Professional Documents
Culture Documents
Presented by
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Authors thank
Curamik
Electronics
A member of
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DCB Process
Oxygen reduces the melting point of Cu from
1083C to 1065C (Eutectic melting temperature).
Oxidation of copper foils or injection of oxygen
during high temperature annealing (1065C and
1080C) forms thin layer of eutectic melt.
Melt reacts with the Alumina by forming a very
thin Copper-Aluminum-Spinel layer.
Copper to copper is fused the same way.
Copper-Aluminum-Nitride (AlN) DBC is possible.
The AlN-Surface must be transformed to Alumina
by high temperature oxidation.
Courtesy of Curamic Electronics
2003, D. C. Hopkins
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DBC Process
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O2
Copper
Copper
Ceramic
Copper
Copper
Copper
Oxide
Copper
1080 -
Copper
Ceramic
1070 Heating
Copper
Ceramic
Eutectic
Melt
Copper
1060 -
Copper
O 2 Diffusion
and
Cooling
Eutectic
1050 Copper
Copper
Ceramic
Copper
0.8
1.2
1.6
0.4
O2-Concentration in Atom-%
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DBC - Interfaces
Copper
Al2O3
Al2O3
AlN
Copper
Copper
Courtesy of Curamic Electronics
2003, D. C. Hopkins
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Masking
Etching
Laser Scribing
Final Cleaning
Electroless Nickel
Electroless Gold
Substrate blank
copper surface
Substrate Ni plated
Substrate Ni + Au surface
Control
Separating mastercards
by breaking
Shipping to customer
as single parts
Shipping to customer
as mastercards
Courtesy of Curamic Electronics
2003, D. C. Hopkins
d.hopkins@ieee.org
Masking
High precision screen
printers for high volume
Semiautomatic and fully
automatic with pattern
recognition
Redundant equipment
Photomasking for high
density circuits
Air conditioned clean
rooms
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Etching
Specially designed
precision etchers for
thick copper layers
Automatic chemistry
control
Mask stripping
integrated
3 separate high volume
lines in operation
Controlled by SPC
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Laser Machining
Fully automatic high
precision CO2 lasers
with pattern recognition
Designed for high
volume throughput
Scribing and drilling
Multiple equipment
Controlled by SPC
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Surface of Sun
10.000.000
1.000.000
Hot-Plate
100.000
Logic Chips
10.000
1.000
100
1000
10000
Source: Semikron
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Hard encapsulation
Al thick wire bond
Plastic casing
Soft encapsulation
IGBT / Diode
DBC substrate
Cu baseplate
Heat sink
Solder joint
Thermal grease
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DBC substrate
Diode
IGBT
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0,7
0,65
Al2O3
0,6
0,55
0,5
AlN
0,45
Diamond
0,4
10
100
1000
10000
Thermal conductivity[W/mK]
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Thermal Mass
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160
140
Cu-thickness (3)
120
100
80
60
40
Influence
of
Rth static
Influence of copper
thickness
20
1E-2
1E-1
1E1
1E0
1E2
1E3
ln time [sec]
0,15 mm
0,3 mm
0,6 mm
d.hopkins@ieee.org
99
90
75
63,3
25
10
Alumina Standard
DBC dCu=0,20mm
DBC dCu=0,25mm
DBC dCu=0,30mm
300
400
500
600
700
800
900 1000
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99
DBC
Optimized Alumina
90
75
63,3
25
10
2000
1500
900
950
1000
850
800
750
700
650
600
550
500
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Dimple Design
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Top view
Cross section
Courtesy of Curamic Electronics
2003, D. C. Hopkins
d.hopkins@ieee.org
2000
400
500
600
700
800
900
1000
300
200
80
100
60
40
20
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2200
2000
>2000
>2000
1800
1600
1400
without Dimples
1200
1000
800
350
300
250
200
150
100
50
0
CurStd
CurHPI
CurHP*
CurMil
AlN
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Special Substrates
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Via Technology
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Both sides flat surface. Ceramic hole One side flat surface. Ceramic hole
diameter min. 1.0mm R<100
diameter min. 1.0mm R<100
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Integral Terminals
Terminals made of same
copper sheet as circuit
High electrical
conductivity due to solid
metal without interface
resistance
Very high reliability
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3-Dimensional DBC
For very high density
circuits
Extremely reliable due
to integral connectors
Base for power
Sidewalls for non-power
components
Assembled flat and bend
up
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Package Types
Kovar Lid
Side Lead
Wirebond
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Kovar Frame
Chip
1
Kovar Lid
Kovar Frame
Top Lead
2
Wirebond
Ceramic
Copper
Chip
Via
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Package Types
Kovar Lid
Down Lead
Wirebond
Kovar Lid
Chip
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Kovar Frame
Kovar Frame
Glass
Chip
Kovar Pin
1
Kovar Lid
Kovar Frame
Surface Mount
Wirebond
Chip
1
Ceramic
Copper
Via
2003, D. C. Hopkins
d.hopkins@ieee.org
d.hopkins@ieee.org
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Basis
Element
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Micro Channels
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Cut A
Cut B
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65
60
RtHja [ mK/W ]
AlN integ.
55
50
Al2O3 integ.
45
Al2O3 substrate
40
35
AlN substrate
30
25
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Module comparison
Conventional v. Integrated water cooling
100
Rth [K/kW]
80
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60
40
20
Sink
Junction Case
1
Junction
Ambient
2
Junction
Ambient
3
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