Professional Documents
Culture Documents
Ali E. Abdou
Department of Mechanical and Nuclear Engineering
Manhattan, KS
USA
IWPDA2009, Singapore
Poor Collisionless Trapped Particle Confinement
is a Property of Conventional Stellarators
150 0.5 30
180 0
210 330
240 300
270
3 600
HXR (keV)
2.5 400
2
1.5 200
1
0
0.5
0 -200
0.78 0.8 0.82 0.84 0.86 0.88 0.9
Time (seconds)
0 0.5 1 1.5 2 2.5
<ne> 1018 (m-3)
Microwave Absorption in QHS Hard X-Ray Density Variation for QHS
1.2 1600
Microwave Diode
1 Ray Tracing
1400
HXR (Counts)
1200
0.8
1000
P/Pin
0.6 800
0.4
600
400
0.2
200
0 0
0 1 2 3 4 0.0 0.2 0.4 0.6 0.8
<ne>*10 -12 (cm-3) <ne > 1018 (m-3)
PHA System based on CdZnTe Detector is used to
Study the Hard X-ray Emission in HSX
E = 398V - 0.541
500
E = 198.68V + 0.396
keV .
400
300 Software based pulse high
200 analysis system is used to
100
Gain = 10 Gain = 25 Gain = 50 analyze the hard x-rays
0
0.0 0.5 1.0 1.5 2.0 2.5 3.0 3.5
Pulse Height, H (Volts)
HSX has the Flexibility to Operate with/without Quasi-
Helical Symmetry in One Machine
QHS Mirror
Red=High Field Red=High Field
Blue=Low Field Blue=Low Field
90 1 90 1 90 1
120 60 120 60 120 60
0.5 0.5 150 0.5 30
150 30 150 30
800
QHS 1000 Mirror
800
600
HXR (keV)
600
HXR (keV)
400
400
200
200
0
0
-200 -200
0.78 0.8 0.82 0.84 0.86 0.88 0.9 0.78 0.8 0.82 0.84 0.86 0.88 0.9
Time (seconds) Time (seconds)
11 -3
HXR Signal in AntiMirror at ne ~ 4x10 cm
Intense hard x-ray signal is 1200
1000 AntiMirror
detected at low plasma
800
density (~ 4x1011 cm-3) in HXR (keV)
600
QHS compared to Mirror 400
and AntiMirror. 200
dN/dE (Counts)_
1200 Mirror
Mirror
HXR (Counts)
100
1000 T~ 176 keV
800
600 10
400 T~52 keV
200
0 1
0.0 0.1 0.2 0.3 0.4 0.5 0.6 0 200 400 600 800 1000
18 -3
<ne > 10 m
Photon Energy (keV)
Density of superthermal electrons is higher in QHS than in
Mirror.
Electrons are heated to higher energies in QHS than in Mirror.
The antiMirror case has a very small signal.
Superthermal electron characteristic energy is higher in QHS
compared to Mirror
High energy particle confinement is seven times better in
QHS than in Mirror
1400
1200 QHS <ne> ~ 4x1011 cm-3
HXR Signal (Counts)
1000
800
600
400
~ 7ms
200 Mirror ~ 1ms
0
800 820 840 860 880 900
Time (msec)
(sec-1)
12 -3
e-n
4 ne =1x10 cm n =1x 12
10
10 11 -3
n cm -3
n =1x10 cm
e-n
e n =1x 11
10
n
cm -3
, ,
2 e-e n =1x 10
10 10
e-i
n
cm -3
e-e
0
10
3..123
3 101515
123xx10
eenn (log1010 00..792
(log 792))11
-2
10 0 2 4 6
10 10 E (eV) 10 10
Dt = 0.1 msec
QHS ~ 6.7 msec (QHS Dx ~ 6 mm)
Mirror ~ 0.1 msec (Mirror Dx ~ 45 mm)
1 R. K. Janev et. al., “Elementary Processes in Hydrogen-Helium Plasmas”, Springer-Verlag, (1987)
Conclusions
HSX is the world’s first stellarator built with quasi-
symmetry
Super thermal electrons are generated at low plasma
density during ECRH discharges in HSX
Hard x-ray is more intense and more energetic in QHS
configurations compared to Mirror and AntiMirror
Single particle heating calculations shows:
No difference in single transit heating between configurations
Guiding center drift orbit model shows effects of orbit
topology:
QHS has higher multiple-transit heating rate, smaller orbit
width
Neutrals play a role in super thermal electron confinement
in HSX
What Causes the HXR difference between Magnetic
Configurations?
