OBJECTIVE AND RELEVANCE The objective of the course is to make students aware of implementation of nanotechnology in the field of electronics.

Electronic devices manufacturing, fabrication are the areas in which the nanoscale is implemented. There are extremely electrical, magnetic, optical, thermal and mechanical properties will change at this nanoscale device implementation. Nanotechnology is the present global technologies where lot of research groups are working in different domain of electronics area. The future devices will bring tremendous changes in applications. Thus this is the most relevant for electronics engineers to learn this nanotechnology SCOPE The electronic devices depend on Moores law and scaling of semiconducting devices, the design and fabrication of advanced devices became challenge for scientist and engineers. The miniaturization of devices requires the knowledge of nanotechnology. This course will make students to understand the challenges in implementation of fast and advanced devices. PRE REQUISITES Basic knowledge of semiconducting devices, fabrication, Nano materials properties and their applications are required. Quantum mechanics and solid state fundamentals are also essential. SYLLABUS JNTU UNIT I OBJECTIVE The purpose and importance of nano structures are discussed here. The properties are important to know, how the characteristics will change when a device is sized to scaling. SYLLABUS Importance of Nanoscale, Nanostructure types, Electronic, Magnetic, Optical properties of Nanomaterials. Top-Down and Bottom-Up approach in nanostructures. INTRODUCTION TO NANO TECHNOLGY

UNIT II OBJECTIVE

QUANTUM MECHANICAL PHENOMENA IN NANO STRUCTURES

The nano structures gives different confinements through Quantum wires,

Quantum

wells and Quantum dots. This basic quantum approach of nano devices gives insight to understand the user to make relevant applications.

SYLLABUS Quantum confinement of electrons in semiconductor nanostructures, One dimensional confinement(Quantum Wires), Two dimensional confinements(Quantum Wells)Three

dimensional confinements(Quantum Dots). UNIT III OBJECTIVE This outstanding research on Carbon Nano Tubes are illustrated along with their synthesis, characteristics for different applications. Different forms of carbon-graphene has created a new era in high speed semiconducting nano devices with high mobility than micro electronic devices SYLLABUS Carbon Nano Tubes(CNTs), Fullerences, C60, C80 and C240 Nano structures. Properties of Mechanical Optical Electrical. Applications of nanostructures. UNIT IV OBJECTIVE The fabrication principles are discussed at nano level. Fabrication methods are compulsory to FABRICATON OF NANOMATARIALS CARBON NANO STRUCTURES

understand to know the structural behavior and their applications. These fabrication principles will give awareness on VLSI technology SYLLABUS Physical Methods: Inert gas consideration, Arc discharge, RF Plasma, Plasma Arc technique, Ion Sputtering, Laser Ablation, Laser Pyrolysis, Molecular Beam Epitaxy, Chemical Vapour Deposition Method. UNIT V OBJECTIVE These techniques are advanced to study the formation of the internal structures, surface alligment, physical, chemical, mechanical and electrical properties. Different techniques will analyse the different charactaristics of structural devices. SYLLABUS Scanning probe techniques - AFM, MFM, STM, SEM, TEM, XRD. NANO SCALE CHARACTERIZATION TECHNIQUES

UNIT VI OBJECTIVE

NANODEVICES AND NANOMEDICINE

Nanotechnology explained the importance of nanomedicine at tissue, DNA, shell level treatment. After starring this era of nanomedicine, scientist could able to control the biology at DNA level. This is a revolunary advancement for the benefit of human kind. SYLLABUS Lab on chip for bioanalysis, Core/Shell Nanoparticles in drug delivery systems. Site specific and targeted drug delivery. Cancer treatment and Bone Tissue treatment. UNIT VII OBJECTIVE Since the characteristics will exhibit different phenomena at nano level compared to micro level, the devices will exhibit different electrical properties. Since understanding of single electron and atom level became easy, the controlling of the device at molecular level became significant study. SYLLABUS Resonant Tunneling structures, Single Electro Tunneling, Single Electron Transistors, coulomb blockade, Gaint Magneto Resistance, Tunneling Magneto Resistance. UNIT VIII OBJECTIVE These fabrication techniques are essentials to prepare nanodevice with proper controlling of concentration for different characterizatrion and applications. Lithigraphy becomes very complicated technique at nano level of implementation. SYLLABUS E-beam Lithography and SEM based nanolithography and nanomanipulation, Ion Bean LithogrpahOxidation and Metallization. Mask and its application. Deep UV Lithography, X-ray based Lithography. SYLLABUS GATE Not applicable SYLLABUS IES Not applicable NANOLITHOGRAPHY AND NANOMANIPULATION NANO AND MOLECULAR ELECTRONICS

TEXT BOOKS AND REFERENCES T1. Title Author ISBN Publishers T2. Title Author ISBN Publishers REFERENCES R1. Title Author ISBN Publishers R2. Title Author ISBN Publishers R3. Title Author ISBN Publishers R4. Title Author ISBN Publishers R5. Title Author ISBN Publishers : : : : NANO : THE ESSENTIALS T. Pradeep. isbn-13: 978-0-07-061788-9 / isbn-10: 0-07-061788-0. Tata McGraw-hill Education Pvt.Ltd. : : : : PRINCIPLES OF NANO TECHNOLOGY N. Phani Kumar. ISBN:978-81-8371-333-7(NEW-2ND Edition). Or 987 81 8371 1777 Scietech Publications

