Professional Documents
Culture Documents
gradually
created
on
a wafer made
of is
almost always used, but various compound semiconductors are used for specialized applications. The IC manufacturing process begins with the production of wafers. Raw wafers are usually produced by third parties and when purchased are ready for processing. Very pure sing1e crystal silicon is grown from specially pure sand (silicon dioxide). If required, the crystal is ground into a perfect cylindrical shape. Millimeter thin slices, called raw wafers, are sawed from the crystal, polished, and shipped to IC manufacturers. In fabrication, three dimensional structures are defined on the silicon wafer. After fabrication, wafers are probed and defective dice are marked. Wafers are then sectioned into tens to hundreds of chips. These are sorted according to performance characteristics, shipped assembled in protective shells, further tested and sorted and finally
and other digital home appliances are now inextricable parts of the structure of modern societies, made possible by the low cost of producing integrated circuits.
everyday electrical and electronic devices. It multiple-step photolithographic and chemical processing steps during which electronic circuits are
The IC fabrication process takes place in a clean room, where special measures are adopted to maintain the level of particle contamination low. Circuits are constructed in layers, one at a time. Each layer is defined by a pattern on a glass plate, called a photomask , whose features are transferred to the surface of the silicon wafer. This process of photoengraving, called photolithography or simply masking, is key to fabrication. A wafer commonly undergoes over ten photolithographic steps in its fabrication process. Between visits to the photolithography station a wafer visits stations where other physical and chemical processes are carried out. These include oxidation, diffusion, ion implantation, metallization, and etching. The fabrication process may require over 10 weeks from raw wafer to wafer probe.
by projection of light through a reticle containing mask information. Etching: Selectively removing unwanted material from the surface of the wafer. The pattern of the photo-resist is transferred to the wafer by means of etching agents. Deposition: Films of the various materials are applied on the wafer. For this purpose mostly two kind of processes are used, physical vapor deposition (PVD) and chemical vapor deposition (CVD). Chemical Mechanical Polishing: A planarization technique by applying a chemical slurry with etchant agents to the wafer surface. Oxidation: In the oxidation process oxygen (dry oxidation) or H O (wet
The steps:
fabrication
of
integrated
circuits
oxidation) molecules convert silicon layers on top of the wafer to silicon dioxide.
Lithography: The
process
for
Ion
Implantation: Most
widely
pattern definition by applying thin uniform layer of viscous liquid (photo-resist) on the wafer surface. The photo-resist is hardened by baking and than selectively removed
used technique to introduce dopant impurities into semiconductor. The ionized particles are accelerated through an electrical field and targeted at the semiconductor wafer.
Diffusion: A
diffusion
step
capacitances exceeding 30 pF. Therefore, for higher values of capacitance, discrete components connected. 7. High grade P-N-P assembly is not possible. 8. Low temperature coefficient is difficult to be achieved. 9. Difficult to fabricate an IC with low noise. 10. Large value of saturation resistance of transistors. 11. Voltage dependence of resistors and capacitors. 12. The diffusion processes and other related procedures used in the fabrication process are not good enough to permit a precise control of the parameter values for the circuit elements. However, control of the ratios is at a sufficiently acceptable level. exterior to IC chip are
An IC can perform many functions while the tube can only amplify