FIRST ANNOUNCEMENT

UCPSS 2010
10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces
Tutorials: 19 September 2010

www.ucpss.org
Thermae Palace, Ostend Belgium

Conference: 2022 September 2010

The Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) is a biannual event. The next edition will be held from 2022 September 2010 in Thermae Palace, Ostend (Belgium). For the first time, a special session will be devoted to photovoltaic applications, on 22 September. Contributions in new areas such as photovoltaics and bioelectronic applications are particularly encouraged. It is the purpose of the UCPSS symposium to increase the level of understanding on ultraclean processing technology in all steps of the ICproduction, PV and bioelectronics. The conference consists of invited presentations, as well as selected contributing presentations and posters. The issues to be addressed include, but are not limited to, the following topics: Removal of contaminants in all steps of micro, nanoelectronics applications and 3Dintegration Fundamentals of contaminants on surfaces: e.g. particlesubstrate interactions Surface chemistry, passivation, conditioning and characterization of group IV and III/V materials (Si, Ge, GaAs and InGaAs) for sensitive FEOL processes (highkmetal gate stacks dielectrics, Ge surfaces, IIIV, epitaxy, ALD) Chemical and physical cleaning in liquid, gaseous and supercritical ambient Tradeoffs between cleaning performance, substrate damage and etching Contamination/particle control and its relation with process yield or performance Yield enhancement cleans: wafer backside, bevel Dryetch resist strip and polymer removal Removal of modified photo resist, post etch residues and polymers Process and contamination diagnostics, insitu monitoring and process control General issues in ultraclean technology, ultrapure materials and supply systems Environmentally friendly technologies and mass balance equations EUVmask cleaning Surface functionalization for integrated bioelectronic sensors Cleaning and surface preparation for silicon substrate based solar cells such as: o Purity requirements for solar cell fabrication o Wet texturization processes o Surface passivation for low surface recombination lifetime
Conference secretariat: UCPSS Momentum Grensstraat 8 B3010 Leuven Belgium Tel +32 (0)16 40 45 55 Fax +32 (0)16 40 35 51 ucpss@momentumpco.be

Conference chairman: Paul Mertens (IMEC) Programme committee responsible for paper selection: Jerzy Ruzyllo (Penn State University), Ara Philipossian (University of Arizona), Paul Mertens (IMEC), Takeshi Hattori (Hattori Consulting/Hanyang University), Geunmin Choi (Hynix), Allen Bowling (Texas Instruments), Mauro Alessandri (Numonyx), Jef Poortmans (IMEC) Advisory committee: Marc Heyns (IMEC), Bernd Kolbesen (J.W. Goethe University) Local organizing committee: Marc Heyns (IMEC), Paul Mertens (IMEC), Marc Meuris (IMEC), Rita Vos (IMEC), Guy Vereecke (IMEC), Kurt Wostyn (IMEC)