: HAND BOOK NANO TECHNOLOGY : Bharat.Bhushan : : Springer international

: NANO SCALE SCIENCE AND TECHNOLOGY : Robert kelsall, Ian W. Hamley, Mark Geoghegon. : isbn-13:978-0-470-85086-2 / isbn-10:0-470-85086-8 / isbn: 0-470-85086-8. : John Wiley & sons International. : : : : : : : : : : : : NANO MATERIALS A.K. Bandyopadhyay 81 224 2009 5. New Age International. NANOTECHNOLOGY an Introduction to Nanostructuring Techniques Michael Kohler, Wolfgang Fritzsche 3 527 30750 8 Wiley-VCH verlag international INTRODUCTION TO NANOTECHNOLOGY Charles.P.Poole,Jr, Frank.J.Owens 0 471 07935 9. Wiley Interscinece A John wiley & sons Publications

WEB SITES 1.http://www.southalabama.edu/engineering/ece/faculty/akhan/Courses/Nanotechnology%20 - summer05/EE530.htm 2. http://biomedikal.in/2010/01/lecture-notes-on-nanotechnology-from-mit/ 3. http://www.phys.sinica.edu.tw/TIGP-NANO/ 4. http://web-files.ait.dtu.dk/bruus/TMF/publications/books/nnote.pdf 5. www.ece.ubc.ca/~pulfrey/nano_beyond_Si_uni.pdf 6. http://ocw.mit.edu/courses/electrical-engineering-and-computer-science/6-701-introductionto-nanoelectronics-spring-2010/readings/MIT6_701S10_notes.pdf

EXPERT DETAILS INTERNATIONAL 1. Name Designation Department Office Address Phone No E-mail ID Name Designation Department Office Address Phone No E-mail ID Name Designation Department Office Address Phone No E-mail ID : ; : : : : : ; : : : : : ; : : : : Prof.Mark Horowitz Professor Electrical Engineering Standford University, Packard 175, USA 06507235782 horowitz@standford.edu Prof. Alan Windle Professor and director of research Material science and nanotecnology University of Cambridge, UK +4401223334321 ahw1@cam.ac.uk Prof.Gabriel Bester Professor MaxPlanck institute for Solid state Research Heisenbergstrabe1,D-70569, Stuttgart,Germany +4907116891758/1702 G.Bester@fkf.mpg.de

2.

3.

NATIONAL 1. Name Designation Department Office Address : ; : : Prof.V.Ramagopal Rao Professor Electrical department/Center for nanoelectronics IIT Bombay, powai, Mumbai

Phone No E-mail ID 2. Name Designation Department Office Address Phone No E-mail ID Name Designation Department Office Address Phone No E-mail ID Name Designation Department Office Address Phone No E-mail ID

: : : ; : : : : : ; : : : : : ; : : : :

02225767456/8456 rrao@ee.iitb.ac.in prof.Anil.Kothanthriyal Professor Electrical department/Center for nanoelectronics IIT Bombay, powai, Mumbai 02225767438/8438 anilkg@ee.ittb.ac.in Prof.K.N.Bhat Professor ECE, Center of Electronic Design and Technolog IISC Banglore, Banglore 09900101943 knbhat@gmail.com,knbhat@ece.iisc.ernet.in Prof.S.Karmalkar Professor Electrical Engineering IIT Madras, Chennai 09444908220,04422575415 karmal@ee.iitm.ac.in

3.

4.

REGIONAL 1. Name Designation Department Office Address Phone No E-mail ID 2. Name Designation Department Office Address Phone No E-mail ID Name Designation Department Office Address Phone No E-mail ID

: ; : : : : : ; : : : : : ; : : : :

Prof.K.C.James Raju Professor University of hyderabad School of Electronics, IC Technology Lab 04023134305 kcjrsp@uohyd.ernet.in Prof.Ashudeb dutta Assistant Professor Electrical Engineering IIT Hyderabad,Hyderabad 04023016051 asudeb_dutta@iith.ac.in M.B.Srinivas Professor VLSI and Embedded Systems IIIT Hyderabad, Hyderabad 04023016042 srinivas@iith.ac.in

3.

JOURNALS 1. IEEE Journal of Nanotechnology(www.ieee.org) 2. American Journal of Nanotechnology science publication(www.thescipub.com) 3. Nanoscience and technology virtual journals in science and technology(www.vjnano.org) 4. IEEE transactions of very large scale integrated systems(www.ieee.org) 5. international journal of nanoscience and technology (www.ijnnonline.com) & (irphouse.com) 6. International journal of nanoscience technology( iopscience.iop.org) RECENT FINDINGS & DEVELOPMENTS 1. Title Author Journal Vol,Year,Pr.No Title Author Journal Vol,Year,Pr.No 3. Title Author Journal Vol,Year,Pr.No 4. Title Author Journal Vol,Year,Pr.No : : : : : : : : : : : : : : : : Ballistic resistance capacity of carbon nanotubes Kausala Mylvaganam and L C Zhang Nanotechnology journal Vol18, No.47, 28 Nov 2011 Effect of High-K gate dielectric materials on metal and silicon Gate Workfunction Yee-chiaYeo, Puskar Ramade,Tsu-Jae King, Chemming IEEE Electron Devices LettersNanotechnology journal Vol23, No.6, 6 june 2010 Spin dependent transport inferromagnetic, super conductor single electron transistor Dawei Wang, Jia G. Lu Journal of applied physics Vol.97, issue.10, may 2011 Fabrication of nanostructures using UV-based imprint technique M.Bender, Otto, Hadam, Kurz MicroElectronic Engineering Vol.53, Issue 1-4, June 2009

2.

