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[Adapted from Rabaeys Digital Integrated Circuits, 2002, J. Rabaey et al.; MJIrwin PSU 2002]
VLSI Design: L4 Static CMOS Inverter.1 Chau/Cichy UCSD ECE
DEVICE
G S n+ D n+
Drain n+
Field-Oxide (SiO2)
CMOS Inverter:
A First Look
VDD
Vin CL
Vout
CMOS Inverter:
Steady State Response
VDD VDD
Rp Vout = 1 Rn Vout = 0
Vin = 0
VLSI Design: L4 Static CMOS Inverter.5
Vin = V DD
Chau/Cichy UCSD ECE
CMOS Properties
q
Logic levels not dependent upon the relative device sizes transistors can be minimum size ratioless
Always a path to Vdd or GND in steady state low output impedance (output resistance in k range) large fan-out (albeit with degraded performance) Extremely high input resistance (gate of MOS transistor is near perfect insulator) nearly zero steady-state input current No direct path steady-state between power and ground no static power dissipation Propagation delay function of load capacitance and resistance of transistors
Chau/Cichy UCSD ECE
ID (A)
2.5
VDS (V) NMOS transistor, 0.25um, Ld = 0.25um, W/L = 1.5, VDD = 2.5V, VT = 0.4V
VLSI Design: L4 Static CMOS Inverter.7
VDS (V)
-1
0 0
VGS = -2.5V
-1 X 10-4
ID (A)
IDSp = -IDSn VGSn = Vin ; VGSp = Vin - VDD VDSn = Vout ; VDSp = Vout - VDD
Vout
2.5
Vin = 0V
X 10-4
2
Vin = 0.5V 1.5 Vin = 2.0V
IDn (A)
Vin = 1.0V 1
Vin = 2V 0.5
Vin = 1.5V Vin = 2.0V
Vin = 1.5V
Vin = 1V
Vin = 1.5V
Vin = 0.5V
Vin = 1.0V Vin = 0.5V
Vin = 2.5V 0
0.25um, W/Ln = 1.5, W/Lp = 4.5, VDD = 2.5V, VTn = 0.4V, VTp = -0.4V
VLSI Design: L4 Static CMOS Inverter.10 Chau/Cichy UCSD ECE
2.5 2
Vout (V)
Vin (V)
VLSI Design: L4 Static CMOS Inverter.11 Chau/Cichy UCSD ECE
2.5 2
Vout (V)
1.5
2.5
Vin (V)
VLSI Design: L4 Static CMOS Inverter.12 Chau/Cichy UCSD ECE
CMOS Inverter:
Switch Model of Dynamic Behavior
VDD VDD
Rp Vout CL CL Rn Vout
Vin = 0
Vin = V DD
CMOS Inverter:
Switch Model of Dynamic Behavior
VDD VDD
Rp Vout CL CL Rn Vout
Vin = V DD
When designing static CMOS circuits, balance the driving strengths of the transistors by making the PMOS section wider than the NMOS section to
l l
Switching Threshold
q
VM where Vin = Vout (both PMOS and NMOS in saturation since VDS = V GS) VM rVDD/(1 + r) where r = kpVDSATp/knVDSATn
Switching threshold set by the ratio r, which compares the relative driving strengths of the PMOS and NMOS transistors
Want VM = VDD/2 (to have comparable high and low noise margins), so want r 1 (W/L)p
=
knVDSATn(VM-VTn-VDSATn/2)
(W/L)n kpVDSATp(VDD-VM+VTp+VDSATp/2)
VLSI Design: L4 Static CMOS Inverter.16 Chau/Cichy UCSD ECE
In our generic 0.25 micron CMOS process, using the process parameters from slide L03.25, a VDD = 2.5V, and a minimum size NMOS device ((W/L)n of 1.5) NMOS PMOS VT0(V) 0.43 -0.4 (V0.5) 0.4 -0.4 VDSAT(V ) 0.63 -1 k(A/V2) 115 x 10-6 -30 x 10-6 (V-1) 0.06 -0.1
(W/L)p (W/L)n
In our generic 0.25 micron CMOS process, using the process parameters from slide L03.25, a VDD = 2.5V, and a minimum size NMOS device ((W/L)n of 1.5) NMOS PMOS VT0(V) 0.43 -0.4 (V0.5) 0.4 -0.4 VDSAT(V ) 0.63 -1 k(A/V2) 115 x 10-6 -30 x 10-6 (V-1) 0.06 -0.1
(W/L)n
-30 x
10-6
-1.0
= 3.5
Simulated Inverter VM
1.5 1.4 1.3 1.2
VM (V)
setting the ratio to 3, 2.5 and 2 gives VMs of 1.22V, 1.18V, and 1.13V
l
(W/L)p/(W/L)n
Note: x-axis is semilog
VLSI Design: L4 Static CMOS Inverter.19
By definition, VIH and VIL are where dVout/dVin = -1 (= gain) NMH = VDD - VIH NML = VIL - GND
VM
Vout
VOL = GND0
2.5 2
Vout (V)
1.5 1
0.5 0
Vin (V)
Gain Determinates
Vin
Gain is a strong function of the slopes of the currents in the saturation region, for Vin = VM
1.5 2
0 0 -2 -4 -6
0.5
gain
(1+r) g ---------------------------------(VM-VTn-VDSATn/2)(n - p ) Determined by technology parameters, especially channel length modulation (). Only designer influence through supply voltage and VM (transistor sizing).
Chau/Cichy UCSD ECE
Vout (V)
Vin (V)
lProcess variations (mostly) cause a shift in the switching threshold
VLSI Design: L4 Static CMOS Inverter.23 Chau/Cichy UCSD ECE
2.5 2
0.15
Vout (V)
Vout (V)
0.1
0.05
2.5
Gain=-1
0 0 0.05 0.1 0.15 0.2
Vin (V)
Device threshold voltages are kept (virtually) constant
VLSI Design: L4 Static CMOS Inverter.24
Vin (V)
Device threshold voltages are kept (virtually) constant
Chau/Cichy UCSD ECE
pdiff PMOS (4/.24 = 16/1) NMOS (2/.24 = 8/1) metal1-diff via ndiff GND metal2-metal1 via
Next lecture
l
IC manufacturing
- Reading assignment Rabaey, et al, 2.1-2.3
Reminders
l l l
HW1 due September 10th (next lecture!) Project Title due September 12th (one week) Evening midterm exam scheduled
- Wednesday, October 10th from 8:15 to 10:15pm in 260 Willard - Only one midterm conflict filed for so far