w2
2 PR B B B , k
0.5
Eo , w B w E
QHS 2 ext
0.45 w
Mirror
Magnetic Axis and the Position of the ECRH Antena
0.4
-100 -50 0 50 100
(degree) 1
B along Magnetic Field Line
0.5025
0.5 Z'
0.502
Z
B, (Tesla)
0.5015 AntiMirror 0
Mirror X' O'
0.501 QHS (1.445,0,0)
-0.5
Resonance Point -2
0.5005 Y'
0 2
X 0 1
0.5 2 -2 -1
-2 -1 0 1 2 Y
(degree)
Electron Can Gain or Lose Energy During Single Transit
through the Microwave Heating Zone
DW in QHS for W = 0.4 keV, a = 45, = 0
0
DW in QHS for W
ini
= 0.4 keV a = 45o, = 145o
0.5 ini 0.41
Initial electron Position
0.48 0.4
0.46 0.39
W (keV)
W (keV)
DW Energy Gain
0.44 0.38
DW Energy Loss
0.42 Final electron Position 0.37
0.4 0.36
Initial electron Position Final electron Position
0.38 0.35
0 0.2 0.4 0.6 0.8 1 0 0.2 0.4 0.6 0.8 1
Time (sec) -8 Time (sec) -8
x 10 x 10
If a distribution of 0
800 50
600 40
400 30
200
QHS
Mirror
20 DW W
AntiMirror 10
0
0
0 20 40 60 80 100 120 140
Microwave Power (kW) 0 100 200 300 400 500
Wperp (eV)
<DW> for QHS, Mirror and AntiMirror Wini=0.5 keV, a=75
o
450
e2 E 2 2
400
350
QHS DW J 1 (k L ) i2
Mirror
me
<DW> (eV)
300 AntiMirror
250 2
N W r
200 DW E 2 f ( , a )
150 W|| a
100
50 DW N 2
0
*Y. Tatematsu et. al., Physics of Plasmas
0 0.2 0.4 0.6 0.8 1 1.2 1.4
4(8), 2972, 1997
Nperp
How do Particle Orbits Affect Heating?
|B|
1.0E+10 r/a = 0.05
8.0E+09
r/a = 0.075
6.0E+09
r/a = 0.1
Heating Zone
Vacuum
Vessel 4.0E+09
2.0E+09
0.0E+00
0 10 20 30 40 50 60 70 80
Pitch Angle (Degree)
QHS has Good Orbits Compared to Mirror and AntiMirror
100 eV electrons with 85o pitch angle, launched at = 0, q = 0, r/a = 0.05 and t = 0.1 msec
-14 Heating Rates in Different Configurations
2.5 x 10
QHS
2
1.5 AntiMirror
(AU)
Mirror
1
0.5
0
0 0.2 0.4 0.6 0.8 1 1.2
Time (sec) -4
x 10
90 1 90 1 90 1
120 60 120 60 120 60
0.5 150 0.5 30 0.5
150 30 150 30
180 0
210 330
Heating Zone
240 300
270
Resonance zone crossing probability
0.80 0.80
phi = 0 phi = 0
0.60 0.60
phi = pi/8 phi = pi/8
0.40 phi = pi/4 0.40 phi = pi/4
phi = pi/2 phi = pi/2
0.20 QHS 0.20
phi = pi phi = pi
0.00 0.00
0 20 40 60 80 100 0 20 40 60 80 100
Pitch Angle, a (degree) Pitch Angle, a (degree)
B along Magnetic Field Line at r/a = 0.05
0.65 1.20
r/a = 0.05
AntiMirror
0.80
B, (Tesla)
0.55 phi = 0
0.60 phi = pi/8
0.5 QHS
0.40 phi = pi/4
Mirror phi = pi/2
0.45
0.20 phi = pi
Heating Zone
0.4 0.00
-100 -50 0 50 100
(degree) 0 20 40 60 80 100
Pitch Angle, a (degree)
Net Heating Rate is Largest in QHS
Resonance Time Fraction in 0.1 msec Electron Final Energy in 0.1 msec
4.0E-04 9.E+04
QHS
QHS
AntiMirror
3.0E-04 7.E+04 AntiMirror
2.5E-04
6.E+04
Fraction
5.E+04
2.0E-04
4.E+04
1.5E-04
3.E+04
1.0E-04
2.E+04
5.0E-05 1.E+04
0.0E+00 0.E+00
0 20 40 60 80 100 0 20 40 60 80 100
Pitch Angle, a (degree) Pitch Angle, a (degree)
0.4
AntiMirror particles are trapped in
the heating zone, but have very large 0.2
orbits 0.0
0 20 40 60 80 100
Pitch Angle, a (degree)