SESSION PLAN Sl. No 1 Lecture Text / Reference No UNIT 1 : INTRODUCTION TO NANO TECHNOLOGY (9) Importance of nano scale What is nanotechnology T1-unit1: 1.1 -1.10 L1 and Nanostructure Types R1-Ch1:11,15 Overview and perspective R2-Ch1:1-3 L2 Comparision of nanoscales in nature T1-unit1: 1.1 -1.10 R1-Ch1:11,15 L3 R2-Ch1:1-3 L 4 Need for nano scale in electronics L5 3 Electronic properties of nanomaterials Effects of Nano scale systems Conductivity ballistic behavior-scatteringtunneling Electronic Structural properties Effects of Nano scale systems-Gaint Magnetic Restistance-super conducting Magnetic structures & domain formation difference & coercivity. Magnetic Structural properties Effects of Nano scale systems-wavelength changing colour-absorption Optical properties & wavelength effect Top-Down approach a.Milling b.Lithography process c.Machining-patterning-Ion beam d.steps of lithography for topdown Bottom-Up approach a. Vaopur Phase deposition b. Plasma deposition-dc glow-Magneton sputtering-vaccum deposition c.Molecular Beam Epitaxy-MOVPE d.Liquid phase method- colloidal method e. Electro deposition L 6 T1-unit1: 1.7 R2-Ch1:4-5 T1-unit1: 1.29-1.30 R1-Ch4:120-124 R2-Ch2.9.2-pg:123-124 T1-unit1: 1.28-1.29 R2-Ch2.9.3-pg:125-126 L 7 T1-unit1: 1.29 R2-Ch3.7.1-pg:177-182 T5-Ch4.3.1-pg:90-91 T1-unit1: 1.11--1.14 R2-Ch1.4.1-Pg: 32-36 Syllabus topics Sub Modules

Magnetic properties of nanomaterials

Optical properties of nanomaterials

Top-Down approach of nanostructures

L 8

Bottom-Up approach of nanostructures

T1-unit1: 1.10--1.11 R2-Ch1.4.2-Pg: 37-48 L 9

10

11

UNIT 2 : QUANTUM MECHANICAL PHENOMENA IN NANOSTRUCTURES(7) Quantum confinement of Carrier motion in bulk and nano material R2-Ch3.3-pg:138-139 L 10 electrons in semiconductor R4-Ch9-pg:226-242 Schrodinger equation energy density states L 11 nanostructures R5-Ch9-pg:226-230 Energy levels in1,2,3-dimensions One-Dimensional One dimensional quantum confinement T1-4.9-pg:4.22-4.23 confinement QUANTUM approach R2-Ch3.3.2-pg:141-142 WIRE R5-Ch9-pg:230-235 Carrier motion-quantized energy levels L 12 Energies and wave function of confinement Quantum Wire approach-fabrication Two-Dimensional Two dimensional quantum confinement T1-4.10-pg:4.23-4.24 confinement QUANTUM approach R2-Ch3.3.1-pg:139-141 L 13 WELLS R5-Ch9-pg:236-244 Energy dependency on quantum numbers L 14 Quantum Well approach-fabrication Schrdinger equation Three-Dimensional Three dimensional quantum confinement T1-3.12-pg:3.18-3.22 confinement QUANTUM approach R2-Ch3.3.4-pg:142-143 DOTS R5-Ch9-pg:245-255 Cuboid-shaped dot of 3-dimension L 15 Unrestricted carrier motion-colloidal L 16 synthesis Quantum dot approach-fabrication UNIT 3 : CARBON NANO STRUCTURES (8)

12

Carbon Nanotubes (CNTs)

CNT introduction-armchair-zigzag CNT synthesis and purification; Filling of Nanotubes-mechanism of growth Electronic-optical-properties of CNT L 17 L 18 Single wall and multi wall CNT-SWCNTMWCNT Mechanical-Physical properties & applications Fullerene buckyball Minister shapefullerene proeperties-synthesis and purification L 19 Orientational ordering Pressure effects-optical properties

R1-Ch4.1:Pg:114-116 R1-Ch4.2:Pg:117-120 T1-3.12-pg:3.18-3.22 R2-Ch3.3.4-pg:142-143 R1-Ch4.2:Pg:120-122 T1-3.12-pg:3.18-3.22 R2-Ch3.3.4-pg:142-143 R5-5.4.3:pg:117-118 T1-2.10.4-pg:2.32-2.34 T4-Ch3.3.4-pg:142-143 R1-Ch4.2:Pg:122-123 T1-3.12-pg:3.18-3.22 R2-Ch3.3.4-pg:142-143 R5-5.4.3:pg:123-124 R1-Ch3.3:Pg:94, 100-103 T1-3.12-pg:3.18-3.22;2.682.81 R2-Ch3.3.4-pg:142-143 R5-5.3.6:pg:113-125 R1-Ch3.3:Pg:100 R1-Ch3.3:Pg:101,103 R1-Ch2:Pg:15-20 T1-3.12-pg:3.18-3.22 R2-Ch3.3.4-pg:142-143 R5-5.3:pg:106-113 R1-Ch2:123 T1-3.12-pg:3.18-3.22 R2-Ch3.3.4-pg:142-143 R1-Ch2:104 T1-3.12-pg:3.18-3.22 R2-Ch3.3.4-pg:142-143 R1-Ch2:120 T1-3.12-pg:3.18-3.22 R2-Ch3.3.4-pg:142-143 R1-Ch2:124-125 T1-3.12-pg:3.18-3.22 R2-Ch3.3.4-pg:142-143 R2-Ch6-pg:132-136 R5-Ch9-pg:226-242 T1-6-pg:6.1-6.4 R2-Ch6-pg:107-109 T1-6-pg:6.6-6.9 R2-Ch6-pg:109-111 T1-6.9-pg:6.11-6.14 T4-Ch6-pg:111-113 T1-6-pg:6.1-6.4 R2-Ch6-pg: 115-119 T1-6-pg:6.11-6.17 R2-Ch6-pg: 120-123 T1-6-pg:6.19-6.27 R2-Ch6-pg: 123-129 T1-6-pg:6.27-6.39 R2-Ch6-pg: 130-131 T1-6-pg:6.43-6.46 R2-Ch6-pg: 13-139 T1-6-pg:6.48-6.56 R2-Ch6-pg:140-144

