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area we work in 0
0 5 10
Year (from 1990)
15
35-50 nm
Grand challenge
Architecture and hierarchically arrange complex functional
nanoscale objects in “streets”, “suburbs”, and “cities” and
then reconnect them at the expected density of integration!
Electronic Photonic
Bio-
Incident light
Ag Islands
Amorphous
material
insulator
Si
Scientific approach: “Architecture” – Order –
Make uniform – Connect
Extremely difficult to do for very small
nanostructures (e.g., QDs)
Uncontrollable behaviour …
REASON:
Non-equilibrium Nano-
architectronics: APPROACH
Operating under far from equilibrium
conditions [using the laws of kinetics]
Energy, W 0
0.025 eV 2 eV
• Electrons not in thermal equilibrium with the ions or neutrals
• High Te dissociates gas
• Low TG and T+ protects substrates
• Negative charge on surfaces protects them from high 10
electron energy
MORE UNIQUE FEATURES
Te >> Ti > Tn Nn >> Ni ~ Ne
Higher complexity system – good for self-organization
(more effective driving forces)
Electric fields
Long-range Coulomb interactions
Polarization interactions
Isotropic vs anisotropic pressure PLASMA – COMMON
Non-equilibrium cooling/heating ) INDUSTRIAL TOOL
Surface stresses due to ion bombardment
Charge, termination etc. – control of surface energy
Virtually unlimited choice of BUs and WUs
Unusual chemical reactivity – plasma etching
So, what can the plasma do for nanotech?
FOR STARTERS: CNTs DISCOVERED
IN A PLASMA
Unique vertical alignment of CNTs! Plasma
route
Neutral
route
http://www.nano-lab.com/nanotube-image.html
Z. Ren et al Science 1998: vol. 282. no. 5391, pp. 1105 - 1107 .
Plasma (nano)etching – common industrial process!
PPAP 4,
612 (2007)
Highly-unusual metastable nanomaterials and nanophases
Ie+Ii Ie+Ii=0
ffloat
Us
NON-Equilibrium heating and stress
eU s 3 / 4 3 / 4
T ,
kb
Substrate heating due
to ion flux, φ [ML/s]
Effective H-termination
T. Hawa, M. R. Zachariah,
J. Phys. Chem. C 112,
14796 (2008)
Tailoring Si nanocones and nano-
pyramids in Ar + H2 plasma
(S. Y. Huang, S. Xu, I. Levchenko,
K. Ostrikov, 2009)
Si (100) Si (111)
PV – collaboration with PSAC NIE/NTU [S. Xu et al.]
What does this mean for PV solar cells?
Pseudo Light IV curve w ithout the effect of Rs Pseudo Light IV curve w ithout the effect of Rs
Pseudo Light IV curve w ithout the effect of Rs
0.04
0.035
Voc= 116 mV 0.009
Voc= 347 mV
0.04
0.035
0.019 Voc= 453 mV
0.04 0.019
0.035
Power Density (W/cm2)
0.03
Current (A/cm 2)
Current (A/cm 2)
0.025 0.025 0.025
Ar : H2=1 : 3; Ar : H2 = 1 : 3;
Ar : H2 = 9 : 1; Pin = 2.0 kW;
Pin =1.5 kW;
Pin= 2.0 kW; T = 300K, T = 300 K; t=30min;
T = 300 K; t =30 min;
t=30 min; Vb=0. Vb= - 50V
Vb= - 50V
Tailoring iron oxide nanowires and nanobelts [U. Cvelbar, K.
