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2.
3.
4.
Photoresist
You can use liquid or film. Film in this article will not discuss because
of its scarcity, difficulty rolling to the PCB and the lower the quality of
the output of printed circuit boards.
After analyzing the proposals of the market, I stopped at POSITIV 20
as an optimum photoresist for home production of PP.
Purpose:
POSITIV 20 - photosensitive varnish.
Used in small-scale
manufacturing of printed circuit boards, engravings on copper, while
conducting operations related to transfer images to a variety of
materials.
Properties
High expo features provide a good contrast-borne images.
Application:
It is used in fields related to the transfer of images on glass, plastics,
metals, etc. in small-scale production. Method of application specified
on
the
container.
Features:
Color:
Blue
3
Density:
at
20
C
0,87
g
/
cm
Drying
time
at
70
C
15
min.
2
Consumption:
15
l
/
m
The maximum photosensitivity: 310-440 nm
More about POSITIV 20 can be read here .
The instructions to the photoresist is written that it can be
stored at room temperature and it is unaffected by aging.
Strongly disagree! Keep it should be in a cool place, such as a
refrigerator on the bottom shelf, which is usually maintained at
+2 ... +6 C. But in any case, do not let freezing temperatures!
If you use photoresists sold "by the glass" and not having
opaque packaging is required to take care of the protection from light.
Keep necessary in complete darkness and a temperature of +2 ... +6
C.
Enlightener
Similarly, the most appropriate educator, I think I always used
TRANSPARENT 21.
Purpose:
Allows you to directly transfer images to a surface coated with a
photosensitive emulsion POSITIV 20 or other photoresist.
Properties
Gives transparency paper. Provides transmission of ultraviolet rays.
Application:
For a quick transfer of pictures and diagrams circuits on a substrate.
Can greatly simplify the process of reproduction, and reduce time-s e
costs.
Features:
Color:
Clear
3
Density:
at
20
C
0,79
g
/
cm
Drying
time
at
20
C
for
30
min.
Note:
Instead of plain paper with an educator, you can use transparency film
for inkjet or laser printers - depending on what we print the
photomask.
Photoresist developer
There are many different solutions for developing the
photoresist.
Advised to exercise with a solution of "water glass".
Its
chemical composition: Na 2 SiO 3 *5H 2 O . This substance has
a huge number of advantages. The most important thing is that
it is very difficult to overexpose PP - PP you can leave on time is
not fixed exactly. The solution almost does not change its properties
when the temperature drops (no risk of collapse with increasing
temperature), also has a very long period of storage - its concentration
remains constant for at least a couple of years. No problem of
overexposure in the solution will increase its concentration to reduce
the development time of PP. Recommend mixing 1 part concentrate to
180 parts water (a little over 1.7 grams of silicate in 200 ml of water),
but may make a more concentrated mixture so that the image was
shown for about 5 seconds without the risk of fracture surface for
overexposure. If you can not purchase, use of sodium silicate sodium
carbonate ( Na 2 O 3 ) and potassium carbonate ( K 2 O 3 ).
It is also recommended for residential facility for cleaning of sanitary
equipment - "Mole".
Have not tried neither the first nor the second, so tell what appears
without any problems for several years. I'm using an aqueous solution
of caustic soda. 1 liter of cold water - 7 grams of caustic soda. If
there is no NaOH , apply a solution of KOH , doubling the concentration
of alkali in the solution. Development time - 30-60 seconds at a
proper exposure. If after 2 minutes, drawing does not show (or is
weak), and begins to wash away the photoresist with the workpiece thus improperly selected exposure time: we must increase. If, by
the fire, but at the same strain will be much less significant - it is
checked several times.
If PP is simple, you can draw it by hand in a very user-friendly
program with Russian interface - Sprint Layout 3.0R (~ 650 KB).
In the preparatory phase does not draw too bulky electrical wiring is
very easy to program also Russified sPlan 4.0 (~ 450 KB).