13

Fullerene

14

C60, C80 and C240 nanostructures Properties mechanical optical Electrical.

Fullerene C60, C80 and C240 structures

L 20

15

C60 Electrical, Optical, Mechanical propertie L 21 C80 Electrical, Optical, Mechanical propertie C240 Electrical, Optical, Mechanical propertie

L 22

L 23

16

Applications

17

Physical Methods Inert gas condensation

18 19 20 21 22 23 24 25

ARC discharge RF plasma Plasma ARC technique ION sputtering Laser ablation Laser Pyrolysis

CNT Applications L 24 CNT applications in different fields and areas UNIT 4 : FABRICATION OF NANOMATERIALS(8) Physical methods Working principle - approach L 25 Inert gas condensation Working principle - approach ARC discharge L 26 Working principle - approach RF plasma Working principle approach-analysis Plasma ARC technique Working principle - approach ION sputtering Working principle - approach Laser ablation Working principle - approach Laser Pyrolysis Working principle - approach Molecular Beam Epitaxy ( MBE ) Working principle - approach Chemical Vapour Deposition method ( CVD )

L 27

L 28 L 29 L 30 L 31 L 32

Molecular Beam Epitaxy ( MBE ) Chemical Vapour Deposition Method (CVD)

26 27

28

29

30

31

32

Working principle - approach Different CVD based techniques UNIT 5 : NANO SCALE CHARACTERIZATION TECHNIQUES(8) Scanning Probe techniques Scanning Probe techniques concept R1-Ch2:Pg:15-20 L 33 Working principle-analysis AFM AFM - schematic diag-constructionR1-Ch23.3:Pg:48-51 working principle R2-Ch2.5.2:pg:87-92 L 34 R5-Ch3-pg:55-58 Magnitudes of atomic forces rather than L 35 tunneling Constant height-constant force mode MFM MFM - analysis R1-Ch23.3:Pg:48-51 R2-Ch2.5.2:pg:87-92 L 36 schematic diag-construction-working principle STM STM- schematic diag-construction-working R1-Ch2.3.1:Pg:44-48 principle R2-Ch2.5.1:pg:85-87 L 37 Tunneling phenomena SEM SEM-schematic diag-construction-working R1-Ch2:Pg:21-31 principle R2-Ch2.3.4:pg:72-76 R5-Ch3-pg:51-54 L 38 Secondary electron-back scattered electronelectron beam induced-voltage contrastmagnetic contrast TEM TEM-schematic diagram- constructionR1-Ch2:Pg:34-40 working principle R2-Ch2.3.5:pg:76-82 L 39 R5-Ch3-pg:46-50 Electron diffraction-imaging-diff contrastbright & dark field contrast-phase contrast XRD-pattern to analyse XRD- schematic diagram- constructionR1-Ch2.6:Pg:75-81 structures working principle R2-Ch2.3.5:pg:92-97 L 40 Analysis and understanding of crystal structures using results of XRD expt UNIT 6 : NANO DEVICES AND NANOMEDICINE (6) Lab on chip for bionanlysis Lab on chip for bionanlysis Lab onchip processing L 41 Labonchip characteristics Core/shell Nano particles in Core/shell Nano particles in drug delivery drug delivery system system L 42 Method of drug delivery system Site specific-targeted drug Site specific-targeted drug delivery L 43 delivery Concept of drug delivery system Cancer treatment Cancer identification-treatment L 44 Methods and procedure of cancer treatment L 45 Bone Tissue treatment Bone Tissue treatment cell growth L 46 DNA understanding UNIT 7 : NANO AND MOLECULAR ELECTRONICS(9) Resonant-Tunneling Resonant-Tunneling structures structures Construction -procedure-Working principle L 47 Method analysis & understanding Single electron Tunneling Single electron Tunneling L 48 L 49 Construction -procedure-Working principle Method analysis & understanding Single electron Transistors Single electron Transistors Electrical properties Significance and applications Conductivity procedure Conductivity of random in bulk material Conductivity of blockade in nanostructures Gain Magneto Resistance L 50 L 51 T1-unit7.1-pg:7.1-7.14 R1-Ch13:Pg:301-310 T1-unit8.1-pg:8.1-8.1 R1-Ch13:Pg:301-310 T1-unit8.1.1-pg:8.1-8.2 R1-Ch13:Pg:301-310 T1-unit8.1.1.2-pg:8.2-8.3 R1-Ch13:Pg:301-310 T1-3.12-pg:3.18-3.22 R1-Ch13:Pg:301-310 T6-Ch7.3-pg:221-223 R5-Ch9-pg:226-242 R1-Ch14:Pg:316-327 T1-4.9-pg:4.222-4.23 R2-Ch3.3.2-pg:139-142 R1-Ch14:Pg:316-327