Ostrikov, Crystal Growth Design 8, 4347 (2008)]
Challenge: controlling nanostructure shapes
Solution: control by electric conditions on the surface
[APL 94, 211502 (2009)]
Tailoring microplasma nanofabrication: from nanostructures to
nanoarchitectures [Mariotti & Ostrikov, J. Phys D 42, 092002 (2009)]
II. ARRANGING Predicting nucleation sites
[Levchenko, Cvelbar, Ostrikov (June
2009), submitted to APL]
Self-organization of Ni/Si nanodots under
plasma exposure [APL 93, 183102 (2008)]
Simultaneous Ni catalyst saturation [I. Levchenko and
K. Ostrikov, Appl. Phys. Lett. 92 (2008)]
Sensors Bio-implants
Nano-
Advanced Integrated
Plasma devices
materials circuitry Nanotools
medicine
Electrochem. Coatings Lasers
Environmental
batteries Plasmonic
remediation
structures
LEDs Chemical Solar cells Drug/gene
synthesis delivery
Catalysis Biomarkers
Applications: some examples
“Self-organised”
Nanoelectronics
GAS SENSORS
BIOIMPLANTS
E-mail: Kostya.Ostrikov@csiro.au
PV – collaboration with PSAC NIE/NTU [S. Xu et al.]
Plasmonic arrays
TCO
µc-Si
200oC
Cryst phase
Amorph phase
300oC
Ar plasma (~10s)
Big challenges:
1) understanding ion-CNT
interactions
2) How to make it precise and
“gentle”?
Superhydrophobic a-C/CNT composites via ion bombardment
[Han, Tay, Shakerzadeh, Ostrikov, APL 94, 223106 (2009)]
CA ~
150 – 170o
Energetic (~1 kV) ions are focused by the CNTs, push the Ni catalyst particle
down the channel and then create a-C “caps”. Water droplets are suspended
and do not fall down the inter-CNT gaps. Array parameters do matter!
Plasma exposure of CNTs can even convert them
into diamond – caution and understanding needed!
But how to
select
any particular
chirality?
Solution: grow thinner SWCNTs much faster than others!
NEUTRAL CVD
PECVD PECVD
PECVD
NEUTRAL CVD
Towards epitaxial graphene
High-pressure Ar
atmosphere
Si sublimates leaving
exfoliated graphene behind
2)
3)
4)
5)
JSAP/NEDO Roadmap:Plasma Process Technology
2010 2020 2030 2040
Products, Application
Hi-Efficient Manufac. Tool 1 Atom-Accurate Manufac. Tool Self Assemble Manufac. Tool
Development
Top-down Process
Principle of Species Generation Control Nano, μ - m scale, Lo - Hi Pressure, Gas/Liquid/Solid(Surface), Phase mix
Research
Principle of Surface Reaction 1 Atom/Molecule Control Control of Functional Unit Organic/Bio Material
Monochroic Flux Vertical/Lateral Atomically-controlled Depo/Etch Bio Molecular Manipulation
Seeds
Bottom-Up Process
Principle of Selective Reaction/Self-Assemble Clarify & Realize of No-defect / Ultra Hi-Speed reaction
Ultimate Controlled Beam Process for Defect Self-healing
Perfect No-Defect Hi-Speed Self- Synergic Reaction in Large area
Common Basic Technology Assembled films / Materials
Diagnostics Ultimate precise No Disturb. 3D Flash Diag. Nano struct./Elec.Charact. Diag. Prognostic Diag.
Learning・Adaptive
Z
Interactive type software
control software
Rule mining (Estimation for law of physics & chemistry via simulation)
CMOS Miniaturization
Model for process control
Precise <±1.0nm以下 Prediction・simulation
±3.0nm ±2.0nm Low damage
etching (Lower limitation)
Fundamental database Tool monitoring
(Crosssection, Reactivity,…)
Large area 675mmΦ
300mmΦ 450mmΦ Large wafer Very Edge control
Real-time monitoring
Co NPs
DLC
Solar cells: low dimensional single junction
Plasma
p-(n)-type Si
E
p-type Si p-type Si p-type Si substrate
substrate substrate
Size, density,
and arrangement
Akimov, Koh, Ostrikov,
of metal NPs are
Optics Express 17,
VERY important!
10195 (2009).
Nuclear fusion device (DPF) for making ZnO nanoparticles
100% made of ions and featuring room-temp PL !!!
[a]
28
600
24
500 20
Jsc (mA/cm )
Voc (mV)
400 16
300 12
2
8
200
4
100
0
2007 2008 2009
Year