25
01.04.20
Y. K. Cho
Controlled
3 Back coating
01-BKNT-001
01.05.01
01.05.24
J. M. Shim
Controlled
4 Printing
SR Bleed out
01-PRNT-001
01.05.01
01.05.24
J. M. Shim
Controlled
Rev. 0
Remark