34

35

36 37

38

39

40

41

T2-5.10-pg:5.23-5.24 R2-Ch3.3.2-pg:139-142 R1-Ch14:Pg:316-327 T1-3.12-pg:3.18-3.22 R2-Ch3.3.4-pg:142-143 R1-Ch14:Pg:316-327 T1-3.12-pg:3.18-3.22

42

Coulomb Blockade

L 52 L 53

43

Gain Magneto Resistance

Effect of GMR significance Tunneling Magneto Resistance Effect of TMR

L 54

R2-Ch3.3.4-pg:142-143 R1-Ch14:Pg:316-327

44

Tunneling Magneto Resistance

45

46 47

48

49

50 51

52

53

T1-3.12-pg:3.18-3.22 R2-Ch3.3.4-pg:142-143 R1-Ch14:Pg:316-327 UNIT 8 : NANO LITHOGRAPHY AND NANOMANIPULATION Nano Lithography Nano lithography introduction-processing T1-10-pg:10.1-10.6 introduction steps R2-Ch12.-pg:213-216 L 56 e-beam Lithography e-beam Lithography-dip-pen litho. L 57 Construction -procedure-Working principle Method analysis & understanding SEM based nanolithography SEM based nanolithography R3-Ch3.3-pg:138-139 L 58 R2-Ch12.-pg:218-220 Construction -procedure-Working principle T1-3.12-pg:3.18-3.22 R2-Ch12.-pg:223-227 Method analysis & understanding Ion Beam Lithography Ion Beam Lithography T1-4.9-pg:4.222-4.23 L 59 R2-Ch12-pg:236-247 Construction -procedure-Working principle Method analysis & understanding Oxidation Oxidation T1-4 -pg:4.23-4.24 Construction -procedure-Working principle L 60 R2-Ch12.-pg:262-263 Method analysis & understanding Metallization Metallization T1-3.12-pg:3.18-3.22 Construction -procedure-Working principle L 61 R2-Ch12.-pg:274-281 Method analysis & understanding Mask and its applications Mask and its applications T1-Ch3.3-pg:138-139 L 62 T8-Ch9-pg:226-242 Construction -procedure-Working principle R2-Ch12.-pg:293-296 Deep UV-Lithography Method analysis & understanding T1-4.9-pg:4.222-4.23 Construction -procedure-Working principle L 63 R2-Ch12-pg:139-142 X-ray based Lithography X-ray based Lithography T1-4.10-pg:4.23-4.24 Construction -procedure-Working principle L 64 Method analysis & understanding L 55

QUESTION BANK UNIT 1 (INTRODUCTION TO NANOTECHNOLOYG) 1. 2. 3. 4. 5. 6. 7. 8. 9. 10. 11. 12. 13. 14. 15. 16. 17. 18. 19. 20. 21. 22. What the concept of nanotechnology What are different Nano materials used for nanostructures. If nature is full of Nano, what limits us from making Nano materials or Nano devices? What are the likely impacts of nanotechnology. How the physical and chemical properties of Nano materials vary with their size? Write the important applications of Nano materials in medicine. Explain the importance of Nano scale in electronic field. Why the Nano scale study is required for medical and industrial applications. Give few examples of ancient Nano structures. Explain about Nanostructure types On What factors nanostructures are divided. Explain what are the electronic properties of nano materials. What is the impact of nanoscale on the electronic properties of semiconductors. Explain the Magnetic properties of Nano materials. What are the mechanical properties of nanostructrures. Explain the optical properties of Nano materials. How optical properties of Nano materials changes. Explain the fabrication of Nanostructures. Explain the bottom-up approach of Nano structures. Explain the top-down approach of Nano structures. What are the challenges of Nanostructures fabrication. How energy band gaps of semiconductors differs the properties of nanostructures.

UNIT-II QUANTUM MECHANICAL PHENOMENON IN NANOSTRUCTURES

1. 2. 3. 4. 5. 6. 7. 8.

Explain the quantum mechanical phenomenon in nano materials. Explain what is quantum confinement. What is confinement of electrons in semiconductor structures. Explain the concept of quantum well. By considering the energies and wave functions. Explain the one dimensional confinements. Explain the concepts of quantum wires. Explain the concept of quantum dots. Sketch and explain two-dimensional finite potential well with cylindicier geometry and energy levels.

9.

Sketch and explain one-dimensional parabolic potential well showing the positions of the four lowest energy levels.

10. 11. 12. 13. 14. 15. 16. 17. 18. 19. 20. 21.

Explain the concept of super lattices. How quantum dots can be manufactured. Explain the quantum well width fluctuations. Explain the changes of energy density changes incase of quantum well, quantum wire and quantum dot. Explain the concept of colloidal quantum dots. Explain the technique of thermally annealed quantum wells. What are the application of quantum dots. What are the application of quantum wells. What are the application of quantum wire. Explain the schrodinger wave equation for quantum confinement. Explain the quantum confinement in semiconducting nanostructures. Explain the energy densities using one dimensional potential well.

UNIT-III CARBON NANO STRUCTURES

1. 2. 3. 4. 5. 6. 7. 8. 9. 10. 11.

