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DFT Basics

UNIT 1 : Defects & Yield


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Course Breakup
CONFIDENTIAL

DAY 1
Defects & Yield

DAY 2
Memory DFT

Defects & Faults

ATPG Concepts

Scan DFT

Test Cost Reduction

Scan Diagnostics

At-Speed Testing
Conclusion

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Lesson Outline
CONFIDENTIAL

- Design Flow, Defects & Faults

- Test
- Cost of Test

- Yield
- Defect Level

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Lesson Objectives
CONFIDENTIAL

At the end of this course you will be able to :

Define Defects and Faults Describe the meaning of Test and to understand the Test Cost Define Defect Level as a function of Yield and Fault Coverage

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Semicustom die birth to CONFIDENTIAL maturity


Specs. RTL. Synthesis Gate Level Netlist Place n Route

GDS II
FAB Wafer Out Die packaging Board testing

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Definitions
CONFIDENTIAL

Design synthesis

Given an I/O function, develop a procedure to manufacture a device using known materials and processes.

Verification

Predictive analysis to ensure that the synthesized design, when manufactured, will perform the given I/O function.

Test

A manufacturing step that ensures that the physical device, manufactured from the synthesized design, has no manufacturing defect.

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Physical Defects & Faults

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What Is a Physical Defect?

CONFIDENTIAL

Physical Defect: A on-chip flaw introduced during fabrication or packaging of an individual ASIC that leads to a logical malfunction.
Short Circuit

Typical Examples

Open Circuit

Transistor Stuck ON

Oxide Pinholes

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Physical Defects in CMOS CONFIDENTIAL


Power Rail

0.18 m m

p-Type Transistor n-Type Transistor


0.18 m m

Micron Dust Particle

Ground Rail
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Physical Defects in CMOS (contd). CONFIDENTIAL


POWER
Output Shorted to 1

Input Open

IN
Input Shorted to 0

OUT

GROUND
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What is a Fault ?
CONFIDENTIAL

Fault is the manifestation of a physical defect or defects. A Fault Model abstracts the defects at the logic gate level. Fault Models represent different types of fault

Test Type
Functional Structural

Fault Model
Functional Model Single Stuck-at, Multiple Stuck-at, Bridging, Stuck Open Transition, path delay

Defects
Opens/Shorts in circuit CMOS Transistor stuck-open, short, resistive bridging, Leaky transistors. Partially conducting transistors, resistive contacts, failing vias.

At-Speed

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An Example
CONFIDENTIAL

Physical Defect : A metal via may be missing between VDD supply and the drain of an CMOS inverter.

POWER POWER

Two Vias Missing

IN

OUT

IN

OUT

GROUND

GROUND

This defect can be a Functional Fault in a Memory, but only a Transition Fault in a CMOS Inverter.
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Test

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Problems of Ideal Test


CONFIDENTIAL

Ideal tests detect all defects produced in the manufacturing process.

Ideal tests pass all functionally good devices.

Very large numbers and varieties of possible defects need to be tested.

Difficult to generate tests for some real defects.

Defect-oriented testing is an open problem.

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Real Tests
CONFIDENTIAL

Based on analyzable fault models, which may not map on real defects. Incomplete coverage of modeled faults due to high complexity. Some good chips are rejected. The fraction (or percentage) of such chips is called the yield loss. Some bad chips pass tests.The fraction (or percentage) of bad chips among all passing chips is called the defect level.

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Testing as a Filter Process


CONFIDENTIAL

Good chips Prob. (good) = y

Mostly Good chips

Fabricated chips

Sold Chips

Bad chips

Prob. (bad) = 1-y

Mostly Bad chips

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Cost of Test
CONFIDENTIAL

Design for testability (DFT)


Chip area overhead and yield reduction Performance overhead

Software processes of test


Test generation and fault simulation Test programming and debugging

Manufacturing test

Automatic test equipment (ATE) capital cost Test center operational cost

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Cost of Test
CONFIDENTIAL

Low number of DPM is very critical Cost to replace parts grows exponentially through a design cycle Cost of bad part in critical device(for example, a pacemaker or airplane is immeasurable)
$10000
$1000 $100

$10
$1
SPEC Analysis Design Test Production Field

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Yield
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VLSI CHIP YIELD


CONFIDENTIAL

A manufacturing defect is a finite chip area with electrically malfunctioning circuitry caused by errors in the fabrication process. A chip with no manufacturing defect is called a good chip. Fraction (or percentage) of good chips produced in a manufacturing process is called the yield. Yield is denoted by symbol Y.

