High resolution X-ray spectroscopy

of plasma focus: equipment,

modeling of results
E.O.Baronova, V.V.Vikhrev, M.M.Stepanenko,
A.M.Stepanenko
RRC Kurchatov Institute, 123182,
Moscow, Russia
WHY TO MEASURE LINE EMISSION
1. Characterization of the source for different
applications, including nuclear fusion,
lithography, etc.
2. Plasma diagnostics : to estimate plasma
size, temperature, density, distribution of
ionization stages, electron beam energy, ion
beam energy, strength and direction of
electromagnetic fields, etc.
 HOW TO MEASURE LINE EMISSION
In reflection, E<10 keV In transmission, E>8 keV
A1
A2
Flat crystal  

K  
Convex crystal
2R
De Broglie scheme
B2
B1
A
K (a)
 O  E
D
Concave crystal Concave crystal
2R B2 Johan scheme Cauchois-Johann
A R scheme
B1

(a)
 X-ray spectrometers

L<2m L=0.5 m
W=30 kg W=8 kg

Large spectrometer with 2 channels

Compact for Тi measurements

L=0.5 m L<0.3 m
W=10 kg W=1 kg

Supercompact Cauchois
UV,EUV, X-Ray spectrometer
for Hard X-rays, E>8 keV
COMPACT AND SUPER COMPACT
DE BROGLIE X-RAY SPECTROMETERS

1. 3crystal de Broglie spec.

equipped by MCP, will be
reported on July 3d.
110 mm

30 mm

2.

50mm
 Spectrometer for EUV, visible and X-Ray emission
Gratings for
EUV and
visible, Bragg
Hitachi Co grating
crystals for soft
and hard X-
MCP rays.

№1,
 = 21°- 60°,
Holografic grating G=2400gr/mm,

№2, 
Capillary
Капилляр для калибровки,  =11°- 20°,
юстировки, литографии
G=4200 gr/mm
 Optical scheme of spectrometer

Transmission regime Reflection regime

of operation-crystals of operation-crystals, gratings

Cauchois -Johansson crystal works in both transmission and reflection

1.5-400 keV - total energy range10(-1)0 cut works in reflection,energy range 1.5-13.2 keV,
11(-2)0 and 0001 cuts work in transmission, 10-400 keV
 Dispersive elements: gratings for EUV & UV,
crystals for X-rays
Small crystals
for microscopy • Large spherical
crystals

High refl
graphite
• Cauchois-
Johansson crystal

• Spherical grating,
Hitachi Co

• Johansson
spherical crystal
on optical contact
 Spectral resolution of device in various regimes
Reflection regime

(/) total = 1.7 *10-4

Transmission regime

(/) 14(-5)0 = 4* 10-4 Cu, first order of reflection

(/) 13(-4)0 = 1.7* 10-3 Mo, first order of reflection
(/) 20(-2)0 = 5*10-3 Mo, second order of reflection
Hot spots in plasma focus, filled by Ar
number of hot spots in one shot 1-10
ArXVII spectra, single shot, many hot spots
Modeling of ArXVII in dense plasma, I=500 kA

Te = 900 eV,
Ne = 8*1019 cm-3
 Spectra from each hot spot

Plasma image X-ray spectra

in X-rays
Parameters of hot spots are distributed
chaotically
 Line emission properties
• Anisotropic
• Time-dependent
• Inhomogeneous in
space
• Polarized

To create a model, which describes

dynamics of plasma parameters
 Requirements to the model

1. Should describe phenomena

adequately
2. Should be simple
3. Should use small computer time
4. Possibility to compare with
experimental results
Structure of the Model
 Plasma dynamics in Z-pinch neck,
model was created by Pr. V.Vikhrev in 1976, Kurchatov Institute
Plasma electron temperature T is determined by Bennet equation:
I2 I – discharge current,
T 2 N - number of particles in the unit pinch length in
4c N
the neck
Plasma outflow from the neck:
dN N  - time for plasma outflow from the neck,
  = h/2vs , h - height of the neck, h  20r ,
dt  vs - sound velocity in the neck.

Thermal energy balance in the neck:

d (3NT ) 5 NT B 2 dr
 r  QJ  Qrad
dt  4 dt
2 I – strength of magnetic field in the neck
B
cr
r - radius of plasma column in the neck
QJ = (I-Ibeam )E –> Joule heating
 Electron beam generation in Z-pinch discharges
Electron beam generation is due to ‘run-away’ effect, balance equation for number
of electrons is as follows:
dI beam GNehvb I beam Ibeam – electron beam current;
  vb vb -velocity of run-away electrons
dt g h m vb2 /2 = E* h e.
Generation function for ‘run-away ‘electrons, from Gurevitch :

 I  I beam
Strength of electric field along Z-pinch: E g
S

= ne2/me(ei + eff),
ei - electron-ion collision frequency,
eff frequency of collisions of electrons with plasma oscillations,
S = r2 -cross section of plasma column in the neck region.
Dynamics of plasma parameters, discharge current
I=500kA,

Plasma size
0.2-0.7mm
Line emission in time, I=500 kA

W
Te, keV
Ne/1019
I beam = 20 kA, R,cm
Er = 2 MV/cm, H-like
Ez= 1 MV/cm, Ibeam,kA
possibility to
estimate maximal
Er, MV/cm
plasma parameters
Ez, MV/cm
 Comparison with experiment
Jakubowski, Sadowski, Baronova

Electron beam duration,

Delay time of electron beam,
Duration of line emission,
Plasma size are predicted by the model.
10 ns later
 X-ray spectra. 200
200 kA
kA

Current 150 kA-3 MA.

500 kA
FeXXV Fe K alpha
150 kA
150 kA

200200
kA kA

Current increases
3 MA
=>
the degree of
360 kA
anisotropy
of EVDF decreases

Angara-5
 Plasma dynamics, current 250 kA, 500 kA, 1MA
250 kA 500 kA 1000 kA
Ib,kA
Ne/e19

Te,keV
E,MV/cm

r,cm
U,MV

1. Relative number of runaway electrons are increased with decreasing the discharge current.
2.Strength of electric field is increased with increasing the discharge current
3. Time duration of electron beam& electric fields are increased with decreasing the discharge current.
4. The influence of electron beam on He-like line intensities is decreased
with increasing the discharge current, it is not essential even at 500 kA
 Conclusion.
1.Equipment is designed and tested on various
pinch machines
2. Model is suggested to describe dynamics of
plasma parameters. Model is able to predict
maximal temperature, density of plasma, etc.