Write a short note on materials used in Nano technology Give the pictural Notation of allotropes of carbon. Explain the structure of grapheme. What are the different electrical, mechanical properties of grapheme. Explain the concept of electronic transport in grapheme. Draw the various types of fullerenes pictures. What is Fullerenes, Define. Explain the Aromaticity property of fullerene. Explain the solubility of fullerenes. Explain the quantum mechanics of fullerenes. Explain the mass spectrum of carbon clusters.

12. 13. 14. 15. 16. 17. 18. 19. 20. 21.

With pictures explain the structures of C60 and its crystal. Explain the superconductivity in C60. Explain the Band theory of Nano materials. Explain the applications of c60 structures. Explain the C80 structure. Write a short note on Mechanical, optical and electrical properties of C80 structure. Explain the fullerene Concept of C240 structure. What is chiralities explain. Compare C80, C60 C240 structure. What are the applications of C80, C60, & C240 structures.

UNIT-IV FABRICATION OF NANOMATERIALS

1. 2. 3. 4. 5. 6. 7. 8. 9. 10. 11. 12. 13. 14. 15. 16. 17. 18. 19. 20. 21.

Explain the experimental setup of an are discharge apparatues. Explain the working principle of are discharge. Explain the different problems of SWNT. How inert gas condensation in helps to reduces the condensation of atomic carbon. Explain how distance between anode and cathode influence the fabrication of Nano materials. Explain optical plasma control technique. Explain the synthesis of carbon Nano tubes by laser vaporization. Draw the experimental setup for plasma rotating electrode system and explain its operations. Draw the experimental setup for laser ablation apparatus. Compare SWCNT, MWCNT using their structural properties. Explain the chemical vapor deposition technique for fabricating Nanostructures. Explain the plasma enhanced chemical vapour deposition technique. Explain thermal chemical vapour deposition technique. Draw the schematic diagrams CVD and PVD techniques in detail. Explain the operations of laser assisted thermal chemical vapour deposition technique. Explain the purification of carbon Nano tubes. Explain the concept of laser paralysis. Explain the Molecular base epitaxial technique for fabrication of Nano structures. What are the advantages of ARC discharge method. What are the applications of ION sputtering. What the advantages of CVD, PVD methods.

UNIT-V NANO SCALE CHARACTERIZATION TECHNIQUES.

1. 2. 3.

What are the principal properties used to explore Nano materials. What are the differences between photon electron and scanning probe techniques. How do we manipulate objects in the Nano dimension.

4. 5. 6. 7.

Why objects in the Nano scale cannot be seen by visible light? How do we see them. What are the principal difference between scanning probe micro scopes parameters. Why is it not possible to image Nano objects with infrared or x rays. What are the characteristic properties of objects in the Nano scale? Which of those properties we use to examine them?

8.

Every property possessed by bulk materials is also possessed by Nano objects, so, how can one study Nano objects uniquely?

9. 10. 11. 12. 13. 14. 15. 16. 17. 18. 19. 20. 21.

Propose an experiment to study the strength of a single chemical bond. Draw the electron gun of SEM contain explain it operation. Explain the electron lenses of SEM. Draw and explain various operations of electromagnetic lenses and explain them. Explain scan coils in SEM. Explain electron detectors in SEM. What are the advances in SEM. Explain the TEM (Transmission electron micro scope) technique. Explain the bright felid and dark field, the two kinds of Imaging using TEM. Explain STEM instrument. Draw the various ways of operation of the STEM. Explain Image collection in electron micros copes. Explain the lab on chip concept.

UNIT VI : NANO DEVICES AND NANO MEDICINE.

1. 2. 3. 4. 5. 6. 7. 8. 9. 10. 11. 12. 13. 14. 15. 16. 17.

Explain the biological building blocks. Give the list of typical sizes of various biological substances in the nanometer range. Explain the four level of structure of u protein Explain the organization of bimolecular structure at the nanometer scale.. Explain DNA as a nanotechnology building block. Explain how cancer can be cured using Nano participles On what basis drag delivery depends. What are the tissues in the bones. How Nanotechnology is used to help the curing of Bone tissues. Explain the recent developments in Nan scales in medicine. Explain the lab on chip (LOC) concepts. Explain the chip materials and fabrication in LOC. What are the advantages of LOC. Explain the examples of LOC. Explain DNA as nanotechnology building block. Explain the organization of biomolecular structure at nanometer scale. Explain how cancer can be detected using nanotechnology.

18. 19. 20. 21.

What the applications of nanotechnology in medical field. What are core/shell nanoparticles in drug delivery system. What making nanotechnology to target the cancer in bone tissues. What the disadvantages of nanotechnology in treatment of cancer and bone tissue problems.

UNIT VII : NANO AND MOLECULAR ELECTRONICS 1. 2. 3. 4. 5. 6. 7. 8. 9. 10. 11. 12. 13. 14. 15. 16. 17. 18. 19. 20. 21. Explain the concept monomolecular electronics. How molecular electronics is different from conventional electronics. How the molecular structures helpful for the conducting phenomena. Explain what is tunneling phenomena. Explain the tunneling concept incase of nanostructures. What is single electron transistor. explain single electron tunneling How does a single electron is different from conventional transistors. Explain the properties of single electron transistor. Explain the quantum mechanical phenomena of tunneling process. Explain what coulomb blockade is. Explain how conducting phenomena differs in nanostructures using the concept of blockade. What is GMR(Gain Magneto Resistanc e) How this gain magneto resistance will arise in nanostructures. Explain the advantages of gain magneto resistane Explain the advantages of single electron transistor. What is tunneling magneto resistance. How the magnetic properties differ in nanomagnetic materials. What the types of molecular machines. Explain the concept of molecular assembler. Explain the concept and theory of molecular electronics and genesis theory.