Cost of a chip:

Cost of fabricating and testing a wafer Yield x Number of chip sites on the wafer
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Clustered VLSI Defects


CONFIDENTIAL

Good chips
Faulty chips

Defects Wafer Unclustered Defects


Wafer yield = 12/22 = 0.55

Clustered Defects
Wafer yield = 17/22 = 0.77

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YIELD Parameters
CONFIDENTIAL

Defect density (d ) = Average number of defects per unit of chip area Chip area (A) Clustering parameter ()

Negative binomial distribution of defects,


P (x ) = Probability (number of defects on a chip = x )

(a+x ) P(x) = x ! (a)

(Ad /) x

(1+Ad /) +x

Where is the gamma function = 0, P(x ) is a delta function (maximum clustering) = , P(x ) is Poisson distribution (no clustering)
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YIELD Equation
CONFIDENTIAL

Y = Probability ( zero defect on a chip ) = P(0)

Y = ( 1 + Ad / )

Example: Ad = 1.0, = 0.5, Y = 0.58

Unclustered defects: =

Y = e Ad

Example: Ad = 1.0, = , Y = 0.37

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Defect Level

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Determination of DL
CONFIDENTIAL

From field return data

Chips failing in the field are returned to the manufacturer. The number of returned chips per million chips shipped is the DL.

From test data

Fault coverage of tests and chip fallout rate are analyzed. A modified yield model is fitted to the fallout data to estimate the DL.

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Determination of DL
Three parameters:

CONFIDENTIAL

Fault density, f = average number of faults per unit chip area Fault clustering parameter, Fault coverage, T

The modified yield equation:

Y (T ) = (1 + TAf / ) (1 Af)T
Assuming that tests with 100% fault coverage (T = 1.0) remove all faulty chips,

Y = Y (1) = (1 + Af / ) (1-Af)

DL(T) =

Y (T) - Y(1) Y(T)

DL(T) = 1 Y

(1-T)

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Defect Level or Rejection Ratio


CONFIDENTIAL

Defect level (DL) is the ratio of faulty chips among the chips that pass tests. DL is measured as parts per million (ppm). DL is a measure of the effectiveness of tests. DL is a quantitative measure of the manufactured product quality. For commercial VLSI chips a DL greater than 500 ppm is considered unacceptable.

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Summarizing DL
CONFIDENTIAL

IC Fabrication
Yield Y (Fraction of good parts)

DL(T) =

Y (T) - Y(1)

Y(T)
where Y = Yield T = Fault Coverage Passed die Yield = --------------------------Passed + Failed die

Test

Reject / Diagnose

Shipped parts (good & bad) bad => Defect Level (DL) in Defective parts per million (DPM)

The number of DEFECTIVE PARTS sold as good is DL

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Is High Coverage Needed?


CONFIDENTIAL
STIL 1.0; nnnnnnnnnnn nnnnnnnnnnn nnnnnnnnnnn nnnnnnnnnnn nnnnnnnnnnn nnnnnnnnnnn nnnnnnnnnnn nnnnnnnnnnn nnnnnnnnnnn nnnnnnnnnnn

Test Program

Test Escapes: Parts that pass every test, but still have undetected defectsand reach users!

ATE
Defect Level: The fraction of test escapes, in defective parts per million (DPM).