Material -
Exposure (illumination)
The time required for exposure depends on the thickness of the
photoresist and the intensity of the light source. Lac photoresist
POSITIV 20 is sensitive to ultraviolet rays, the maximum sensitivity
falls on a site with a wavelength of 360-410 nm.
Best exhibit under lamps, the range of radiation which is in the
ultraviolet region, but if this lamp you do not - you can use the
powerful and ordinary incandescent lamp, increasing the exposure
time. Do not start until the stabilization of illumination light from the
source - it is necessary that the lamp has been heated for 2-3
Time
Distance
3 min.
30 cm
1.5 min.
50 cm
2.5 min.
50 cm
3-4 min.
30 cm
sunlight
5-10 min.
4.8 min.
summer, at
noon, cloudless
40 cm
Note
coating of silica glass
thickness of 5 mm
coating of silica glass
thickness of 5 mm
coating of silica glass
thickness of 5 mm
coating of silica glass
thickness of 5 mm
coating of silica glass
thickness of 5 mm
coating of silica glass
thickness of 8 mm
UV Lamps
Each side on display at a time, after the exposure we give to stand for
20-30 minutes workpiece in a dark place.
Etching
Herbs in a concentrated solution of ferric chloride at a temperature
50-60 C. It is desirable to provide a continuous circulation of the
etching solution. Bad bleed seats carefully "massaged" with a cotton
swab on a glass rod. If ferric chloride freshly cooked, the etching time
is typically less than 5-6 minutes.
Wash under running water
harvesting.
Drilling holes
Diameter holes at the point of the future photomask preferably
chosen so that afterwards it was easy to drill. For example, if the
required diameter of 0.6-0.8 mm diameter hole at the point of the
photomask should be about 0.4-0.5 mm - in this case, the drill will
align well.
It is desirable to use a drill bit, tungsten carbide coating: drills of high
speed steels are wear out quickly, although steel can be used for
drilling single holes of large diameter (greater than 2 mm) as well as
drills coated with tungsten carbide such diameter is too expensive.
When drilling holes with a diameter of less than 1 mm is better to use
a vertical lathe, otherwise your drill will quickly break down. If a hand
drill to drill - are inevitable distortions, leading to inaccurate mating
holes between the layers. Movement down the vertical drill press is
the best in terms of load on the tool. Carbide drill bits are made from
rigid (ie, drill exactly matches the diameter of the hole) or thick
(sometimes called a "turbo") shank having a standard size (usually 3.5
mm).
When drilling bits with carbide coating is important to
consolidate the hard-PP, as a drill with the upward motion can raise PP,
warp and perpendicular to snatch a fragment of the board.
A small diameter drill bits are usually inserted into a collet (various
sizes), or three-jaw chuck. For accurate fixation fixation in three-jaw
chuck - not the best option, and the small size drills (less than 1 mm)
is quickly making grooves in the terminals, losing a good fit.
Therefore, to drill with a diameter less than 1 mm is better to use a
collet chuck. In any case, buy an extra set that contains the spare
collet for each size. Some cheap drills produced with plastic collets throw them and buy the metal.
To obtain an acceptable accuracy it is necessary to organize a
workplace, that is, firstly, to ensure good coverage of fees for drilling.
You can use the halogen bulb, attaching it to a tripod to be able to
choose the position (to cover the right side). Second, to raise the
working surface of approximately 15 cm above the table top for a
better visual control of the process. It would be nice to remove dust
and shavings during drilling (you can use a regular vacuum cleaner),
but not necessarily. It should be noted that the dust from fiberglass,
which is formed by drilling, a copse and in contact with skin causes
irritation of her. Finally, while working very convenient to use a foot
switch for the drill.
Typical dimensions of the openings:
This cellular telephone bridge that allows 2-10 times lower cost of
mobile services - was worth messing with the PP).
PCB with
components soldered in the stand . Previously, there had been an
ordinary battery charger for mobile phones.