UNIT VIII : NANOLITHOGRAPHY AND NANOMANIPULATION 1. 2. 3. 4. 5. 6. 7. 8. 9. 10. Explain the concept of e-beam lithography. What is the need for lithography in fabrication of nanodevices. Explain SEM based nanolithography. Explain the concept of nano manipulation. Explain ion beam lithography Explain oxidation process. Explain metallization process. What is the need for mask in nanofabrication. what are the applications of mask. Explain UV-Lithography process.

11. 12. 13. 14. 15. 16. 17. 18. 19. 20. 21.

What are the advanteges of UV-lithography Explain the X-ray based lithography. What are the advantages of X-ray based lithography. What are the constructural features of SEM based nanolithography. Explain construction of ion beam lithography. Explain different types of oxidation process steps. what are the defects in electron beam lithography Explain the advantages of photolithography process. Explain nano Imprint lithography. Compare the advantages and disadvantages of e-beam lithography of SEM based lithography compare the advantages and disadvantages of UV-lithography and X-ray lithography.

ASSIGNMENT QUESTIONS(LEARNING GROUP WISE) ASSIGNMENT I

ECE3.21 1. 2. 3. 4. What the concept of nanotechnology Explain the quantum mechanical phenomenon in nano materials. Write a short note on materials used in Nano technology Explain the experimental setup of an are discharge apparatues.

ECE3.22 1. 2. 3. 4. What are different Nano materials used for nanostructures. Explain what is quantum confinement. Give the pictural Notation of allotropes of carbon. Explain the working principle of are discharge.

ECE3.23 1. 2. 3. 4. If nature is full of Nano, what limits us from making Nano materials or Nano devices? What is confinement of electrons in semiconductor structures. Explain the structure of grapheme. Explain the different problems of SWNT.

ECE3.24 1. 2. 3. 4. What are the likely impacts of nanotechnology. Explain the concept of quantum well. What are the different electrical, mechanical properties of grapheme. How inert gas condensation in helps to reduces the condensation of atomic carbon.

ECE3.25 1. 2. 3. 4. How the physical and chemical properties of Nano materials vary with their size? By considering the energies and wave functions. Explain the one dimensional confinements. Explain the concept of electronic transport in grapheme. Explain how distance between anode and cathode influence the fabrication of Nano materials.

ECE3.26 1. 2. 3. 4. Write the important applications of Nano materials in medicine. Explain the concepts of quantum wires. Draw the various types of fullerenes pictures. Explain optical plasma control technique.

ECE3.27 1. 2. 3. 4. Explain the importance of Nano scale in electronic field. Explain the concept of quantum dots. What is Fullerenes, Define. Explain the synthesis of carbon Nano tubes by laser vaporization.

ECE3.28 1. 2. Why the Nano scale study is required for medical and industrial applications. Sketch and explain two-dimensional finite potential well with cylindicier geometry and energy levels. 3. 4. Explain the Aromaticity property of fullerene. Draw the experimental setup for plasma rotating electrode system and explain its operations.

ECE3.29 1. 2. Give few examples of ancient Nano structures. Sketch and explain one-dimensional parabolic potential well showing the positions of the four lowest energy levels. 3. 4. Explain the solubility of fullerenes. Draw the experimental setup for laser ablation apparatus.

ECE3.30 1. 2. 3. 4. Explain about Nanostructure types Explain the concept of super lattices. Explain the quantum mechanics of fullerenes. Compare SWCNT, MWCNT using their structural properties.

ECE3.31 1. 2. 3. 4. ECE3.32 1. 2. 3. 4. ECE3.33 1. 2. 3. 4. What is the impact of nanoscale on the electronic properties of semiconductors. Explain the changes of energy density changes incase of quantum well, quantum wire and quantum dot. Explain the superconductivity in C60. Explain thermal chemical vapour deposition technique. Explain what are the electronic properties of nano materials. Explain the quantum well width fluctuations. With pictures explain the structures of C60 and its crystal. Explain the plasma enhanced chemical vapour deposition technique. On What factors nanostructures are divided. How quantum dots can be manufactured. Explain the mass spectrum of carbon clusters. Explain the chemical vapor deposition technique for fabricating Nanostructures.

ECE3.34 1. 2. 3. 4. Explain the Magnetic properties of Nano materials. Explain the concept of colloidal quantum dots. Explain the Band theory of Nano materials. Draw the schematic diagrams CVD and PVD techniques in detail.

ECE3.35 1. 2. 3. 4. What are the mechanical properties of nanostructrures. Explain the technique of thermally annealed quantum wells. Explain the applications of c60 structures. Explain the operations of laser assisted thermal chemical vapour deposition technique.

ECE3.36 1. 2. 3. 4. Explain the optical properties of Nano materials. What are the application of quantum dots. Explain the C80 structure. Explain the purification of carbon Nano tubes.

ECE3.37 1. 2. 3. 4. How optical properties of Nano materials changes. What are the application of quantum wells. Write a short note on Mechanical, optical and electrical properties of C80 structure. Explain the concept of laser paralysis.

ECE3.38

1. 2. 3. 4.

