Fabric Properties Modification by

Plasma Process

Boonchoat Paosawatyanyong
Plasma and Advanced Material Technology Research Unit (PAMT),
Faculty of Science, Chulalongkorn University, Thailand

IWPDA 2009 2009

 Plasma and Advanced Material Technology
Research Unit (PAMT)
AAAPT, Prof. Sing Lee, Prof. Chiow San Wong are gratefully acknowledged

2000 – Pulsed high temp

plasma
2002 – Low temperature
plasma

IWPDA 2009 2009

 Plasma and Advanced Material Technology
Research Unit (PAMT)

Low temp plasma

Dr. B. Paosawatyanyong
Dr. S. Sanorpim,
Dr. S. Hodak,
Dr. W. Bhanthumnavin,
3 Ph.D & 14 M.S. students

IWPDA 2009 2009

 Material Surfaces Modification

Plasma Nitriding
Plasma Carburizing
Plasma Etching/Cleaning

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 High Growth Rate Deposition

DLC & Polycrystalline diamond

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 Devices Fabrication

Gas composition CH4:H2 = 0.5 – 5 % Growth Period 20 – 40 hr.

Gas flow rateH2 = 100-200 sccm CH4 = 0.5-10 sccm
Operation pressure = 10 – 50 Torr Microwave power = 450-850 W
Substrate temperature= 400 – 600 C Film thickness = 0.5 – 2.5 micron

IWPDA 2009 2009

 Signal Responses

HP 4284A
L CUR L POT HPOT HCU R

depletion Rd
layer Cd Rd
Cf
A l , T i /A u e l ec tr od e
P ro b e DL C
bulk DL C Rf
S i su b strate CB RB
RB
P ro b e
Si substrate

q u artz p l ate
Geometrical model
tem p eratu re- c o ntro l l ed c hu c k

A l b ac k c o n t ac t Model include effect of slow

A l p l ate
response trap states

-6 7
10 10
Bias Voltage
Voltag
-7 - 5.0 V
10 - 2.5 V
0V 5
+ 2.5 V 10
Cs (Farad)

-8
10 + 5.0 V
Rs ()

Bias Voltage
-9
10 3 -5.0 V
10 - 2.5 V
0V
-10 + 2.5 V
10
+ 5.0 V

-11 1
10 2 3 4 5 6
10 2 3 4 5 6
10 10 10 10 10 10 10 10 10 10

Freq (Hz) Freq (Hz)

IWPDA 2009 2009

 Surfaces Coatings

Hard thin films coatings – TiN, CrN, AlN

Metals coating – Au, Cu, Al
Compounds coatings – TiO2
Multiple layers (111)

250
(200)

Intensity (a.u.)
200
150
100
114 W
50 97 W
81 W
0 67 W
56 W
40
42
44
46
44 W
48
50
52
54
56
58
2

60
62

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 Conducting Polymers Polymerization/Deposition

Polyacetylene
Polypyrrole
Polythiophene
In-situ doping
Device fabrication

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 Fabric Properties Modification

Hydrophilicity – wet/dyed improvement

Hydrophobicity –water repellence
Flame retardancy
Polymerization / grafting

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 System- RF ICP Plasma Reactor

RC RC
Lowpass Lowpass Oscilloscope
3MHz Funtion 300V, 1 A Filter Filter
Generator Power Supply Diffrential Voltage
Probe Probe

83k 4k
10m
Lanmuir Probe
2N5657
47m
500
10k 36k 1k
in out
235 470m
0.3n

Voltage Sweep Amplifier Circuit RC Lowpass Filter

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 Reactor Setup

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 Plasma Treatments

SF6 O2 , N2

polymer

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 Hydrophobic Cotton, Silk, PET

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 Hydrophobic Cotton, Silk, PET

250
absorption time (min)

200

untreated
150
25 watts

100 50 watts
75 watts
50

0
0 10 20 30
Number of cycle (round)

IWPDA 2009 2009

 Mechanical Strength & Weight Loss after treatment

700
700
650
Warp
600 warp 600 Weft
weft
550
500
500
Tensile strength (N)

Tensile strength (N)

400 450

300 400

350
200
300
100 250

200
0
150
0 5 10 15 20 25 30 0.0 0.1 0.2 0.3 0.4 0.5 0.6
Exposure time (min) Pressure (torr)

6 1.2

5 1.0

4 0.8

Weight loss (%)

Weight loss (%)

3
0.6

2
0.4

1
0.2

0
0.0
0 5 10 15 20 25 30 0.0 0.1 0.2 0.3 0.4 0.5 0.6
Treatment time (min) Pressure(torr)

IWPDA 2009 2009

 SEM Results
A-Control, B- 15 sec, C- 1 min, D- 5 min, E-10 min, F- 30 min
RF 50 W, 1 torr of SF6

A B C

D E F

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 AFM Results
Roughness increases from 28 nm to 45 nm

5mm

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 XPS Results

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 RF-ICP System Scale-up

Stage Normal closed

selector
Backing/ Rough
Flood valve
System Roughing/
switch Operate Gate
Rotary Hi-vac RF-Gen
valve
Ultimate
Emergency Main switch
switch

The result of analysis for I-V curve

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 AC Plasma Treatments on Fabrics

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 References

[1] T. Supasai, S. K. Hodak and B. Paosawatyanyong, J. Fizik

Malaysia 28(1&2) (2007) P. 1-6
[2] A. Thongphud, B. Paosawatyanyong, P. Visal-athaphand and P.
Supaphol, Adv. Mater. Res. 55 (2008) p. 625-628
[3] B. Paosawatyanyong, T. Supasai, V. Pavarajarn, and S.K. Hodak,
Intern. Polymer Process. 23(2) (2008) p. 135–139
[4] S.K. Hodak, T. Supasai, B. Paosawatyanyong, K. Kamlangkla,
and V. Pavarajarn, Appl. Surf. Sci. 254 (2008) p. 4744–4749
[5] K. Kamlangkla, B. Paosawatyanyong, V. Pavarajarn and S.K.
Hodak, Plasma Process. Polymer. (2009) under minor revision

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 Thank You

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 PET

5mm

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 Silk

5mm

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 XPS of PET

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 XPS of Silk

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 XPS of Cotton

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 SEM of Cotton

A-Control, B- 0.005 torr, C- 0.05 torr, D- 0.5 torr

A B

D
C

IWPDA 2009 2009