Failed Any Test

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Example : SEMATECH Chip


CONFIDENTIAL

Bus interface controller ASIC fabricated and tested at IBM, Burlington, Vermont 116,000 equivalent (2-input NAND) gates 304-pin package, 249 I/O Clock: 40MHz, some parts 50MHz

0.8 CMOS, 3.3V, 9.4mm x 8.8mm area


Full scan, 99.79% fault coverage Advantest 3381 ATE, 18,466 chips tested at 2.5MHz test clock Data obtained courtesy of Phil Nigh (IBM)
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Stuck-At Fault coverage


CONFIDENTIAL

Data Taken from : Copyright 2001, Agrawal & Bushnell


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Defect Level vs. SAF Coverage


CONFIDENTIAL

Data Taken from : Copyright 2001, Agrawal & Bushnell


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ST Chip Features
CONFIDENTIAL

Project A
130 nm process Consumer market High-runner product >1M EGates logic 5 clock domains 100MHz (max) Full-scanned no compression ~50k flip-flops 32 scan chains

Project B
90nm process Network application High-volume product 2M EGates logic 17 clock domains 250MHz (max) Full-scanned with compression 141k flip-flops 1611 internal scan chains 30 external chains
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Structural Test Pattern Suite


CONFIDENTIAL

Project A Top-off BF

Project B BF

4.2k patterns TC = 90.76%

31k patterns TC = 84.5%

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Preliminary Results
CONFIDENTIAL

Project A Test type: EWS #Tested dices: ~ 111k Yield ~ 80% Bridging fault test

Project B Test type: EWS #Tested dices: ~ 250k Yield ~ 50% Bridging fault test

Failing dices = 2

Failing dices = 84

dppm = 18

dppm = 337

Failing dices @ all Vdd = 1

Failing dices @ all Vdd = 41

dppm = 9

dppm = 164

Data collection completion is expected by Q3 2006

Pre-production just started

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Defect Coverage Defect Level Level vs vs Test Coverage


CONFIDENTIAL
100% 100% 100% 90% 90% 90% 80% 80% 80%

Level Defect Defect Level

DL = 1 -Y Y

(1-T) (1-T)

70% 70% 70% 60% 60% 60%


50% 50%

Y = 10% Y = 10%
Y = 30% 70% Y =Y 90% = 90%
1 10 10 0 00 0

40% 40% 40% 30% 30% 30% 20% 20% 20% 10% 10% 10%
0% 0%

10 1 10

2 20 0 2 0

3 3 30 0 0

40 0

5 50 0

6 60 0

7 70 0

8 80 8 0 0

Test Coverage Coverage (% Test (%))


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9 90 0 9 0

0 0 0

Lesson Review
CONFIDENTIAL

What is a Physical Defect ?

What is a Fault ?
What is the difference between Test and Verification ?

What is the difference between Real Test and Ideal Test ?


What has Clustering to do with Yield ? What is DL and how does it depend upon Fault Coverage ? What will happen if we choose a wrong Fault Model ?

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Summary
CONFIDENTIAL

VLSI yield depends on two process parameters, defect density (d ) and clustering parameter (). Yield drops as chip area increases; low yield means high cost. Fault coverage measures the test quality. The number of DEFECTIVE PARTS sold as good is Defect level (DL). DL or reject ratio is a measure of chip quality. DL can be determined by an analysis of test data.

For high quality: DL < 500 ppm, fault coverage ~ 99%

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Backup Slides

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Defect Level after Test


CONFIDENTIAL

DL

= Defect Level after Test

Yield = Probability of Chip Manufactured Correctly T = Test Coverage

DL = 1 - Y
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(1-T)

Defect Level Level vs vs Test Test Coverage Coverage Defect


100% 100% 100% 90% 90% 80% 80% 80% 70% 70% 70% 60% 60% 60% 50% 50% 50% 40% 40% 40% 30% 30% 30% 20% 20% 20% 10% 10% 0% 0%

CONFIDENTIAL

Defect Level Level Defect DefectLevel

DL = =1 1-Y DL

(1-T) (1-T) Y

Y = 30% 70% Y = 90%


11 00
22 00

$
55 00 66 00 77 00

Y = 10%

Test Test Coverage Coverage (% (% ) )


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11 00 00

33 00

44 00

88 00

99 00

00

Voids in Cu CONFIDENTIAL

Results in Delay Defects!


Source: Infineon - ChiPPS Meeting, 13.-17.10.2002, Prague, Czech Rep.

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