Explain the fabrication of Nanostructures. What are the application of quantum wire. Explain the fullerene Concept of C240 structure. Explain the Molecular base epitaxial technique for fabrication of Nano structures.

ECE3.39 1. 2. 3. 4. Explain the bottom-up approach of Nano structures. Explain the schrodinger wave equation for quantum confinement. What is chiralities explain. What are the advantages of ARC discharge method.

ECE3.40 1. 2. 3. 4. Explain the top-down approach of Nano structures. Explain the quantum confinement in semiconducting nanostructures. Compare C80, C60 C240 structure. What are the applications of ION sputtering.

ECE3.41 1. 2. 3. 4. What are the challenges of Nanostructures fabrication. Explain the energy densities using one dimensional potential well. What are the applications of C80, C60, & C240 structures. What the advantages of CVD, PVD methods.

ASSIGNMENT II

ECE3.21 1. 2. 3. 4. ECE3.22 1. 2. 3. 4. ECE3.23 1. 2 3. 4. How do we manipulate objects in the Nano dimension. Explain the four level of structure of u protein How the molecular structures helpful for the conducting phenomena. Explain SEM based nanolithography. What are the differences between photon electron and scanning probe techniques. Give the list of typical sizes of various biological substances in the nanometer range. How molecular electronics is different from conventional electronics. What is the need for lithography in fabrication of nanodevices. What are the principal properties used to explore Nano materials. Explain the biological building blocks. Explain the concept monomolecular electronics. Explain the concept of e-beam lithography.

ECE3.24 1. 2. 3. 4. ECE3.25 1. 2. 3. 4. ECE3.26 1. 2. 3. 4. ECE3.27 1. 2. 3. 4. ECE3.28 1. 2. 3. 4. ECE3.29 1. 2. 3. 4. ECE3.30 1. 2. 3. 4. ECE3.31 1. 2. 3. 4. ECE3.32 Explain the electron lenses of SEM. Explain the lab on chip (LOC) concepts. Explain what coulomb blockade is. What are the advanteges of UV-lithography Draw the electron gun of SEM contain explain it operation. Explain the recent developments in Nan scales in medicine. Explain the quantum mechanical phenomena of tunneling process. Explain UV-Lithography process. Propose an experiment to study the strength of a single chemical bond. How Nanotechnology is used to help the curing of Bone tissues. Explain the properties of single electron transistor. what are the applications of mask. Every property possessed by bulk materials is also possessed by Nano objects, so, how can one study Nano objects uniquely? What are the tissues in the bones. How does a single electron is different from conventional transistors. What is the need for mask in nanofabrication. What are the characteristic properties of objects in the Nano scale? Which of those properties we use to examine them? On what basis drag delivery depends. explain single electron tunneling Explain metallization process. Why is it not possible to image Nano objects with infrared or x rays. Explain how cancer can be cured using Nano participles What is single electron transistor. Explain oxidation process. What are the principal difference between scanning probe micro scopes parameters. Explain DNA as a nanotechnology building block. Explain the tunneling concept incase of nanostructures. Explain ion beam lithography Why objects in the Nano scale cannot be seen by visible light? How do we see them. Explain the organization of bimolecular structure at the nanometer scale.. Explain what is tunneling phenomena. Explain the concept of nano manipulation.

1. 2. 3. 4. ECE3.33 1. 2. 3. 4. ECE3.34 1. 2. 3. 4. ECE3.35 1. 2. 3. 4. ECE3.36 1. 2. 3. 4. ECE3.37 1. 2. 3. 4. ECE3.38 1. 2. 3. 4. ECE3.39 1. 2. 3. 4. ECE3.40 1. 2. 3. 4.

Draw and explain various operations of electromagnetic lenses and explain them. Explain the chip materials and fabrication in LOC. Explain how conducting phenomena differs in nanostructures using the concept of blockade. Explain the X-ray based lithography.

Explain scan coils in SEM. What are the advantages of LOC. What is GMR(Gain Magneto Resistanc e) What are the advantages of X-ray based lithography.

Explain electron detectors in SEM. Explain the examples of LOC. How this gain magneto resistance will arise in nanostructures. What are the constructural features of SEM based nanolithography.

What are the advances in SEM. Explain DNA as nanotechnology building block. Explain the advantages of gain magneto resistane Explain construction of ion beam lithography.

Explain the TEM (Transmission electron micro scope) technique. Explain the organization of biomolecular structure at nanometer scale. Explain the advantages of single electron transistor. Explain different types of oxidation process steps.

Explain the bright felid and dark field, the two kinds of Imaging using TEM. Explain how cancer can be detected using nanotechnology. What is tunneling magneto resistance. what are the defects in electron beam lithography

Explain STEM instrument. What the applications of nanotechnology in medical field. How the magnetic properties differ in nanomagnetic materials. Explain the advantages of photolithography process.

Draw the various ways of operation of the STEM. What are core/shell nanoparticles in drug delivery system. What the types of molecular machines. Explain nano Imprint lithography.

Explain Image collection in electron micros copes. What making nanotechnology to target the cancer in bone tissues. Explain the concept of molecular assembler. Compare the advantages and disadvantages of e-beam lithography of SEM based lithography

ECE3.41 1. 2. 3. 4. Explain the lab on chip concept. What the disadvantages of nanotechnology in treatment of cancer and bone tissue problems. Explain the concept and theory of molecular electronics and genesis theory. compare the advantages and disadvantages of UV-lithography and X-ray lithography.