Additional information
Metallization of holes
At home, you can even plating of holes. To do this, the inner surface
of hole 20 is processed by a 30-percent solution of silver nitrate (lapis
lazuli). Then, the surface is cleaned and squeegee board is dried in
the light (you can use the UV lamp). The essence of this operation is
that when exposed to light silver nitrate decomposes, and the board
are specks of silver. Next is the chemical deposition of copper from
solution: copper sulfate (bluestone) - 2 g, sodium hydroxide - 4 g,
ammonia, 25 per cent - 1 mL of glycerol - 3.5 ml formalin 10 percent 8-15 ml Water - 100 ml. Shelf life prepared solution is very small need to prepare just before use. After the copper deposition charge
washed and dried. Layer is very thin, its thickness must be increased
to 50 microns plated.
Solution
for
copper
plating
electroplating:
1 liter of water 250 g of copper sulphate (bluestone) and 50-80 g of
concentrated sulfuric acid. The anode is a copper plate, suspended
parallel to the covered parts. The voltage should be 3-4 in the current
density - 0,02-0,3 A / cm 2, temperature - 18-30 C. The smaller the
current, the slower the process of plating, but the better the resulting
coating.
Homemade photoresists
Photoresist based on gelatine and potassium dichromate:
The first solution: 15 g gelatine pour 60 ml of boiling water and leave
to swell for 2-3 hours. After the swelling capacity of gelatin put in a
water bath at a temperature of 30-40 C to dissolve gelatin.
Second solution: 40 ml of boiled water dissolve 5 g of potassium
dichromate (potassium bichromate, powdered bright orange).
Dissolve
in
low
diffuse
light
conditions.
In the first solution under vigorous stirring, pour in the second. In the
mixture with a pipette to add a few drops of ammonia until a straw
color. Emulsion is applied to the prepared board with a very poor light.
The board is dried up "tacky" at room temperature in the dark. After
exposure at low cost scattered light rinse in warm running water to
remove nezadublennogo gelatin. To better assess the results, you can
paint the areas with undeleted gelatin solution of potassium
permanganate.
Enhanced
self-made
photo-resist:
The first solution: 17 g of wood glue, 3 ml of aqueous ammonia, 100
ml of water, leave to swell for a day, then heat in a water bath at 80
C
until
complete
dissolution.
Second solution: 2.5 g of potassium dichromate, ammonium
dichromate, 2.5 g, 3 mL of aqueous ammonia, 30 ml of water, 6 ml of
alcohol.
When the first solution is cooled to 50 C, with vigorous stirring, pour
in a second solution and filter the mixture (this and subsequent
operations should be conducted in a darkened room, the sunlight is
not allowed!). The emulsion is applied at a temperature of 30-40 C.
Then - as in first recipe.
Photoresist on the basis of ammonium dichromate, and
polyvinyl
alcohol:
Prepare a solution of: polyvinyl alcohol - 70-120 g / l, ammonium
dichromate - 8-10 g / l ethanol - 100-120 g / liter. Avoid bright light!
Applied in two layers: the first layer - the dryer for 20-30 minutes at
30-45 C - second layer - drying for 60 min at 35-45 C. Developer 40-percent solution of ethyl alcohol.
Chemical tinning
First of all, the card must be pickle to remove the copper oxide
formed: 2-3 seconds in a 5-percent solution of hydrochloric acid,
followed by rinsing in running water.
Just to chemical immersion tin board in an aqueous solution
containing chlorine tin. Isolation of tin on the surface of the copper
coating occurs when immersed in a salt solution of tin in which the
potential of copper is more electronegative than the coating material.
Tin dichloride
Thiourea
SnCl
CS(NH
Sulphuric acid
Tartaric acid
Caustic soda
*2H
SO
O
NaOH
Lactic sodium
Aluminum sulphate, ammonium
(alyumoammoniynye alum)
Temperature, C
5.5
8.5
20
10
50
35-50
30-40
35
200
300
60-70
50-60
18-25
18-25
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